VISIBLE-RANGE SEMICONDUCTOR NANOWIRE-BASED PHOTOSENSOR AND METHOD FOR MANUFACTURING THE SAME
    1.
    发明申请
    VISIBLE-RANGE SEMICONDUCTOR NANOWIRE-BASED PHOTOSENSOR AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    可见范围半导体基于纳米级的光电传感器及其制造方法

    公开(公告)号:US20090261438A1

    公开(公告)日:2009-10-22

    申请号:US12416562

    申请日:2009-04-01

    Abstract: A semiconductor nanowire-based photosensor includes a substrate, at least a top surface of the substrate being formed of an insulator, two electrodes spaced at a predetermined interval apart from each other on the substrate, metal catalyst layers disposed respectively on the two electrodes, and visible-range semiconductor nanowires grown from the metal catalyst layers on the two electrodes. The semiconductor nanowires grown from one of the metal catalyst layers are in contact with the semiconductor nanowires grown from the other metal catalyst layer, while the semiconductor nanowires grown respectively from the metal catalyst layers on the two electrodes are floated between the two electrodes over the substrate.

    Abstract translation: 基于半导体纳米线的光电传感器包括基板,所述基板的至少顶表面由绝缘体形成,在所述基板上以预定间隔彼此隔开的两个电极,分别设置在所述两个电极上的金属催化剂层,以及 从两个电极上的金属催化剂层生长的可见范围半导体纳米线。 从金属催化剂层之一生长的半导体纳米线与从另一个金属催化剂层生长的半导体纳米线接触,而分别从两个电极上的金属催化剂层生长的半导体纳米线浮在基板上的两个电极之间 。

    Functional chair
    2.
    发明授权

    公开(公告)号:US10194754B2

    公开(公告)日:2019-02-05

    申请号:US15507466

    申请日:2016-03-02

    Applicant: Woo-Jin Choi

    Inventor: Woo-Jin Choi

    Abstract: Disclosed is a functional chair capable of adjusting a height of a seat. The functional chair includes a first seat configured to support a left pelvis, a second seat provided at a right side of the first seat, a frame provided below the first seat and the second seat, a backrest protruding from one side of the first and second seats, a seat pressure measuring unit which is respectively provided on the first seat and the second seat, a controller which receives the first pressure value and the second pressure value from the seat pressure measuring unit, a memory which stores in advance drive command information corresponding to a difference between the first pressure value and the second pressure value, a first height adjusting unit provided between the first seat and the frame, and a second height adjusting unit provided between the second seat and the frame.

    Laundry dryer
    5.
    发明授权
    Laundry dryer 有权
    洗衣机

    公开(公告)号:US09353474B2

    公开(公告)日:2016-05-31

    申请号:US12376981

    申请日:2007-09-21

    CPC classification number: D06F58/203 D06F58/26

    Abstract: A laundry dryer is provided which is capable of removing and/or preventing wrinkles of laundry. The laundry dryer includes a drum in which laundry is held, a hot air heater that heats air to supply hot air to the drum, and a water heating part that heats water by using the heats generated at the hot air heater to generate steam.

    Abstract translation: 提供了能够去除和/或防止衣物皱纹的衣物干燥器。 衣物烘干机包括:保持衣物的滚筒;将空气加热到鼓中的热空气加热器;以及通过使用在热空气加热器处产生的热量产生蒸汽来加热水的加热部分。

    EXPOSURE METHODS USING E-BEAMS AND METHODS OF MANUFACTURING MASKS AND SEMICONDUCTOR DEVICES THEREFROM
    9.
    发明申请
    EXPOSURE METHODS USING E-BEAMS AND METHODS OF MANUFACTURING MASKS AND SEMICONDUCTOR DEVICES THEREFROM 有权
    使用电子束的曝光方法及其制造方法及其半导体器件

    公开(公告)号:US20150362834A1

    公开(公告)日:2015-12-17

    申请号:US14693429

    申请日:2015-04-22

    CPC classification number: G03F1/78 G03F1/36

    Abstract: Disclosed are an exposure method and a method of manufacturing a mask and a semiconductor device using the same, which minimize time taken by mask data preparation (MDP) to optimize a total exposure process and enhance a quality of a pattern by using an inverse solution concept, based on a multi-beam mask writer. The exposure method includes receiving mask tape output (MTO) design data obtained through optical proximity correction (OPC), preparing mask data, including a job deck, for the MTO design data without a data format conversion, performing complex correction, including proximity effect correction (PEC) of an error caused by an e-beam proximity effect and mask process correction (MPC) of an error caused by an exposure process, on the mask data, generating pixel data, based on data for which the complex correction is performed, and performing e-beam writing on a substrate for a mask, based on the pixel data.

    Abstract translation: 公开了一种曝光方法和制造掩模的方法和使用该方法的半导体器件,其最小化掩模数据准备(MDP)所需的时间以优化总曝光过程并通过使用逆解决方案来提高图案的质量 ,基于多光束掩模写入器。 曝光方法包括接收通过光学邻近校正(OPC)获得的掩模带输出(MTO)设计数据,为MTO设计数据准备掩模数据,包括作业板,而不进行数据格式转换,执行复杂校正,包括邻近效应校正 (PEC)由电子束邻近效应引起的误差和由曝光处理引起的误差的掩模处理校正(MPC)对掩模数据,基于执行复数校正的数据产生像素数据, 以及基于所述像素数据在掩模用基板上进行电子束写入。

Patent Agency Ranking