公开(公告)号：US3932585A

公开(公告)日：1976-01-13

申请号：US394680

申请日：1973-09-06

申请人： Sanseki Moriguchi ,  Hiroshi Abe ,  Kiyoshi Saito ,  Makoto Miyazawa

发明人： Sanseki Moriguchi ,  Hiroshi Abe ,  Kiyoshi Saito ,  Makoto Miyazawa

IPC分类号： A44B19/40 ,  B01D53/56 ,  B01D53/77 ,  B01J27/00 ,  C01C3/00

CPC分类号： A44B19/403 ,  B01D53/56

摘要： A method of removing a nitrogen oxide from an exhaust containing the same which comprises preparing an absorbent solution by adding divalent copper ions alone or a mixture of the divalent copper ions and divalent manganese ions to an acid aqueous solution containing sulfites or acid sulfites of ammonium, alkaline metals, or alkaline earth metals or a mixture of two or more of these compounds; and introducing the plant exhaust into the absorbent solution to carry out reaction between the sulfite radical of the absorbent solution and the nitrogen oxides contained in the exhaust to reduce the nitrogen oxides to nitrogen gas.

摘要翻译： 从含有该氧化物的废气中除去氮氧化物的方法包括通过将二价铜离子单独加入或二价铜离子和二价锰离子的混合物制备成含有亚硫酸盐或酸式亚硫酸铵的酸性水溶液来制备吸收剂溶液， 碱金属或碱土金属或两种或多种这些化合物的混合物; 并将工厂废气引入吸收剂溶液中以进行吸收剂溶液的亚硫酸根与废气中所含的氮氧化物之间的反应，将氮氧化物还原为氮气。

公开(公告)号：US4025604A

公开(公告)日：1977-05-24

申请号：US533154

申请日：1974-12-16

申请人： Sanseki Moriguchi ,  Hiroshi Abe ,  Taisuke Nishida ,  Jyoichi Takenaka ,  Makoto Miyazawa ,  Sadayoshi Iwabuchi

发明人： Sanseki Moriguchi ,  Hiroshi Abe ,  Taisuke Nishida ,  Jyoichi Takenaka ,  Makoto Miyazawa ,  Sadayoshi Iwabuchi

IPC分类号： B01D53/94 ,  B01D53/86 ,  B01J23/74 ,  B01J23/745 ,  B01J23/889 ,  B01D53/34

CPC分类号： B01J23/8892 ,  B01D53/8628

摘要： Powder and/or fine particles containing mainly oxides of iron or ferroalloys, which are used or generated in ironworks, steelworks, etc. are sieved to a grain size range between about 32 mesh and about 10mm and used as reduction catalyzer. A reactor is filled with said reduction catalyzer. Exhaust gas containing nitrogen oxides and with added ammonia is passed in contact with said reduction catalyzer through said reactor, while heating said reduction catalyzer to a temperature between about 300.degree. C and about 370.degree. C, whereby nitrogen oxides are removed from said exhaust gas by reduction. Said reduction catalyzer can be used as material for ironmaking, without requiring any further treatment, after use as catalyzer.

摘要翻译： 主要在铁厂，钢铁厂等中使用或生产的铁或铁合金氧化物的粉末和/或细颗粒被筛分至约32目至约10mm之间的晶粒尺寸范围并用作还原催化剂。 反应器装有所述还原催化剂。 含有氮氧化物和加入的氨的废气通过所述反应器与所述还原催化剂接触，同时将所述还原催化剂加热到约300℃至约370℃之间的温度，由此氮氧化物通过 减少。 所述还原催化剂可用作炼铁的材料，而不需要任何进一步的处理，作为催化剂使用。

公开(公告)号：US06929534B2

公开(公告)日：2005-08-16

申请号：US10451381

申请日：2002-01-04

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B13/00 ,  B24B13/01 ,  B24D11/00 ,  B24D13/14 ,  B24B1/00

CPC分类号： B24B13/01 ,  B24D13/147 ,  Y10S451/921

摘要： A polisher for polishing a curved surface such as a concave surface of a spectacle lens has a structure in which a polishing pad 3 comprising water passing grooves 5 having a width W of 0.1 to 5 mm is adhered to a dome-shaped elastic base member 2. The polishing pad 3 is composed of a plurality of pads 31, and the water passing grooves 5 are formed at the gaps between the pads 31, whereby the width W of the water passing grooves 5 are made small. It is effective to make the pads 31 polygonal in shape. The polishing pad 3 covers the moving region 6 of the work 8 to be polished. The polishing pad 3 is adhered through a high-tack adhesive layer 4. A polishing method is adopted in which such a polisher 1 is used and the work 8 is polished by pressing the polishing pad 3 against the work 8, whereby the polishing pad 3 adhered to the elastic base member 2 can be prevented from being stripped by an end edge of the work 8, and generation of defective polish can be prevented.

摘要翻译： 用于研磨诸如眼镜镜片的凹面的弯曲表面的抛光机具有这样的结构，其中将包括宽度W为0.1至5mm的水通过槽5的抛光垫3粘附到圆顶形弹性基底构件2 。 抛光垫3由多个焊盘31组成，并且在焊盘31之间的间隙处形成有水通过槽5，从而使水通过槽5的宽度W变小。 使垫31的形状成多边形是有效的。 抛光垫3覆盖要抛光的工件8的移动区域6。 抛光垫3通过高粘合剂层4粘合。 采用抛光方法，其中使用这种抛光机1并且通过将抛光垫3压靠在工件8上来抛光工件8，从而可以防止粘附到弹性基底构件2上的抛光垫3被剥离 可以防止工件8的端边缘，并且可以防止产生有缺陷的抛光。

公开(公告)号：US20050118929A1

公开(公告)日：2005-06-02

申请号：US10975373

申请日：2004-10-29

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B23Q15/00 ,  B24B13/00 ,  B24B13/06 ,  B24B51/00 ,  B24B49/00

CPC分类号： B24B13/0012 ,  B24B13/06 ,  B24B51/00

摘要： An aspherical surface processing method involves a workpiece to be processed by rotating around a rotation axis, and a rotational tool movable relative to the workpiece in the same direction as the rotation axis of the workpiece and in a direction perpendicular to the rotation axis of the workpiece. The rotational tool is shifted in a fixed direction with a predetermined feed pitch in a partial or entire region from a center of the rotation axis of the workpiece to a periphery of the workpiece in the direction perpendicular to the rotation axis of the workpiece to process the workpiece into a non-axisymmetrical and aspherical surface.

摘要翻译： 非球面表面处理方法涉及通过围绕旋转轴线旋转而被处理的工件，以及可以在与工件的旋转轴线相同的方向上并且在垂直于工件的旋转轴线的方向上相对于工件移动的旋转工具 。 旋转工具在从工件的旋转轴的中心到工件的与工件的旋转轴线垂直的方向的周边的部分或全部区域中以预定的进给间距沿固定方向移动，以处理 工件成非轴对称和非球面。

公开(公告)号：US06743486B1

公开(公告)日：2004-06-01

申请号：US09701634

申请日：2000-12-01

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B914

CPC分类号： B24B13/0055 ,  B24B9/14 ,  B24B9/148

摘要： Production information such as an edging mark 31 indicating a region of a lens remaining after edging and reference position marks 32 are depicted in a region, to be cut off by the edging, of a surface of a lens 10 for spectacles. Any production information does not remain on the finished lens 10 after the edging. A lens processing system 100 includes a reference position detecting apparatus (120 and 130) for detecting a reference position of a spectacle lens, and a marking apparatus (170, 160, 150 and 110) for depicting production information of the lens on a specific surface of the spectacle lens on the basis of the reference position information obtained by the reference position detecting apparatus (120 and 130).

摘要翻译： 在边缘用透镜10的表面的边缘被切割的区域中描绘了生产信息，例如表示边缘残留的透镜区域和基准位置标记32的边缘标记31。 磨边之后任何生产信息都不会保留在成品镜片10上。 透镜处理系统100包括用于检测眼镜镜片的基准位置的基准位置检测装置（120和130）和用于描绘在特定表面上的透镜的生产信息的标记装置（170,160,150和110） 基于由基准位置检测装置（120和130）获得的参考位置信息。

公开(公告)号：US07207863B2

公开(公告)日：2007-04-24

申请号：US11220610

申请日：2005-09-08

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B49/00

CPC分类号： B24B13/046 ,  B24B13/06 ,  Y10T82/10

摘要： An aspheric-surface processing method according to the present invention, uses a cuffing apparatus including at least one turning tool movable in the same direction as the rotating axis of the work and is also movable in a direction perpendicular to the rotating axis of the work. This method includes moving the turning tool at a predetermined feed pitch in a fixed direction over at least a part of the work region extending from the center of the rotating axis of the work to a peripheral portion of the work and also moving the turning tool in another direction perpendicular to the rotating axis of the work in order to process the work for forming an axis-asymmetric aspheric surface.

摘要翻译： 根据本发明的非球面处理方法使用包括至少一个可沿着与工件的旋转轴线相同的方向移动的转动工具的滚压装置，并且也可以在垂直于工件的旋转轴线的方向上移动。 该方法包括：在从工件的旋转轴的中心延伸到工件的周边部分的工作区域的至少一部分上，以固定方向以预定的进给间距移动车削工具，并且还将工具移动 另一方向垂直于工件的旋转轴线，以便处理用于形成轴对称非球面的工作。

公开(公告)号：US07070474B2

公开(公告)日：2006-07-04

申请号：US10779867

申请日：2004-02-18

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B49/00

CPC分类号： B24B13/046 ,  B24B13/06 ,  Y10T82/10

摘要： An aspheric-surface processing method according to the present invention, uses a cutting apparatus including at least one turning tool movable in the same direction as the rotating axis of the work and is also movable in a direction perpendicular to the rotating axis of the work. This method includes moving the turning tool at a predetermined feed pitch in a fixed direction over at least a part of the work region extending from the center of the rotating axis of the work to a peripheral portion of the work and also moving the turning tool in another direction perpendicular to the rotating axis of the work in order to process the work for forming an axis-asymmetric aspheric surface.

摘要翻译： 根据本发明的非球面处理方法，使用包括至少一个可沿着与工件的旋转轴线相同的方向移动的转动工具的切割装置，并且也可以在垂直于工件的旋转轴线的方向上移动。 该方法包括：在从工件的旋转轴的中心延伸到工件的周边部分的工作区域的至少一部分上，以固定方向以预定的进给间距移动车削工具，并且还将工具移动 另一方向垂直于工件的旋转轴线，以便处理用于形成轴对称非球面的工作。

公开(公告)号：US06872120B2

公开(公告)日：2005-03-29

申请号：US09958568

申请日：2001-02-16

申请人： Makoto Miyazawa ,  Yoshinori Tabata ,  Takahiro Uchidani

发明人： Makoto Miyazawa ,  Yoshinori Tabata ,  Takahiro Uchidani

IPC分类号： B24B1/00 ,  B24B9/14 ,  B24B13/01 ,  B24B13/06 ,  C03C19/00 ,  B24B49/00 ,  B24B51/00

CPC分类号： C03C19/00 ,  B24B1/00 ,  B24B9/14 ,  B24B13/01 ,  B24B13/06

摘要： A lens surface shape is created by a near-finish surface forming rough-cutting step of creating a near-finish surface shape analogous to a lens surface shape based on a prescription of a spectacle lens from a spectacle lens base material 11 by numerically controlled cutting, and a finish-cutting step of creating the lens surface shape based on the prescription of the spectacle lens from the near-finish surface shape by numerically controlled cutting. According to this method of producing a spectacle lens, all kinds of spectacle lenses including an inner surface progressive power lens can be produced with high productivity.A complex curved surface can be mirror-polished by a polishing tool, which includes an elastic sheet 41 having a curved surface, wherein a workpiece is polished by applying a pressure to the inner surface side of the elastic sheet 41, to stretch the elastic sheet 41 and bring the outer surface side of the elastic sheet 41 into contact with the workpiece.

摘要翻译： 透镜表面形状通过近似完成的表面形成粗切割步骤产生，其基于通过数控切割从眼镜镜片基材11制备的眼镜镜片的处方，产生类似于镜片表面形状的近似表面形状 以及基于通过数控切割从近成品表面形状基于眼镜镜片的处方产生透镜表面形状的精切割步骤。 根据该眼镜镜片的制造方法，能够以高生产率制造各种具有内表面渐进屈光力镜片的眼镜镜片。复曲面可以通过研磨工具进行镜面抛光，该抛光工具包括：弹性片41， 弯曲表面，其中通过向弹性片41的内表面侧施加压力来抛光工件，以拉伸弹性片41并使弹性片41的外表面侧与工件接触。

公开(公告)号：US20050098798A1

公开(公告)日：2005-05-12

申请号：US10628500

申请日：2003-07-28

申请人： Makoto Miyazawa ,  Kenshi Izumi

发明人： Makoto Miyazawa ,  Kenshi Izumi

IPC分类号： H01L23/522 ,  H01L23/60 ,  H01L27/02 ,  H01L31/0328

CPC分类号： H01L23/60 ,  H01L23/5222 ,  H01L27/0251 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor integrated circuit device includes a terminal and a first capacitance adjusting section. The first capacitance adjusting section is connected to a wiring between the terminal and a protection resistor in front stage of an internal circuit. The first capacitance adjusting section adjusts terminal capacitance of the terminal, based on capacitance of the first capacitance adjusting section. The semiconductor integrated circuit device may further includes a protection circuit which is connected to the wiring between the terminal and the first capacitance adjusting section and protects the internal circuit.

摘要翻译： 半导体集成电路器件包括端子和第一电容调整部分。 第一电容调整部分连接到端子与内部电路前级的保护电阻之间的布线。 第一电容调整部基于第一电容调整部的电容来调整端子的端子电容。 半导体集成电路器件还可以包括保护电路，其连接到端子与第一电容调整部分之间的布线并保护内部电路。

公开(公告)号：US20050003742A1

公开(公告)日：2005-01-06

申请号：US10501142

申请日：2003-01-14

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B13/01 ,  B24B13/00 ,  B24B37/00 ,  B24B37/20 ,  B24B37/24 ,  B24D13/14 ,  B24B1/00 ,  B24B7/30

CPC分类号： B24B13/02 ,  B24B13/012 ,  B24D13/14

摘要： A polishing method particularly suitable for mirror-polishing the concave surface of a lens and a polishing device, the method characterized by including the step of polishing work surfaces (50a, 50b) while allowing parts of the dome-shaped parts of elastic polishing objects (10a, 10b) matching the curved shapes of the concaved work surfaces of the works (50a, 50b) selected from among the plurality of the elastic polishing bodies having the dome-shaped parts (11a, 11b) different in curvature and larger in area than the concaved work surfaces of the works (50a, 50b) to come into contact with the generally entire surfaces of the work surfaces, wherein the curvature centers (40) of the dome-shaped parts are generally aligned with the swing centers (41) of the works, whereby the concaved work surfaces can be rapidly and uniformly polished.

摘要翻译： 一种特别适用于对镜片的凹面进行镜面抛光的研磨方法及抛光装置，其特征在于，包括：对工件表面（50a，50b）进行抛光的同时允许弹性抛光对象的圆顶状部件 10a，10b）匹配从具有不同曲率的圆顶形部分（11a，11b）的多个弹性抛光体中选出的工件（50a，50b）的凹形工作表面的曲面形状比面积大 工件（50a，50b）的凹陷的工作表面与工作表面的大致整个表面接触，其中圆顶形部件的弯曲中心（40）大致与摆动中心（41）的摆动中心 工件，从而可以快速均匀地抛光凹面。