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公开(公告)号:US20170001221A1
公开(公告)日:2017-01-05
申请号:US15195262
申请日:2016-06-28
Applicant: Semes Co., Ltd.
Inventor: Taekyoub Lee
CPC classification number: B08B3/024 , B08B2203/0229 , H01L21/02041 , H01L21/67051 , H01L21/6715
Abstract: A method for treating a substrate with a treatment liquid is disclosed, wherein the substrate is treated while a location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area of the substrate and in an inward direction from a peripheral area of the substrate towards a central area of the substrate a plurality of times, and wherein the movement distances of some of the plurality of movements are different from each other.
Abstract translation: 公开了一种用处理液处理基板的方法,其中处理液体的处理液体被供给到旋转的基板上的位置从基板的中心区域向外侧向周向移动 并且从衬底的周边区域到衬底的中心区域的向内方向多次,并且其中多个运动中的一些运动的移动距离彼此不同。
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公开(公告)号:US10335836B2
公开(公告)日:2019-07-02
申请号:US15195262
申请日:2016-06-28
Applicant: Semes Co., Ltd.
Inventor: Taekyoub Lee
Abstract: A method for treating a substrate with a treatment liquid is disclosed, wherein the substrate is treated while a location at which the treatment liquid is supplied onto the substrate that is rotated is moved in an outward direction from a central area of the substrate towards a peripheral area of the substrate and in an inward direction from a peripheral area of the substrate towards a central area of the substrate a plurality of times, and wherein the movement distances of some of the plurality of movements are different from each other.
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公开(公告)号:US11171019B2
公开(公告)日:2021-11-09
申请号:US15858120
申请日:2017-12-29
Applicant: SEMES CO., LTD.
Inventor: Jaeyong Kim , Raetaek Oh , Taekyoub Lee
Abstract: Disclosed are an apparatus and a method for treating a substrate. The substrate treating apparatus includes a flow rate measuring unit includes a container located outside the housing and having an accommodation space an upper side of which is opened and in which the treatment liquid discharged from the treatment liquid nozzle is accommodated, in the interior thereof, a measurement member configured to measure an amount of the treatment liquid accommodated in the accommodation space, and a drain line through which the treatment liquid in the container is discharged.
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