公开(公告)号：US20060098978A1

公开(公告)日：2006-05-11

申请号：US11273463

申请日：2005-11-10

申请人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Schuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US20100190116A1

公开(公告)日：2010-07-29

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03F7/20 ,  B05D3/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US20060098979A1

公开(公告)日：2006-05-11

申请号：US11273465

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

公开(公告)号：US08496761B2

公开(公告)日：2013-07-30

申请号：US12754872

申请日：2010-04-06

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： B08B3/00 ,  H01L21/31 ,  G03F7/00 ,  G03F1/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。

公开(公告)号：US20100159142A1

公开(公告)日：2010-06-24

申请号：US12719788

申请日：2010-03-08

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： B05D3/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US08034190B2

公开(公告)日：2011-10-11

申请号：US12719788

申请日：2010-03-08

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kasuhito Shigemori ,  Toru Asano ,  Akihiro Hisai ,  Hiroshi Kobayashi ,  Tsuyoshi Okumura

IPC分类号： B08B3/00 ,  G03F7/00 ,  H01L21/00

CPC分类号： G03F7/70991 ,  G03F7/7075 ,  Y10S438/906 ,  Y10S438/908

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。

公开(公告)号：US20060104635A1

公开(公告)日：2006-05-18

申请号：US11273439

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  Y10S414/135

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 在抗蚀剂膜处理块中的基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在抗蚀剂覆盖膜处理块的抗蚀剂膜上形成抗蚀剂覆盖膜。

公开(公告)号：US07726891B2

公开(公告)日：2010-06-01

申请号：US11273439

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

IPC分类号： G03D5/00 ,  G03B27/32 ,  B05C11/00

CPC分类号： G03F7/70991 ,  Y10S414/135

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 在抗蚀剂膜处理块中的基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在抗蚀剂覆盖膜处理块的抗蚀剂膜上形成抗蚀剂覆盖膜。

公开(公告)号：US20050220985A1

公开(公告)日：2005-10-06

申请号：US11130376

申请日：2005-05-16

申请人： Koji Kaneyama ,  Akihiro Hisai

发明人： Koji Kaneyama ,  Akihiro Hisai

IPC分类号： B05C11/00 ,  B05D1/00 ,  G03F7/16 ,  G11B7/26 ,  H01L21/00

CPC分类号： H01L21/67253 ,  G03F7/16 ,  G11B7/261

摘要： A substrate processing apparatus is provided with a film quality measuring device that measures the density of a resist film on a substrate as the film quality. Measurement of the density of the resist film is performed after resist-coating or during or after heat-treatment followed by the resist-coating. The film quality measuring device also measures the thickness of the resist film on the substrate before exposure after the heat-treatment followed by the resist-coating. A controller controls a processing condition in a coater or a heating device so that each of the density and thickness of the resist film on the substrate falls within an acceptable range.

摘要翻译： 基板处理装置设置有膜质量测量装置，其测量作为膜质量的基板上的抗蚀剂膜的密度。 抗蚀剂膜的密度的测量在抗蚀涂层之后或在热处理之后或之后进行抗蚀剂涂覆。 膜质量测量装置还测量在热处理之后的抗蚀剂涂层之前的曝光之前的基板上的抗蚀剂膜的厚度。 控制器控制涂布机或加热装置中的处理条件，使得基板上的抗蚀剂膜的密度和厚度各自在可接受的范围内。

公开(公告)号：US06913781B2

公开(公告)日：2005-07-05

申请号：US10170776

申请日：2002-06-12

申请人： Koji Kaneyama ,  Akihiro Hisai

发明人： Koji Kaneyama ,  Akihiro Hisai

IPC分类号： B05C11/00 ,  B05C11/08 ,  B05D1/40 ,  B05D3/00 ,  B05D3/02 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  B05C9/14 ,  B05D11/00

CPC分类号： H01L21/67253 ,  B05D3/0254 ,  G03F7/162

摘要： A substrate processing apparatus is provided with five inspection devices that perform inspections of different kinds to a substrate. Among the five kinds of inspections, the film quality is measured after resist coating, and before post-coating heat-treatment. As the film quality, the amount of solvent remaining in a resist film is measured. The film thickness is measured after heat-treatment following resist coating and before exposure. Meanwhile, the line width and the superposition precision are measured and macroscopic defect inspection is performed after post-development heat-treatment and before the substrate is returned to an indexer.

摘要翻译： 基板处理装置设置有五个检查装置，其对基板执行不同种类的检查。 在五种检查中，电影质量在抗蚀涂层后和涂布前热处理后进行测量。 作为膜质量，测定保留在抗蚀剂膜中的溶剂量。 在抗蚀涂层和曝光前的热处理后测量膜厚度。 同时，测量线宽和叠加精度，并且在显影后热处理之后并且在将基板返回到分度器之前进行宏观缺陷检查。