公开(公告)号：US20110234710A1

公开(公告)日：2011-09-29

申请号：US13071435

申请日：2011-03-24

申请人： Seiichi Fujita ,  Shiro Yazaki

发明人： Seiichi Fujita ,  Shiro Yazaki

IPC分类号： B41J2/045 ,  H01L41/22

CPC分类号： B41J2/14233 ,  B41J2202/03 ,  Y10T29/42

摘要： There is provided a liquid ejecting head in which a surface layer of a vibration plate at the side of a flow path formation substrate is formed by an insulating film made of zirconium oxide and a protection film made of a material which is resistant to liquid is provided on a surface of the flow path formation substrate so as to cover wall surfaces of liquid flow paths.

摘要翻译： 提供了一种液体喷射头，其中通过由氧化锆制成的绝缘膜形成在流路形成基板一侧的振动板的表面层，并且提供由耐液体的材料制成的保护膜 在流路形成基板的表面上，以覆盖液流路径的壁面。

公开(公告)号：US06375858B1

公开(公告)日：2002-04-23

申请号：US09423788

申请日：2000-01-05

申请人： Tomohiro Makigaki ,  Taro Takekoshi ,  Masahiro Fujii ,  Koji Kitahara ,  Seiichi Fujita

发明人： Tomohiro Makigaki ,  Taro Takekoshi ,  Masahiro Fujii ,  Koji Kitahara ,  Seiichi Fujita

IPC分类号： B41J204

CPC分类号： B41J2/1629 ,  B41J2/16 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1635 ,  B41J2002/043 ,  B41J2002/14387 ,  B41J2002/14411

摘要： When a nozzle 21 with a stepwise cross-section, which is provided with a small cross-sectional nozzle portion 21a formed on the front side thereof and with a large cross-sectional nozzle portion 21b formed on the rear side thereof in a discharge direction, respectively, is formed by applying etching to a silicon wafer 200 for forming a nozzle plate 2, a resist film 210 is formed on a surface 200a of the silicon wafer 200, and patterning by half-etching and patterning by full-etching is applied to the resist film 210. Next, anisotropic-dry-etching is applied to the silicon wafer 200 by ICP discharge, thereby forming grooves at the full-etched portions. Next, the resist film at the half-etched portions is removed and anisotropic-dry-etching is applied to the portions from which the resist film is removed by ICP discharge. As a result, there can be simply formed on a monocrystalline silicon substrate an ink nozzle having a stepwise cross-section and further having an action, which is larger than that of a conventional ink nozzle, for aligning the directions of pressures applied from cavities to nozzles in a nozzle axis direction.

摘要翻译： 当具有形成在其前侧上的小截面喷嘴部分21a和在排放方向上形成在其后侧上的大截面喷嘴部分21b的具有逐级横截面的喷嘴21时， 分别通过对用于形成喷嘴板2的硅晶片200进行蚀刻而形成，在硅晶片200的表面200a上形成抗蚀剂膜210，并且通过半蚀刻和通过全蚀刻进行图案化的图案被应用于 抗蚀剂膜210.接下来，通过ICP放电对硅晶片200施加各向异性干法蚀刻，从而在全蚀刻部分形成槽。 接下来，去除半蚀刻部分的抗蚀剂膜，并且通过ICP放电将抗蚀剂膜除去的部分施加各向异性干蚀刻。 结果，可以简单地在单晶硅衬底上形成具有逐步横截面并且还具有大于常规油墨喷嘴的作用的墨喷嘴，用于将从腔施加的压力的方向对准 喷嘴沿喷嘴轴线方向。

公开(公告)号：US5856892A

公开(公告)日：1999-01-05

申请号：US760277

申请日：1996-12-04

申请人： Yoshitaka Hasunuma ,  Susumu Kikuchi ,  Nobumasa Kabe ,  Minoru Fujita ,  Seiichi Fujita

发明人： Yoshitaka Hasunuma ,  Susumu Kikuchi ,  Nobumasa Kabe ,  Minoru Fujita ,  Seiichi Fujita

IPC分类号： G11B5/027 ,  G11B5/008 ,  G11B5/035 ,  G11B20/04 ,  G11B20/10 ,  H03G7/06 ,  G11B5/02

CPC分类号： G11B5/035 ,  G11B20/10009 ,  G11B5/00813 ,  H03G7/06

摘要： A recording apparatus in which a level of an input signal is adjusted by a variable gain amplifying circuit, and the input signal is recorded onto a recording medium. The level of the input signal is detected, a gain adjustment amount of the variable gain amplifying circuit is determined in accordance with the level of the input signal, a gain of the variable gain amplifying circuit is changed by the determined gain adjustment amount, and the gain adjustment amount is increased as the level of the input signal becomes larger. When the input signal level is low, therefore, the gain control amount is suppressed and, when a possibility such that the input signal level is the peak level of the music source is high and the input signal level is large, the gain adjustment amount is increased in accordance with the input signal level.

摘要翻译： 一种记录装置，其中通过可变增益放大电路调节输入信号的电平，并将输入信号记录在记录介质上。 检测输入信号的电平，根据输入信号的电平确定可变增益放大电路的增益调整量，可变增益放大电路的增益改变所确定的增益调整量，并且 增益调整量随着输入信号的电平变大而增加。 因此，当输入信号电平较低时，增益控制量被抑制，并且当输入信号电平是音乐源的峰值电平为高并且输入信号电平较大的可能性时，增益调整量为 根据输入信号电平增加。

公开(公告)号：US4268295A

公开(公告)日：1981-05-19

申请号：US55456

申请日：1979-07-06

申请人： Katsuji Yamamoto ,  Yuichiro Iwasaki ,  Akira Adachi ,  Toshiro Kawata ,  Keisuke Nagano ,  Seiichi Fujita ,  Mikio Harada

发明人： Katsuji Yamamoto ,  Yuichiro Iwasaki ,  Akira Adachi ,  Toshiro Kawata ,  Keisuke Nagano ,  Seiichi Fujita ,  Mikio Harada

IPC分类号： C04B5/02 ,  C21B3/08 ,  C03B19/10

CPC分类号： C21B3/08 ,  Y02P10/265 ,  Y02P10/283

摘要： Apparatus and method for manufacturing crushed sands from blast furnace melted slags including maintaining molten blast furnace melted slags out of contact with water while cooling the molten slags to a temperature between 850.degree. C. to 1300.degree. C. and then rapidly cooling the cooled slags with water thereby producing coarse grain hard quality water processed slags.

摘要翻译： 用于从高炉熔融炉渣制造粉碎砂的设备和方法，包括将熔融高炉熔融炉渣与水接触，同时将熔融炉渣冷却至850℃至1300℃之间的温度，然后用冷却炉 水，从而生产粗粮硬质水加工炉渣。

公开(公告)号：US08819935B2

公开(公告)日：2014-09-02

申请号：US13079287

申请日：2011-04-04

申请人： Seiichi Fujita ,  Yutaka Yamazaki

发明人： Seiichi Fujita ,  Yutaka Yamazaki

IPC分类号： B21D53/76 ,  B23P17/00 ,  B41J2/05 ,  B41J2/16 ,  B41J2/14

CPC分类号： B41J2/161 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14241 ,  B41J2002/14491 ,  Y10T29/49401

摘要： A method for producing a liquid-ejecting head including a passage-forming substrate and a protective substrate. The passage-forming substrate has pressure-generating chambers communicating with nozzle orifices, piezoelectric devices that change the inner pressures of the pressure-generating chambers, and liquid supply channels for supplying the pressure-generating chambers. The protective substrate has a piezoelectric-device accommodating portion and a through-hole, through which wirings to lead electrodes extended from the piezoelectric devices pass thorough. The method includes forming the piezoelectric-device accommodating portion and a portion of the through-hole in the protective substrate while leaving a lid, a portion of the protective substrate, closing off an opening of the through-hole, bonding the protective substrate to the passage-forming substrate, forming the pressure-generating chambers and the liquid supply channels in the passage-forming substrate, forming a protective film on surfaces of the passage-forming substrate and the protective substrate, and removing the lid to complete the formation of the through-hole.

摘要翻译： 一种包括通道形成基板和保护基板的液体喷射头的制造方法。 通道形成基板具有与喷嘴孔连通的压力产生室，改变压力发生室的内部压力的压电装置和用于供应压力产生室的液体供应通道。 保护基板具有压电器件容纳部和贯通孔，使从压电元件延伸的引线电极的布线通过。 该方法包括在保留基板的同时留下盖子的同时形成压电装置容纳部分和通孔的一部分，保护基板的一部分封闭通孔的开口，将保护基板接合到 通道形成基板，在通道形成基板中形成压力产生室和液体供应通道，在通道形成基板和保护基板的表面上形成保护膜，并且移除盖以完成 通孔。

公开(公告)号：US06863375B2

公开(公告)日：2005-03-08

申请号：US10026315

申请日：2001-12-20

申请人： Tomohiro Makigaki ,  Taro Takekoshi ,  Masahiro Fujii ,  Koji Kitahara ,  Seiichi Fujita

发明人： Tomohiro Makigaki ,  Taro Takekoshi ,  Masahiro Fujii ,  Koji Kitahara ,  Seiichi Fujita

IPC分类号： B41J2/16 ,  B41J2/14

CPC分类号： B41J2/1629 ,  B41J2/16 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1635 ,  B41J2002/043 ,  B41J2002/14387 ,  B41J2002/14411

摘要： A silicon nozzle plate includes nozzles each with a first nozzle portion having a circular cross-section and a second nozzle portion having a circular cross-section wherein the circular cross-section of the first nozzle portion is smaller than the circular cross-section of the second nozzle portion. In one embodiment the nozzle plate is utilized in an inkjet head and includes a recess having a flat bottom surface that commonly communicates with a plurality of first nozzle portions and a through hole that exposes terminal portions that supply control signals to pressure generators.

摘要翻译： 硅喷嘴板包括各自具有圆形横截面的第一喷嘴部分和具有圆形横截面的第二喷嘴部分的喷嘴，其中第一喷嘴部分的圆形横截面小于第一喷嘴部分的圆形横截面 第二喷嘴部。 在一个实施例中，喷嘴板用于喷墨头中，并且包括具有平坦的底表面的凹槽，该平坦的底表面与多个第一喷嘴部分共通地连通，以及暴露将压力发生器提供控制信号的端子部分的通孔。

公开(公告)号：US07914128B2

公开(公告)日：2011-03-29

申请号：US12413422

申请日：2009-03-27

申请人： Seiichi Fujita

发明人： Seiichi Fujita

IPC分类号： B41J2/045

CPC分类号： B41J2/14233 ,  B41J2002/14241 ,  B41J2002/14419 ,  B41J2002/14491

摘要： A liquid ejecting head includes a piezoelectric element in which a lower electrode, a piezoelectric layer, and an upper electrode are laminated in this order, and a flow path forming substrate in which the piezoelectric element is formed above one surface thereof and a pressure generating chamber being communicated with a nozzle opening is provided, in which the upper electrode is formed so as to extend over an upper surface of the piezoelectric layer and an upper portion of side faces of the piezoelectric layer, and a protective film is formed above portions of the piezoelectric layer, which are not covered by the upper electrode.

摘要翻译： 液体喷射头包括依次层叠有下电极，压电层和上电极的压电元件，在其一个表面上形成有压电元件的流路形成基板和压力发生室 与喷嘴开口连通，其中上电极形成为在压电层的上表面和压电层的侧面上部延伸，并且保护膜形成在 压电层，其不被上电极覆盖。

公开(公告)号：US20090244214A1

公开(公告)日：2009-10-01

申请号：US12413422

申请日：2009-03-27

申请人： Seiichi Fujita

发明人： Seiichi Fujita

IPC分类号： B41J2/045

CPC分类号： B41J2/14233 ,  B41J2002/14241 ,  B41J2002/14419 ,  B41J2002/14491

摘要： A liquid ejecting head includes a piezoelectric element in which a lower electrode, a piezoelectric layer, and an upper electrode are laminated in this order, and a flow path forming substrate in which the piezoelectric element is formed above one surface thereof and a pressure generating chamber being communicated with a nozzle opening is provided, in which the upper electrode is formed so as to extend over an upper surface of the piezoelectric layer and an upper portion of side faces of the piezoelectric layer, and a protective film is formed above portions of the piezoelectric layer, which are not covered by the upper electrode.

摘要翻译： 液体喷射头包括依次层叠有下电极，压电层和上电极的压电元件，在其一个表面上形成有压电元件的流路形成基板和压力发生室 与喷嘴开口连通，其中上电极形成为在压电层的上表面和压电层的侧面上部延伸，并且保护膜形成在 压电层，其不被上电极覆盖。