公开(公告)号：US20160008944A1

公开(公告)日：2016-01-14

申请号：US14772307

申请日：2014-04-24

申请人： Jun ZHA ,  Yaolong CHEN ,  Chuan ZHANG ,  Xiaoyan CHEN ,  XI ' AN JIAOTONG UNIVERSITY ,  RESEARCH INSTITUTE OF XI'AN JIAOTONG UNIVERSITY IN SUZHOU

发明人： Yaolong Chen ,  Chuan Zhang ,  Xiaoyan Chen ,  Jun Zha

IPC分类号： B24B9/14

CPC分类号： B24B9/14 ,  B24B13/0018 ,  B24B13/012 ,  B24B13/02

摘要： A polishing device for optical elements includes: a tool shank (1), and a polishing disc base; wherein the tool shank (1) is connected to the polishing disc base and is mounted on a tool shaft of a numerical-controlled processing device; wherein a polishing film (3) is stuck on the polishing disc base; the polishing disc base is a profiling polishing disc base (7), a cylinder polishing disc base (2), a profiling polishing disc base (12) or a spherical polishing disc base (8); wherein the tool shank (1) is independent and universal, thereby reducing the processing cost of the polishing device. A polishing method for optical elements is based on the shapes mentioned above of the polishing disc base.

摘要翻译： 一种用于光学元件的抛光装置包括：工具柄（1）和抛光盘基座; 其中所述工具柄（1）连接到所述抛光盘基座并且安装在数控处理装置的工具轴上; 其中抛光膜（3）粘附在抛光盘基座上; 抛光盘基座是轮廓抛光盘基座（7），圆柱抛光盘基座（2），仿形抛光盘基座（12）或球面抛光盘基座（8）; 其中所述工具柄（1）是独立且通用的，从而降低了抛光装置的加工成本。 用于光学元件的抛光方法基于上述抛光盘基座的形状。

公开(公告)号：US06945849B2

公开(公告)日：2005-09-20

申请号：US10501142

申请日：2003-01-14

申请人： Makoto Miyazawa

发明人： Makoto Miyazawa

IPC分类号： B24B13/01 ,  B24B13/00 ,  B24B37/00 ,  B24B37/20 ,  B24B37/24 ,  B24D13/14 ,  B24B1/00 ,  B24B49/00 ,  B24B51/00

CPC分类号： B24B13/02 ,  B24B13/012 ,  B24D13/14

摘要： A polishing method particularly suitable for mirror-polishing the concave surface of a lens and a polishing device, the method characterized by including the step of polishing work surfaces (50a, 50b) while allowing parts of the dome-shaped parts of elastic polishing objects (10a, 10b) matching the curved shapes of the concaved work surfaces of the works (50a, 50b) selected from among the plurality of the elastic polishing bodies having the dome-shaped parts (11a, 11b) different in curvature and larger in area than the concaved work surfaces of the works (50a, 50b) to come into contact with the generally entire surfaces of the work surfaces, wherein the curvature centers (40) of the dome-shaped parts are generally aligned with the swing centers (41) of the works, whereby the concaved work surfaces can be rapidly and uniformly polished.

摘要翻译： 一种特别适用于对镜片和抛光装置的凹面进行镜面抛光的抛光方法，其特征在于包括：抛光工作表面（50a，50b）同时允许部分弹性抛光的圆顶形部分 从具有圆顶形部分（11a，11b）的多个弹性抛光体中选择的工件（50a，50b）的凹形工作表面的弯曲形状匹配的物体（10a，10b） 不同于曲面，面积大于工件（50μm，50b）的凹陷工作表面与工作表面的大致整个表面接触，其中圆顶形部件的曲率中心（40）为 通常与工件的摆动中心（41）对齐，从而可以快速均匀地抛光凹面。

公开(公告)号：US06932678B2

公开(公告)日：2005-08-23

申请号：US10339250

申请日：2003-01-09

申请人： Yoshiaki Toyoshima ,  Hideo Toriumi ,  Shin-ichiro Taguchi

发明人： Yoshiaki Toyoshima ,  Hideo Toriumi ,  Shin-ichiro Taguchi

IPC分类号： B24B13/02 ,  B24B49/00 ,  B24B1/00

CPC分类号： B24B49/00 ,  B24B13/005 ,  B24B13/0052 ,  B24B13/01 ,  B24B13/012 ,  B24B13/02

摘要： A polishing apparatus includes a polishing jig. The polishing jig includes an elastic balloon member, a fixture, and a fluid supply portion. The fixture airtightly closes the rear opening portion of the balloon member. The fluid supply portion supplies a fluid into a space formed by the fixture and balloon member. The balloon member has a cup shape constructed by a dome portion and a cylinder portion extending backward from the outer periphery of the dome portion. The fixture fixes the opening portion of the cylinder portion of the balloon member.

公开(公告)号：US06439967B2

公开(公告)日：2002-08-27

申请号：US09145400

申请日：1998-09-01

申请人： Craig M. Carpenter

发明人： Craig M. Carpenter

IPC分类号： B24B722

CPC分类号： B24B37/12 ,  B24B13/012 ,  B24B37/20 ,  B24B37/26 ,  B24D9/08

摘要： A plurality of planarizing machines for microelectronic substrate assemblies, and methods of mechanical and chemical-mechanical planarization of microelectronic substrate assemblies are disclosed. The planarizing machines for processing microelectronic substrate assemblies generally include a table, a pad support assembly either positioned on or in the table, and a planarizing medium coupled to the pad support assembly. The pad support assembly includes a fluid container and an elastic membrane coupled to the fluid container. The fluid container generally is a basin either that is either a separate component that is attached to the table, or a depression in the table itself. The fluid container can also be a bladder attached to the table. The membrane generally has a first surface engaging a portion of the fluid container to define a fluid chamber or cavity, and the membrane has a second surface to which the planarizing medium is attached. The planarizing medium can be a polishing pad attached directly to the second surface of the membrane, or the planarizing medium can be a polishing pad with an under-pad that is attached to the second surface of the membrane. The fluid chamber is filled with support fluid to support the elastic membrane over the fluid chamber. The support fluid can be water, glycerin, air, or other suitable fluids that support the elastic membrane in a manner that allows the membrane and the planarizing medium to freely flex inward into the fluid chamber under the influence of a mechanical force to provide at least a substantially uniform distribution of pressure across the substrate.

摘要翻译： 公开了用于微电子衬底组件的多个平面化机器，以及微电子衬底组件的机械和化学机械平面化的方法。 用于处理微电子衬底组件的平面化机器通常包括一个桌子，一个定位在桌子上或桌子上的衬垫支撑组件以及耦合到衬垫支撑组件的平面化介质。 垫支撑组件包括流体容器和联接到流体容器的弹性膜。 流体容器通常是盆地，或者是连接到桌子上的单独部件或桌子本身的凹陷部分。 流体容器也可以是附着在桌子上的气囊。 膜通常具有接合流体容器的一部分以限定流体室或空腔的第一表面，并且膜具有附着有平坦化介质的第二表面。 平坦化介质可以是直接附接到膜的第二表面的抛光垫，或者平坦化介质可以是具有附着到膜的第二表面的底垫的抛光垫。 流体室填充有支撑流体以将弹性膜支撑在流体室上。 支撑流体可以是水，甘油，空气或其它合适的流体，其以允许膜和平坦化介质在机械力的影响下自由地向内进入流体室的方式支撑弹性膜，以至少提供 跨过基底的压力基本均匀分布。

公开(公告)号：US20010044269A1

公开(公告)日：2001-11-22

申请号：US09145400

申请日：1998-09-01

发明人： CRAIG M. CARPENTER

IPC分类号： B24B005/00 ,  B24B029/00

CPC分类号： B24B37/12 ,  B24B13/012 ,  B24B37/20 ,  B24B37/26 ,  B24D9/08

摘要： A plurality of planarizing machines for microelectronic substrate assemblies, and methods of mechanical and chemical-mechanical planarization of microelectronic substrate assemblies are disclosed. The planarizing machines for processing microelectronic substrate assemblies generally include a table, a pad support assembly either positioned on or in the table, and a planarizing medium coupled to the pad support assembly. The pad support assembly includes a fluid container and an elastic membrane coupled to the fluid container. The fluid container generally is a basin either that is either a separate component that is attached to the table, or a depression in the table itself. The fluid container can also be a bladder attached to the table. The membrane generally has a first surface engaging a portion of the fluid container to define a fluid chamber or cavity, and the membrane has a second surface to which the planarizing medium is attached. The planarizing medium can be a polishing pad attached directly to the second surface of the membrane, or the planarizing medium can be a polishing pad with an under-pad that is attached to the second surface of the membrane. The fluid chamber is filled with support fluid to support the elastic membrane over the fluid chamber. The support fluid can be water, glycerin, air, or other suitable fluids that support the elastic membrane in a manner that allows the membrane and the planarizing medium to freely flex inward into the fluid chamber under the influence of a mechanical force to provide at least a substantially uniform distribution of pressure across the substrate.

摘要翻译： 公开了用于微电子衬底组件的多个平面化机器，以及微电子衬底组件的机械和化学机械平面化的方法。 用于处理微电子衬底组件的平面化机器通常包括一个桌子，一个定位在桌子上或桌子上的衬垫支撑组件以及耦合到衬垫支撑组件的平面化介质。 垫支撑组件包括流体容器和联接到流体容器的弹性膜。 流体容器通常是盆地，或者是连接到桌子上的单独部件或桌子本身的凹陷部分。 流体容器也可以是附着在桌子上的气囊。 膜通常具有接合流体容器的一部分以限定流体室或空腔的第一表面，并且膜具有附着有平坦化介质的第二表面。 平坦化介质可以是直接附接到膜的第二表面的抛光垫，或者平坦化介质可以是具有附着到膜的第二表面的底垫的抛光垫。 流体室填充有支撑流体以将弹性膜支撑在流体室上。 支撑流体可以是水，甘油，空气或其它合适的流体，其以允许膜和平坦化介质在机械力的影响下自由地向内进入流体室的方式支撑弹性膜，以至少提供 跨过基底的压力基本均匀分布。

公开(公告)号：US4458454A

公开(公告)日：1984-07-10

申请号：US299949

申请日：1981-09-08

申请人： Howard J. Barnett

发明人： Howard J. Barnett

IPC分类号： G02C7/04 ,  B24B13/00 ,  B24B13/02 ,  B29D11/00

CPC分类号： B24B13/012 ,  B24B13/02 ,  B29D11/00932

摘要： Various forms of contact lenses can be produced having improved properties. The surface of the lens to be polished is brought into contact with a polishing compound associated with a flexible (but non-resilient) sheet, causing the sheet to flex. Fluid pressure is applied to the sheet counteracting the flexing as a result of lens contact, so that polishing compound associated with the sheet makes contact with the lens surface with uniform force distribution. Relative rotation between the lens and sheet is effected so that all portions of the lens surface in contact with the polishing compound are polished to the same extent. The lens may then be ground to provide a multifocal lens. A multifocal hydrophilic or silicone contact lens having desired distance and intermediate powers may be constructed by acting on the lens so that it is capable of accepting grinding activity, and then effecting distortion-free grinding thereof. Usually a single vision hydrophilic or silicone lens is fitted in a wearer's eye, and then is removed and ground to provide a multifocal contact lens suitable for use by the wearer.

摘要翻译： 可以制造具有改进性能的各种形式的隐形眼镜。 要抛光的透镜的表面与与柔性（但非弹性）片材相关联的抛光组合物接触，导致片材弯曲。 由于透镜接触，流体压力被施加到抵消挠曲的片材上，使得与片材相关联的抛光剂与镜片表面接触，具有均匀的力分布。 实现透镜和片材之间的相对旋转，使得与抛光化合物接触的透镜表面的所有部分都被抛光到相同的程度。 然后可以将透镜研磨以提供多焦点透镜。 具有期望距离和中等功率的多焦点亲水或有机硅隐形眼镜可以通过作用在透镜上而构成，使得其能够接受研磨活性，然后进行无变形的研磨。 通常，将单一视觉亲水或硅胶镜片安装在佩戴者的眼睛中，然后被移除并研磨以提供适合于佩戴者使用的多焦点隐形眼镜。

公开(公告)号：US2328533A

公开(公告)日：1943-08-31

申请号：US42438241

申请日：1941-12-26

申请人： ALNCIN INC

发明人： VICTOR WALKER

IPC分类号： B24B13/01 ,  B24B13/02 ,  B24B19/22

CPC分类号： B24B19/226 ,  B24B13/012 ,  B24B13/02 ,  Y10S359/90

公开(公告)号：US11839944B2

公开(公告)日：2023-12-12

申请号：US17891015

申请日：2022-08-18

申请人： ZHEJIANG UNIVERSITY

发明人： Wule Zhu ,  Fang Han ,  Lu Wu ,  Anyu Sun ,  Bingfeng Ju

IPC分类号： B24B1/04 ,  B24B41/04 ,  B24B35/00 ,  B06B3/02 ,  B24B13/01

CPC分类号： B24B13/012 ,  B06B3/02 ,  B24B1/04 ,  B24B35/00 ,  B24B41/04

摘要： A floating non-contact ultrasonic enhanced flexible sub-aperture polishing device and method are disclosed, an X-axis moving platform, a Y-axis moving platform, a Z-axis moving platform and a workpiece swinging platform in linkage control ensure normal lines of a tool and a workpiece are kept at an identical angle to realize sub-aperture processing; the ventilation main shaft acts air pressure on the ball spline's end portion to form an axial thrust to let the tool axially float; a dynamic balance among hydrodynamic pressure, air pressure and dynamic pressure is performed on the polishing liquid by rotation of the flexible tool; a tiny gap between the tool and workpiece is formed by elastic deformation of the flexible tool due to the dynamic pressure; a shearing force for removing materials is generated when the polishing liquid flows through the gap; a cavitation effect in the gap is formed by ultrasonic waves.

公开(公告)号：US20110195645A1

公开(公告)日：2011-08-11

申请号：US13021849

申请日：2011-02-07

申请人： Colin Williams

发明人： Colin Williams

IPC分类号： B24B13/02

CPC分类号： B24B13/02 ,  B24B13/012

摘要： There is disclosed a tool for smoothing or polishing an optical surface. The tool comprises: a body part which is rotatable about an axis of rotation; and a plurality of pads arranged in an array to bear against said optical surface for movement across the surface as the tool is rotated about said axis of rotation, wherein said pads are each mounted: i) for substantially linear movement relative to said body part in a direction substantially normal to said surface in the region where the pad contacts the surface; and ii) universal pivotal movement relative to said body part. The pads are biased towards said optical surface. In a preferred arrangement, a plurality of pistons are mounted for individual reciprocating movement relative to the body part along respective longitudinal axes, each of said pistons having a distal end to which a respective said pad is universally articulated, wherein said pistons are each biased towards said optical surface.

摘要翻译： 公开了一种用于平滑或抛光光学表面的工具。 该工具包括：可围绕旋转轴线旋转的主体部分; 以及当所述工具围绕所述旋转轴线旋转时，布置成阵列布置成抵靠所述光学表面以移动穿过所述表面的多个焊盘，其中所述焊盘各自安装：i）用于相对于所述主体部分基本上线性移动 在焊盘接触表面的区域中基本上垂直于所述表面的方向; 和ii）相对于所述身体部位的通用枢转运动。 垫片朝向所述光学表面偏置。 在优选的布置中，安装多个活塞以相对于主体部分沿着相应的纵向轴线进行单独的往复运动，每个所述活塞具有远端，相应的所述垫普遍地铰接在所述远端上，其中所述活塞各自朝向 所述光学表面。

公开(公告)号：US07854645B2

公开(公告)日：2010-12-21

申请号：US11729799

申请日：2007-03-30

申请人： Sven Kiontke ,  Thomas Kurschel

发明人： Sven Kiontke ,  Thomas Kurschel

IPC分类号： B24B51/00

CPC分类号： B24B13/012 ,  B24B1/00 ,  B24B13/06

摘要： A method is disclosed, whereby a reduced wear of the polishing tool and a reduced duration for the polishing process may be achieved and also free form surfaces and non-rotating workpieces may be polished. The above may be achieved whereby the surface of the tool actually in contact with the workpiece lies off the tool axis. The invention further relates to a method for polishing a surface of a workpiece, via a tool rotating about a tool axis, whereby the workpiece, at least in one region of the workpiece surface has a contacted surface which is part region of a surface for machining, which for its part is at least part of a polishing surface of the tool, whereby the tool axis intersects the polishing surface.

摘要翻译： 公开了一种方法，由此可以实现抛光工具的磨损减少和抛光过程的持续时间减少，并且可以抛光自由形式的表面和非旋转工件。 可以实现上述，其中工具的实际上与工件接触的表面离开工具轴线。 本发明还涉及一种用于通过围绕工具轴线旋转的工具抛光工件的表面的方法，由此工件在工件表面的至少一个区域中具有作为用于加工的表面的部分区域的接触表面 ，其一部分是工具的抛光表面的至少一部分，由此工具轴线与抛光表面相交。