公开(公告)号：US20140144584A1

公开(公告)日：2014-05-29

申请号：US14091605

申请日：2013-11-27

Applicant: Semes Co., Ltd.

Inventor： Il Gyo KOO ,  Harutyun MELIKYAN ,  Hyo Seong SEONG ,  Soojin LEE

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/3211

Abstract: Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.

Abstract translation: 提供了一种等离子体天线和包括该等离子体天线的等离子体产生装置。 等离子体天线包括通过使用RF信号来感应电磁场的第一天线，通过使用RF信号来感应电磁场的第二天线以及连接在第一天线的输入端和第二天线的输入端之间的电容器。

公开(公告)号：US20210057185A1

公开(公告)日：2021-02-25

申请号：US17092757

申请日：2020-11-09

Applicant: SEMES CO., LTD.

Inventor： Il Gyo KOO ,  Harutyun MELIKYAN ,  Hyo Seong SEONG ,  Soojin LEE

IPC: H01J37/32

Abstract: Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.

公开(公告)号：US20170358427A1

公开(公告)日：2017-12-14

申请号：US15689519

申请日：2017-08-29

Applicant: SEMES CO., LTD.

Inventor： Il Gyo KOO ,  Harutyun Melikyan ,  Hyo Seong Seong ,  Soojin Lee

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/3211

Abstract: Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.

公开(公告)号：US20130220550A1

公开(公告)日：2013-08-29

申请号：US13779992

申请日：2013-02-28

Applicant: Semes Co., Ltd.

Inventor： Il Gyo KOO ,  Hyun Jong SHIM

IPC: B05C11/00

CPC classification number: B05C11/00 ,  H01J37/32623 ,  H01J37/32633 ,  H01J37/32651 ,  H01L21/67126

Abstract: Provided is an apparatus for treating a substrate. The apparatus comprises a plasma boundary limiter unit disposed within a process chamber to surround a discharge space defined above a support unit. The plasma boundary limiter unit comprises a plurality of plates disposed along a circumference of the discharge space, and the plurality of plates are spaced apart from each other along the circumference of the discharge space so that a gas within the discharge space flows to the outside of the discharge space through passages provided between the adjacent plates.

Abstract translation: 提供了一种处理基板的装置。 该装置包括设置在处理室内以围绕限定在支撑单元上方的放电空间的等离子体边界限制器单元。 等离子体边界限制器单元包括沿着放电空间的圆周布置的多个板，并且多个板沿着放电空间的周边彼此间隔开，使得放电空间内的气体流到 通过设置在相邻板之间的通道的放电空间。