公开(公告)号：US20140290093A1

公开(公告)日：2014-10-02

申请号：US14228731

申请日：2014-03-28

Applicant: SEMES CO., LTD.

Inventor： In-Il JUNG ,  Eun-Sun JUNG ,  Chan-Young HEO ,  Jeong Seon PARK ,  Seong-Soo KIM

IPC: B01D3/26

CPC classification number: H01L21/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

Abstract: The substrate treating apparatus includes a drying chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, and a recycling unit including a separator for separating the organic solvent from the fluid discharged from the drying chamber to recycle the fluid. The separator includes a distiller in which a fluid containing an organic solvent having a first concentration is introduced, a heating unit heating a fluid containing an organic solvent having a second concentration discharged from the distiller, and supplying an evaporated fluid containing an organic solvent having a third concentration into the distiller, and a condensation unit liquefying a fluid containing an organic solvent having a fourth concentration discharged from the distiller. The organic solvent has the second concentration, the first concentration, the third concentration, and the fourth concentration which are successively lowered in concentration.

Abstract translation: 基板处理装置包括通过使用流体溶解残留在基板上的有机溶剂的干燥室，以及包括用于从有机溶剂与从干燥室排出的流体分离以使循环流体的分离器的再循环单元。 分离器包括：蒸馏器，其中引入含有具有第一浓度的有机溶剂的流体;加热单元，加热含有从蒸馏器排出的第二浓度的有机溶剂的流体，以及供给包含有机溶剂的蒸发流体， 第三浓度进入蒸馏器，以及冷凝单元液化含有从蒸馏器排出的第四浓度的有机溶剂的流体。 有机溶剂具有浓度连续降低的第二浓度，第一浓度，第三浓度和第四浓度。

公开(公告)号：US20160013079A1

公开(公告)日：2016-01-14

申请号：US14747704

申请日：2015-06-23

Applicant: Semes Co., Ltd.

Inventor： Jung Bong CHOI ,  Seong Soo KIM ,  Chan-Young HEO ,  Oh Jin KWON

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/6708 ,  H01L21/67051 ,  H01L21/67115 ,  H01L21/67248

Abstract: A substrate treating apparatus is provided which includes a treating container of which a top end is opened, a substrate support unit placed in a treating container to support a substrate, a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit, and a heating unit placed in the substrate support unit to heat the substrate. The heating unit includes a heating element and a reflection element reflecting a heat from the heating element upward.

Abstract translation: 提供了一种基板处理装置，其包括顶端打开的处理容器，放置在处理容器中以支撑基板的基板支撑单元，将处理溶液供给到放置在支撑单元上的基板的处理溶液供给单元 以及放置在基板支撑单元中以加热基板的加热单元。 加热单元包括加热元件和从加热元件向上反射热量的反射元件。