Nonvolatile memory device, layer deposition apparatus and method of fabricating a nonvolatile memory device using the same
    6.
    发明申请
    Nonvolatile memory device, layer deposition apparatus and method of fabricating a nonvolatile memory device using the same 审中-公开
    非挥发性存储器件,层淀积设备和使用其的非易失性存储器件的制造方法

    公开(公告)号:US20070196984A1

    公开(公告)日:2007-08-23

    申请号:US11655191

    申请日:2007-01-19

    IPC分类号: H01L21/336

    摘要: Provided are a nonvolatile memory device, a layer deposition apparatus and a method of fabricating a nonvolatile memory device using the same. The apparatus may include a chamber capable of holding a substrate, a particle-discharging target discharging particles toward the substrate, and a first ion beam gun accelerating a first plurality of ions and irradiating the accelerated ions toward the substrate. The method of fabricating a nonvolatile memory device may include discharging particles from a target toward a substrate, accelerating and irradiating a first plurality of ions toward the substrate, forming a reaction product by reacting the discharged particles and the accelerated and irradiated first plurality of ions, and forming a data storage layer having a deposited layer on the substrate. The nonvolatile memory device may include a data storage layer including a transition metal oxide layer formed by reacting discharged transition metal particles and accelerated and irradiated oxygen ions.

    摘要翻译: 提供一种非易失性存储器件,层淀积设备和使用其的非易失性存储器件的制造方法。 该装置可以包括能够保持基板的室,向基板排出颗粒的颗粒排放目标,以及加速第一多个离子并将加速离子朝向基板照射的第一离子束枪。 制造非易失性存储器件的方法可以包括将靶从靶向衬底排放,加速和照射第一多个离子朝向衬底,通过使排出的微粒和加速和照射的第一多个离子反应形成反应产物, 以及在所述基板上形成具有沉积层的数据存储层。 非易失性存储装置可以包括数据存储层,该数据存储层包括通过使放电的过渡金属颗粒和加速和照射的氧离子反应而形成的过渡金属氧化物层。

    Resistive random access memory device
    7.
    发明授权
    Resistive random access memory device 失效
    电阻随机存取存储器件

    公开(公告)号:US07985961B2

    公开(公告)日:2011-07-26

    申请号:US12003133

    申请日:2007-12-20

    IPC分类号: H01L47/00

    摘要: Example embodiments may provide resistive random access memory devices and/or methods of manufacturing resistive random access memory devices. Example embodiment resistive random access memory devices may include a switching device and/or a storage node connected to the switching device. The storage node may include a stack structure including a plurality of resistance change layers separated from one another and first and second electrodes each on a side wall of the stack structure. The resistance change layers may be connected to the first and the second electrodes in parallel and/or may have different switching voltages from each other.

    摘要翻译: 示例性实施例可以提供电阻性随机存取存储器件和/或制造电阻随机存取存储器件的方法。 示例性实施例电阻随机存取存储器设备可以包括连接到交换设备的交换设备和/或存储节点。 存储节点可以包括堆叠结构,其包括彼此分离的多个电阻变化层以及每个在堆叠结构的侧壁上的第一和第二电极。 电阻变化层可以并联连接到第一和第二电极和/或可以具有彼此不同的开关电压。

    Resistive random access memory device including an amorphous solid electrolyte layer
    9.
    发明申请
    Resistive random access memory device including an amorphous solid electrolyte layer 审中-公开
    包括无定形固体电解质层的电阻式随机存取存储器件

    公开(公告)号:US20070176264A1

    公开(公告)日:2007-08-02

    申请号:US11653316

    申请日:2007-01-16

    IPC分类号: H01L29/22

    CPC分类号: H01L45/04 H01L45/145

    摘要: Provided is a resistive memory device including an amorphous solid electrolyte layer in a storage node. The resistive memory device includes a switching device and a storage node connected to the switching device. The storage node includes upper and lower electrodes formed of a bivalent or multivalent metal, and an amorphous solid electrolyte layer and an ion source layer formed of a monovalent metal between the upper and lower electrodes.

    摘要翻译: 提供了一种在存储节点中包括无定形固体电解质层的电阻式存储器件。 电阻式存储器件包括连接到开关器件的开关器件和存储节点。 存储节点包括由二价或多价金属形成的上电极和下电极,以及在上电极和下电极之间由非金属固体电解质层和由一价金属形成的离子源层。