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公开(公告)号:US20230146691A1
公开(公告)日:2023-05-11
申请号:US17978489
申请日:2022-11-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Bongki SON , Jeongyong SHIN , Seunghyun LIM
CPC classification number: G06T5/50 , G06T3/4038 , G06T3/60 , G06T2207/20221
Abstract: An imaging device includes an image sensor configured to generate a plurality of original images, and an image processor configured to generate a merged image based on the plurality of original images. The image processor is configured to generate the merged image by classifying the plurality of original images into a plurality of stitching groups based on a first stitching direction, stitching original images included in a same stitching group to generate a plurality of intermediate images, and stitching the plurality of intermediate images based on a second stitching direction to generate the merged image.
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公开(公告)号:US20230187519A1
公开(公告)日:2023-06-15
申请号:US17896523
申请日:2022-08-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jinkyung SON , Seungje KIM , Jiwon PARK , Jaepo LIM , Minseok JO , Seunghyun LIM , Jinyoung CHOI
IPC: H01L29/423 , H01L29/06 , H01L29/08 , H01L29/786 , H01L29/775 , H01L29/66
CPC classification number: H01L29/42392 , H01L29/0673 , H01L29/0847 , H01L29/78696 , H01L29/775 , H01L29/66553 , H01L29/66545 , H01L29/66742 , H01L29/66439
Abstract: A semiconductor device is provided. The semiconductor device includes: a substrate with an active region extending in a first direction; an element isolation layer, adjacent to the active region, in the substrate; a gate electrode on the substrate and extending in a second direction which crosses the first direction; a plurality of channel layers on the active region, spaced apart from each other along a third direction perpendicular to an upper surface of the substrate, and surrounded by the gate electrode; and a source/drain region provided in a recess of the active region adjacent to the gate electrode, and connected to the plurality of channel layers. In the first direction, the gate electrode has a first length on the active region and a second length, greater than the first length, on the element isolation layer.
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公开(公告)号:US20240321989A1
公开(公告)日:2024-09-26
申请号:US18397561
申请日:2023-12-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Gunho JO , Heesub KIM , Seunghyun LIM , Bomi KIM , Eunho CHO
IPC: H01L29/423 , H01L29/06 , H01L29/417 , H01L29/66 , H01L29/775
CPC classification number: H01L29/42392 , H01L29/0673 , H01L29/41733 , H01L29/66439 , H01L29/66545 , H01L29/775
Abstract: A semiconductor device includes a substrate, an active pattern including a lower pattern extending in a first direction and a plurality of sheet patterns above an upper surface of the lower pattern and spaced apart from the lower pattern in a second direction substantially perpendicular to the first direction, a gate structure on the lower pattern and including a gate electrode and a gate insulating film, the gate electrode and the gate insulating film at least partially surrounding the plurality of sheet patterns, a first gate capping pattern on the gate structure and above the plurality of sheet patterns in the second direction, a gate spacer extending along a side wall of the gate structure, and a second gate capping pattern extending along an upper surface of the gate structure and an upper surface of the first gate capping pattern.
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公开(公告)号:US20240179434A1
公开(公告)日:2024-05-30
申请号:US18467318
申请日:2023-09-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dongjae HAN , Jaejung PARK , Seunghyun LIM , Haneul JUNG
IPC: H04N25/75 , H04N25/616 , H04N25/65
CPC classification number: H04N25/75 , H04N25/616 , H04N25/65
Abstract: A ramp signal generator may include a current cell unit including a plurality of current sources configured to generate current signals, and a resistance unit connected to an output terminal of the current cell unit. The resistance unit may include a load resistor and an offset resistor connected in series with the load resistor and having a resistance based on analog gains.
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