ELECTRONIC DEVICE WITH ANTENNA DEVICE
    1.
    发明申请
    ELECTRONIC DEVICE WITH ANTENNA DEVICE 有权
    具有天线装置的电子装置

    公开(公告)号:US20160344439A1

    公开(公告)日:2016-11-24

    申请号:US15148385

    申请日:2016-05-06

    Abstract: An electronic device with an antenna device is provided. The electronic device includes a case member that includes a first face, a second face disposed opposite to the first face, and side walls that enclose a space between the first face and the second face, a first metallic member that forms at least a portion of the side walls of the case member or is formed adjacent to the side walls, a metal pattern disposed within the case member and extends from a portion of the first metallic member to another portion of the first metallic member, the first metallic member and the metal pattern electrically forming at least a portion of a closed loop, a wireless communication circuit electrically connected to a portion of the metal pattern, a ground member positioned within the case member, and a portion of the metal pattern disposed adjacent to the ground member.

    Abstract translation: 提供具有天线装置的电子设备。 电子设备包括壳体构件,其包括第一面,与第一面相对设置的第二面和围绕第一面和第二面之间的空间的侧壁,形成至少一部分的第一金属构件 壳体构件的侧壁或邻近侧壁形成的金属图案,设置在壳体构件内并从第一金属构件的一部分延伸到第一金属构件的另一部分的金属图案,第一金属构件和金属 电气地形成闭环的至少一部分的图案,与金属图案的一部分电连接的无线通信电路,定位在壳体构件内的接地构件以及邻近地面构件设置的金属图案的一部分。

    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND ELECTRONIC DEVICES
    2.
    发明申请
    METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND ELECTRONIC DEVICES 有权
    制造半导体器件和电子器件的方法

    公开(公告)号:US20150187910A1

    公开(公告)日:2015-07-02

    申请号:US14505662

    申请日:2014-10-03

    Abstract: In a method of manufacturing a semiconductor device, an isolation layer pattern is formed on a substrate to define a field region covered by the isolation layer pattern and first and second active regions that is not covered by the isolation layer pattern and protrudes from the isolation layer pattern. A first anti-reflective layer is formed on the isolation layer pattern. A first photoresist layer is formed on the first and second active regions of the substrate and the first anti-reflective layer. The first photoresist layer is partially etched to form a first photoresist pattern covering the first active region. Impurities are implanted into the second active region to form a first impurity region.

    Abstract translation: 在制造半导体器件的方法中,在衬底上形成隔离层图案,以限定由隔离层图案覆盖的场区域和未被隔离层图案覆盖并从隔离层突出的第一和第二有源区域 模式。 第一抗反射层形成在隔离层图案上。 在基板的第一和第二有源区域和第一抗反射层上形成第一光致抗蚀剂层。 部分蚀刻第一光致抗蚀剂层以形成覆盖第一有源区的第一光致抗蚀剂图案。 将杂质注入到第二有源区中以形成第一杂质区。

Patent Agency Ranking