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    PERFORMANCE AND BANDWIDTH EFFICIENT FRACTIONAL MOTION ESTIMATION
    6.
    发明申请
    PERFORMANCE AND BANDWIDTH EFFICIENT FRACTIONAL MOTION ESTIMATION 审中-公开
    性能和带宽有效的运动估计

    公开(公告)号：US20140185679A1

    公开(公告)日：2014-07-03

    申请号：US13995564

    申请日：2012-04-26

    Applicant: Sang-Hee Lee ,  Jason D. Tanner

    Inventor： Sang-Hee Lee ,  Jason D. Tanner

    IPC: H04N19/583 ,  H04N19/57

    CPC classification number: H04N19/51 ,  H04N19/523 ,  H04N19/533 ,  H04N19/56 ,  H04N19/57

    Abstract: Described herein are techniques related to motion estimation for video encoding. In particular, integer estimation is performed on a reference video frame, and a best size macro block is determined. A fractional estimation is performed on that best size macro block. Based on the fractional estimation, a determination is made if an improvement occurs over the macro block from the integer estimation. If such an improvement occurs, then all sub shapes of the best size macro block from the integer search/estimation are updated. Furthermore, the new sub macro block is chosen as the final macro block to be used for video encoding.

    Abstract translation: 这里描述了与视频编码的运动估计有关的技术。 特别地，对参考视频帧执行整数估计，并且确定最佳大小的宏块。 对最佳大小宏块进行分数估计。 基于分数估计，确定是否从整数估计在宏块上发生改进。 如果发生这种改进，则更新来自整数搜索/估计的最佳尺寸宏块的所有子形状。 此外，新的子宏块被选择为用于视频编码的最终宏块。

    Motion estimation methods for residual prediction
    7.
    发明授权
    Motion estimation methods for residual prediction 有权
    残差预测的运动估计方法

    公开(公告)号：US09386311B2

    公开(公告)日：2016-07-05

    申请号：US13977491

    申请日：2011-12-01

    Applicant: Sang-Hee Lee ,  Fangwen Fu ,  Zhijun Lei

    Inventor： Sang-Hee Lee ,  Fangwen Fu ,  Zhijun Lei

    IPC: H04N7/36 ,  H04N19/51 ,  H04N19/30 ,  H04N19/463 ,  H04N19/132 ,  H04N19/184 ,  H04N19/42 ,  H04N19/43

    CPC classification number: H04N19/51 ,  H04N19/132 ,  H04N19/184 ,  H04N19/30 ,  H04N19/42 ,  H04N19/43 ,  H04N19/463

    Abstract: Systems, apparatus and methods are described including determining a first value by reducing a bit-length of a reference pixel value and adding a first predetermined value to the result and determining a second value by subtracting a residual pixel value from a current pixel value to generate a difference value, reducing a bit-length of the difference value and adding the first predetermined value to the result. The range of the second value may then be clipped by setting the second value to zero when the second value is equal to or less than a second predetermined value and setting the second value to a third predetermined value when the second value is equal to or greater than a fourth predetermined value. The first value and the second value may then be used for inter-layer residual prediction in Scalable Video Coding (SVC) systems.

    Abstract translation: 描述了系统，装置和方法，包括通过减小参考像素值的位长度并将第一预定值加到结果来确定第一值，并通过从当前像素值减去残差像素值来产生第二值以产生 差值，减小差值的位长并将第一预定值加到结果上。 然后可以通过在第二值等于或小于第二预定值时将第二值设置为零来限制第二值的范围，并且当第二值等于或等于更大时将第二值设置为第三预定值 超过第四预定值。 然后可以将第一值和第二值用于可伸缩视频编码（SVC）系统中的层间残差预测。

    Shield cover for braided wire shield
    8.
    发明授权
    Shield cover for braided wire shield 有权
    屏蔽罩用于编织电线屏蔽

    公开(公告)号：US08425240B2

    公开(公告)日：2013-04-23

    申请号：US13234693

    申请日：2011-09-16

    Applicant: Chul-Sub Lee ,  Sang-Hee Lee ,  Kun-Taek Lim

    Inventor： Chul-Sub Lee ,  Sang-Hee Lee ,  Kun-Taek Lim

    IPC: H01R13/648

    CPC classification number: H01R13/6593 ,  H01R13/5812 ,  H01R13/6471

    Abstract: A shield cover for a braided wire shield that is capable of securely fixing a braided wire to a shield member through a single pressing operation. The shield cover having a mating end, an inner casing, an outer cover housing. and a securing section. The inner casing positioned at an end opposite the mating end and having a shield receiving passageway. The outer cover housing positioned at the mating end of the shield cover and forming a connector receiving passageway being wider than the shield receiving passageway. The securing section extends from the inner casing toward the mating end and positioned apart from the outer cover housing.

    Abstract translation: 用于编织线屏蔽的屏蔽罩，其能够通过单次按压操作将编织线牢固地固定到屏蔽构件。 屏蔽盖具有配合端，内壳，外盖壳体。 和固定部分。 内壳体位于与配合端相对的端部并且具有屏蔽接收通道。 外盖壳体位于屏蔽盖的配合端并且形成比屏蔽接收通道更宽的连接器接收通道。 固定部分从内壳延伸到配合端并且与外盖壳体分开定位。

    METHODS OF ESTIMATING POINT SPREAD FUNCTIONS IN ELECTRON-BEAM LITHOGRAPHY PROCESSES
    9.
    发明申请
    METHODS OF ESTIMATING POINT SPREAD FUNCTIONS IN ELECTRON-BEAM LITHOGRAPHY PROCESSES 审中-公开
    电子束光刻过程估计点扩展函数的方法

    公开(公告)号：US20120314198A1

    公开(公告)日：2012-12-13

    申请号：US13486064

    申请日：2012-06-01

    Applicant: Sang-Hee Lee ,  Byung-Gook Kim ,  Hee-Bom Kim ,  Soo-Young Lee ,  Qing Dai

    Inventor： Sang-Hee Lee ,  Byung-Gook Kim ,  Hee-Bom Kim ,  Soo-Young Lee ,  Qing Dai

    IPC: G03B27/32

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31769

    Abstract: In a method of estimating a PSF in the electron-beam lithography process, a linear resist test pattern may be formed on a substrate. A line response function (LRF) may be determined using a cross-sectional profile of the linear resist test pattern. A development rate distribution in a first direction, the first direction may be substantially perpendicular to an extending direction of the linear resist test pattern, may be calculated using the LRF. A line spread function (LSF), which may represent an exposure distribution in the first direction, may be calculated using the development rate distribution. The PSF may be estimated using the LSF.

    Abstract translation: 在电子束光刻工艺中估计PSF的方法中，可以在衬底上形成线性抗蚀剂测试图案。 线路响应函数（LRF）可以使用线性抗蚀剂测试图案的横截面轮廓来确定。 可以使用LRF计算第一方向上的显影速率分布，第一方向可以基本上垂直于线性抗蚀剂测试图案的延伸方向。 可以使用开发速率分布来计算可以表示第一方向上的曝光分布的线扩展函数（LSF）。 可以使用LSF估计PSF。

    Pattern forming method
    10.
    发明授权
    Pattern forming method 有权
    图案形成方法

    公开(公告)号：US08329381B2

    公开(公告)日：2012-12-11

    申请号：US13399090

    申请日：2012-02-17

    Applicant: Jin Choi ,  Byung-Gook Kim ,  Hee-Bom Kim ,  Sang-Hee Lee

    Inventor： Jin Choi ,  Byung-Gook Kim ,  Hee-Bom Kim ,  Sang-Hee Lee

    IPC: G03C5/00

    CPC classification number: H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

    Abstract: A pattern forming method includes providing a first mask with a first aperture, forming a first transfer pattern on a resist by irradiating a first electron beam through the first aperture, the first transfer pattern extending in a first direction and having a boundary along a circumference thereof, and the first electron beam having a cross section of a first square when emerging from the first aperture, and forming a second transfer pattern on the resist by irradiating a second electron beam through the first aperture, the second transfer pattern extending in the first direction and overlapping a portion the boundary of the first transfer pattern, and the second electron beam having a cross section of a second square when emerging from the first aperture.

    Abstract translation: 图案形成方法包括：提供具有第一孔的第一掩模，通过照射通过第一孔的第一电子束，在抗蚀剂上形成第一转印图案，第一转印图案沿着第一方向延伸并沿着其圆周具有边界 并且所述第一电子束在从所述第一孔出射时具有第一正方形的横截面，并且通过照射通过所述第一孔的第二电子束在所述抗蚀剂上形成第二转移图案，所述第二转移图案沿所述第一方向延伸 并且当从第一孔径出现时，与第一转印图案的边界的一部分重叠，并且第二电子束具有第二正方形的横截面。

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