利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

7 条记录 (耗时 0.028 秒)

    Digital exposure apparatus and method of exposing a substrate using the same
    2.
    发明授权
    Digital exposure apparatus and method of exposing a substrate using the same 有权
    数字曝光装置及使用其的曝光基板的方法

    公开(公告)号：US09025132B2

    公开(公告)日：2015-05-05

    申请号：US13406828

    申请日：2012-02-28

    申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70275

    摘要： A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

    摘要翻译： 数字曝光装置包括可位移台，光源部分，数字微镜部分和微透镜部分。 衬底设置在平台上。 光源部分产生第一光。 数字微镜部分设置在舞台上。 数字微镜部分包括多个数字微镜。 数字微镜将第一光转换成一个或多个第二光束。 微透镜部分设置在平台和数字微镜部分之间并且包括多个微透镜。 微透镜将一个或多个第二光束转换成照射在基板上的一个或多个第三光束。 第三个光具有椭圆形横截面形状。

    METHOD OF FORMING A PHOTOSENSITIVE PATTERN, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE, AND DISPLAY SUBSTRATE
    3.
    发明申请
    METHOD OF FORMING A PHOTOSENSITIVE PATTERN, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE, AND DISPLAY SUBSTRATE 有权
    形成感光图案的方法，制造显示基板的方法和显示基板

    公开(公告)号：US20120241740A1

    公开(公告)日：2012-09-27

    申请号：US13407423

    申请日：2012-02-28

    申请人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    发明人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    IPC分类号： H01L29/04 ,  G03F7/20 ,  H01L33/08

    CPC分类号： G03F7/70291 ,  G03F7/70508 ,  H01L27/1288

    摘要： A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

    摘要翻译： 在其上设置有感光层的基板上形成感光图案的方法可以包括在第一方向上移动基板和一组微镜中的至少一个，所述微镜组设置在基板上方并且 排列为阵列，所述阵列具有沿第二方向延伸的第一边缘，所述第二方向相对于所述第一方向成锐角。 该方法还可以包括根据微镜相对于感光层的位置选择性地打开该组微镜的一个或多个微镜，从而在感光层上照射一个或多个光束。 由点光束曝光的感光层被显影以形成具有沿与第一和第二方向交叉的第三方向延伸的边缘部分的感光图案。

    Method of forming a photosensitive pattern, method of manufacturing a display substrate, and display substrate
    4.
    发明授权
    Method of forming a photosensitive pattern, method of manufacturing a display substrate, and display substrate 有权
    形成感光图案的方法，制造显示基板的方法和显示基板

    公开(公告)号：US08847223B2

    公开(公告)日：2014-09-30

    申请号：US13407423

    申请日：2012-02-28

    申请人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    发明人： Jung-In Park ,  Su-Yeon Sim ,  Sang-Hyun Yun ,  Cha-Dong Kim ,  Hi-Kuk Lee

    IPC分类号： H01L29/04 ,  G03F7/20 ,  H01L27/12

    CPC分类号： G03F7/70291 ,  G03F7/70508 ,  H01L27/1288

    摘要： A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions.

    摘要翻译： 在其上设置有感光层的基板上形成感光图案的方法可以包括在第一方向上移动基板和一组微镜中的至少一个，所述微镜组设置在基板上方并且 排列为阵列，所述阵列具有沿第二方向延伸的第一边缘，所述第二方向相对于所述第一方向成锐角。 该方法还可以包括根据微镜相对于感光层的位置选择性地打开该组微镜的一个或多个微镜，从而在感光层上照射一个或多个光束。 由点光束曝光的感光层被显影以形成具有沿与第一和第二方向交叉的第三方向延伸的边缘部分的感光图案。

    Photosensitive film pattern and method for manufacturing a photosensitive film pattern
    5.
    发明授权
    Photosensitive film pattern and method for manufacturing a photosensitive film pattern 有权
    感光膜图案和感光膜图案的制造方法

    公开(公告)号：US08802356B2

    公开(公告)日：2014-08-12

    申请号：US13309679

    申请日：2011-12-02

    申请人： Sang Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi Kuk Lee ,  Su-Yeon Sim

    发明人： Sang Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Hi Kuk Lee ,  Su-Yeon Sim

    IPC分类号： G03F7/00

    CPC分类号： G03F1/36 ,  G03F7/70441

    摘要： A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge.

    摘要翻译： 感光膜图案的制造方法包括：在基板上形成薄膜; 在薄膜上形成感光膜; 在感光膜上布置包括光调制元件的曝光装置; 根据光调制元件的曝光图案，使用曝光装置曝光感光膜; 并显影曝光的感光膜以形成感光膜图案。 曝光图案包括四边形的主图案和位于主图案的拐角处的至少一个辅助图案。 感光膜图案具有长边缘和短边缘的四边形形状，以及具有曲率半径为短边长度的20％至40％的曲面的拐角。

    DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAME
    7.
    发明申请
    DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAME 有权
    数字曝光装置及使用其的基板的曝光方法

    公开(公告)号：US20130016330A1

    公开(公告)日：2013-01-17

    申请号：US13406828

    申请日：2012-02-28

    申请人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    发明人： Sang-Hyun Yun ,  Cha-Dong Kim ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee

    IPC分类号： G03B27/70

    CPC分类号： G03F7/70275

    摘要： A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.

    摘要翻译： 数字曝光装置包括可位移台，光源部分，数字微镜部分和微透镜部分。 衬底设置在平台上。 光源部分产生第一光。 数字微镜部分设置在舞台上。 数字微镜部分包括多个数字微镜。 数字微镜将第一光转换成一个或多个第二光束。 微透镜部分设置在平台和数字微镜部分之间并且包括多个微透镜。 微透镜将一个或多个第二光束转换成照射在基板上的一个或多个第三光束。 第三个光具有椭圆形横截面形状。