SEMICONDUCTOR DEVICE
    3.
    发明公开

    公开(公告)号:US20230387005A1

    公开(公告)日:2023-11-30

    申请号:US18201995

    申请日:2023-05-25

    Abstract: A semiconductor device includes a first contact structure connected to the lower structure, a first conductive wiring connected to the first contact structure, a first etch-stop layer and an interlayer insulating layer sequentially provided on the first conductive wiring, a second contact structure passing through the first etch-stop layer, provided in the interlayer insulating layer, and connected to the first conductive wiring, a second conductive wiring provided on the second contact structure and provided in the interlayer insulating layer, a barrier layer including a first barrier portion on a bottom surface of the second contact structure, a second etch-stop layer provided on a top surface of the second conductive wiring and a top surface of the interlayer insulating layer, and an air gap between the barrier layer and the extension portion.

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