公开(公告)号：US20140290093A1

公开(公告)日：2014-10-02

申请号：US14228731

申请日：2014-03-28

Applicant: SEMES CO., LTD.

Inventor： In-Il JUNG ,  Eun-Sun JUNG ,  Chan-Young HEO ,  Jeong Seon PARK ,  Seong-Soo KIM

IPC: B01D3/26

CPC classification number: H01L21/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

Abstract: The substrate treating apparatus includes a drying chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, and a recycling unit including a separator for separating the organic solvent from the fluid discharged from the drying chamber to recycle the fluid. The separator includes a distiller in which a fluid containing an organic solvent having a first concentration is introduced, a heating unit heating a fluid containing an organic solvent having a second concentration discharged from the distiller, and supplying an evaporated fluid containing an organic solvent having a third concentration into the distiller, and a condensation unit liquefying a fluid containing an organic solvent having a fourth concentration discharged from the distiller. The organic solvent has the second concentration, the first concentration, the third concentration, and the fourth concentration which are successively lowered in concentration.

Abstract translation: 基板处理装置包括通过使用流体溶解残留在基板上的有机溶剂的干燥室，以及包括用于从有机溶剂与从干燥室排出的流体分离以使循环流体的分离器的再循环单元。 分离器包括：蒸馏器，其中引入含有具有第一浓度的有机溶剂的流体;加热单元，加热含有从蒸馏器排出的第二浓度的有机溶剂的流体，以及供给包含有机溶剂的蒸发流体， 第三浓度进入蒸馏器，以及冷凝单元液化含有从蒸馏器排出的第四浓度的有机溶剂的流体。 有机溶剂具有浓度连续降低的第二浓度，第一浓度，第三浓度和第四浓度。

公开(公告)号：US20140290092A1

公开(公告)日：2014-10-02

申请号：US14228562

申请日：2014-03-28

Applicant: Semes Co., Ltd.

Inventor： Eun-Sun JUNG ,  Woo-Young KIM ,  Chan-young HEO

IPC: B08B7/00 ,  B08B3/14 ,  B01D53/04

CPC classification number: B08B7/0021 ,  B01D53/04 ,  B01D53/0454 ,  B01D2257/708 ,  B01D2258/0216 ,  F26B21/14 ,  F26B25/006 ,  G03F7/427 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6715

Abstract: The substrate treating apparatus includes a process chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, that is provided as a supercritical fluid, to dry the substrate and a recycling unit including a recycler separating the organic solvent from the fluid discharged from the process chamber to recycle the fluid. The recycler includes a column having a space in which an absorbent for absorbing the organic solvent is stored, a supply tube supplying the fluid discharged from the process chamber into the space of the column, a discharge tube discharging the fluid from which the organic solvent is separated in the column, a gas supply tube supplying a purge gas into the column so that the organic solvent is separated from the absorbent, and an exhaust tube exhausting the purge gas containing the organic solvent to the outside of the column.

Abstract translation: 基板处理装置包括：处理室，其中残留在基板上的有机溶剂通过使用被设置为超临界流体的流体溶解以干燥基板;以及回收单元，其包括将有机溶剂与流体分离的再循环器 从处理室排出以再循环流体。 回收机包括具有空间的柱，其中存储吸收有机溶剂的吸收剂，将从处理室排出的流体供应到塔的空间中的供给管，将排出有机溶剂的流体的排出管 在塔中分离出气体供给管，其将净化气体供应到塔中，使得有机溶剂与吸收剂分离，以及排气管将含有有机溶剂的吹扫气体排出到塔的外部。