摘要:
Disclosed are an organic thin film transistor and a method of manufacturing the same. The organic thin film transistor includes a gate electrode, an insulating layer, an organic semiconductor layer, a protective layer, and source and drain electrodes. The insulating layer is on the gate electrode, and the organic semiconductor layer is on the insulating layer. The protective layer is on the organic semiconductor layer, and includes an electrode pattern part to expose the organic semiconductor layer. The source and drain electrodes are in the electrode pattern part and connected to the organic semiconductor layer.
摘要:
Disclosed are an organic thin film transistor and a method of manufacturing the same. The organic thin film transistor includes a gate electrode, an insulating layer, an organic semiconductor layer, a protective layer, and source and drain electrodes. The insulating layer is on the gate electrode, and the organic semiconductor layer is on the insulating layer. The protective layer is on the organic semiconductor layer, and includes an electrode pattern part to expose the organic semiconductor layer. The source and drain electrodes are in the electrode pattern part and connected to the organic semiconductor layer.
摘要:
An organic thin film transistor substrate for a display device includes a gate line, a data line insulated from the gate line, at least two organic thin film transistors, each of which is connected between the gate line and the data line, and both of which are commonly connected to a main drain electrode, and a pixel electrode connected to the main drain electrode.
摘要:
A manufacturing method for a thin film transistor array panel including forming a gate electrode, forming an insulating layer on the gate electrode, sequentially forming a lower conducting layer and a upper conducting layer on the insulating layer, etching the upper conducting layer to form a first source electrode and a first drain electrode, etching the lower conducting layer to form the second source electrode and the second drain electrode, over-etching the second source electrode and the second drain electrode, and forming an organic semiconductor between the second source electrode and the second drain electrode.
摘要:
A manufacturing method for a thin film transistor array panel including forming a gate electrode, forming an insulating layer on the gate electrode, sequentially forming a lower conducting layer and a upper conducting layer on the insulating layer, etching the upper conducting layer to form a first source electrode and a first drain electrode, etching the lower conducting layer to form the second source electrode and the second drain electrode, over-etching the second source electrode and the second drain electrode, and forming an organic semiconductor between the second source electrode and the second drain electrode.
摘要:
A manufacturing method for a thin film transistor array panel including forming a gate electrode, forming an insulating layer on the gate electrode, sequentially forming a lower conducting layer and a upper conducting layer on the insulating layer, etching the upper conducting layer to form a first source electrode and a first drain electrode, etching the lower conducting layer to form the second source electrode and the second drain electrode, over-etching the second source electrode and the second drain electrode, and forming an organic semiconductor between the second source electrode and the second drain electrode.
摘要:
A manufacturing method for a thin film transistor array panel including forming a gate electrode, forming an insulating layer on the gate electrode, sequentially forming a lower conducting layer and a upper conducting layer on the insulating layer, etching the upper conducting layer to form a first source electrode and a first drain electrode, etching the lower conducting layer to form the second source electrode and the second drain electrode, over-etching the second source electrode and the second drain electrode, and forming an organic semiconductor between the second source electrode and the second drain electrode.
摘要:
A method for manufacturing an organic thin film transistor array panel includes forming a data line including a source electrode and a drain electrode apart from the data line on a substrate and forming a bank insulating layer including a first opening and a second opening on the data line and the drain electrode. An organic semiconductor is formed in the first opening, sequential deposition is performed of an insulating material layer and a metal layer on the bank insulating layer and the organic semiconductor. A first passivation layer is formed on the metal layer which is etched using the first passivation layer as an etch mask to form a gate line including a gate electrode. The insulating material layer is etched using the first passivation layer as an etch mask to form a gate insulating layer. A second passivation layer is formed on the first passivation layer and a pixel electrode is formed on the second passivation layer.
摘要:
A method for a thin film transistor array panel includes forming a gate line and a pixel electrode on a substrate, forming a gate insulating layer covering the gate line, forming a data line including a source electrode and a drain electrode on the gate insulating layer, forming an interlayer insulating layer covering the data line and the drain electrode on the gate insulating layer, forming a first opening in the interlayer insulating layer, forming an organic semiconductor in the first opening, forming a passivation layer on the organic semiconductor and the interlayer insulating layer, and forming a second opening in the interlayer insulating layer to expose the pixel electrode.
摘要:
An organic thin film transistor array panel, for an embodiment, includes a plurality of pixel electrodes formed on a top layer to cover organic thin film transistors, with display areas defined by the areas of the pixel electrodes. Accordingly, the aperture ratio of the display device may be increased. A ratio of width to length (W/L) in a channel of an organic thin film transistor may be increased, and thereby on current (Ion) of the organic thin film transistor may be increased. The organic semiconductor may be prevented from overflowing while being formed in holes by an inkjet printing method such that deterioration of thin film transistor characteristics and pixel defects is prevented. The adhesive of the electrophoretic sheet is prevented from penetrating into the organic semiconductor when the electrophoretic display is formed by attaching the electrophoretic sheet to the organic thin film transistor array panel by a lamination method.