公开(公告)号：US20060098978A1

公开(公告)日：2006-05-11

申请号：US11273463

申请日：2005-11-10

申请人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。