METHOD FOR MANUFACTURING DISPLAY DEVICE
    2.
    发明申请
    METHOD FOR MANUFACTURING DISPLAY DEVICE 有权
    制造显示装置的方法

    公开(公告)号:US20130149798A1

    公开(公告)日:2013-06-13

    申请号:US13761421

    申请日:2013-02-07

    Abstract: One object is to provide a method for manufacturing a display device in which shift of the threshold voltage of a thin film transistor including an oxide semiconductor layer can be suppressed even when ultraviolet light irradiation is performed in the process for manufacturing the display device. In the method for manufacturing a display device, ultraviolet light irradiation is performed at least once, a thin film transistor including an oxide semiconductor layer is used for a switching element, and heat treatment for repairing damage to the oxide semiconductor layer caused by the ultraviolet light irradiation is performed after all the steps of ultraviolet light irradiation are completed.

    Abstract translation: 一个目的是提供一种用于制造显示装置的方法,其中即使在制造显示装置的过程中执行紫外光照射,也可以抑制包括氧化物半导体层的薄膜晶体管的阈值电压的偏移。 在显示装置的制造方法中,至少进行一次紫外线照射,将包含氧化物半导体层的薄膜晶体管用于开关元件,并且对由紫外线引起的氧化物半导体层的损坏进行修复的热处理 在紫外线照射的所有步骤完成之后进行照射。

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