公开(公告)号：US20060098978A1

公开(公告)日：2006-05-11

申请号：US11273463

申请日：2005-11-10

申请人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US20100190116A1

公开(公告)日：2010-07-29

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03F7/20 ,  B05D3/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US20060098979A1

公开(公告)日：2006-05-11

申请号：US11273465

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

公开(公告)号：US08496761B2

公开(公告)日：2013-07-30

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US20100159142A1

公开(公告)日：2010-06-24

申请号：US12719788

申请日：2010-03-08

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： B05D3/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US08034190B2

公开(公告)日：2011-10-11

申请号：US12719788

申请日：2010-03-08

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： B08B3/00 ,  G03F7/00 ,  H01L21/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US20100136257A1

公开(公告)日：2010-06-03

申请号：US12698862

申请日：2010-02-02

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： B05D3/06

CPC分类号： G03F7/30 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67225

摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.

摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括在所述曝光装置的曝光处理之前由所述第一处理单元在所述基板上形成感光膜，以及 在形成所述感光膜之后并且在所述曝光处理之前，通过在所述第二处理单元中向所述基板供应洗涤液体来向所述基板施加洗涤处理。 该方法还包括在所述第二处理单元的洗涤处理之后并且在曝光处理之前对所述第二处理单元中的基板进行干燥处理，并且在曝光处理之后，通过所述第三处理单元对基板进行显影处理。 将干燥处理应用于基板包括向供给洗涤液的基板供给惰性气体的工序。

公开(公告)号：US20060152694A1

公开(公告)日：2006-07-13

申请号：US11295216

申请日：2005-12-06

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： G03B27/32

CPC分类号： G03F7/30 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67225

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The washing processing block comprises washing processing group. A resist film is formed in the resist film processing block. Before the substrate is subjected to exposure processing by the exposure device, the substrate is subjected to washing and drying processing in the washing processing group.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，洗涤处理块和接口块。 曝光装置设置在接口块附近。 洗涤处理块包括洗涤处理组。 在抗蚀剂膜处理块中形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在洗涤处理组中对基板进行洗涤和干燥处理。

公开(公告)号：US08585830B2

公开(公告)日：2013-11-19

申请号：US12698870

申请日：2010-02-02

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。

公开(公告)号：US20100136492A1

公开(公告)日：2010-06-03

申请号：US12698870

申请日：2010-02-02

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： G03F7/20

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.

摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：通过所述第一处理在基板上形成由感光材料制成的感光膜 所述曝光装置进行曝光处理之前的单元。 该方法还包括在由所述第一处理单元形成所述感光膜之后并且在所述曝光装置进行曝光处理之前，通过所述第二处理单元对所述基板进行洗涤处理，并将所述基板在所述清洗处理之后传送到所述曝光装置。 所述方法还包括从所述曝光装置运送所述基板并将所述第三处理单元的显影处理应用于由所述曝光装置进行曝光处理之后运送的所述基板。