公开(公告)号：US20240429084A1

公开(公告)日：2024-12-26

申请号：US18409082

申请日：2024-01-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youngbok LEE ,  Sangchul HAN ,  Yihwan KIM ,  Yeontae KIM ,  Namjin CHO

IPC: H01L21/683 ,  H01L21/67

Abstract: A substrate processing apparatus that includes a mounting table including an insulator having a loading surface; a gas distribution unit including injection holes; and a gas supply unit that supplies process gas. An electrode and a heater are embedded in the insulator, and a dielectric layer covers the loading surface. The dielectric layer includes a lower material layer, an intermediate material layer, and an upper material layer. The intermediate material layer has a third thickness, greater than each of a first thickness of the lower material layer and a second thickness of the upper material layer. The intermediate material layer has a third dielectric constant, greater than each of a first dielectric constant of the lower material layer and a second dielectric constant of the upper material layer.

公开(公告)号：US20240060185A1

公开(公告)日：2024-02-22

申请号：US18231400

申请日：2023-08-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeontae KIM ,  Yihwan KIM ,  Hunyong PARK ,  Keesoo PARK ,  Janghwi LEE ,  Sungho JANG

IPC: C23C16/48 ,  C23C16/458

CPC classification number: C23C16/482 ,  C23C16/4585

Abstract: A substrate processing apparatus includes a chamber including a susceptor to support a substrate, a reflective housing outside the chamber, a light source in the reflective housing, the light source being configured to emit a light toward the susceptor, and a light adjuster between the light source and the susceptor, the light adjuster including a support portion supported inside the chamber and a lens coupled to the support portion, and the lens including a transmission portion configured to transmit the light and a scattering pattern portion configured to scatter the light.

公开(公告)号：US20250079129A1

公开(公告)日：2025-03-06

申请号：US18420009

申请日：2024-01-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junho LEE ,  Sangchul HAN ,  Yihwan KIM ,  Yeontae KIM

IPC: H01J37/32

Abstract: A liner structure may include a liner and a first block. The liner may be configured to be arranged on an inner sidewall of a reaction chamber configured to receive a heater and a substrate. The first block may be connected to the liner. The first block may include a material different from a material of the liner.