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公开(公告)号：US20230398655A1
公开(公告)日：2023-12-14
申请号：US18333125
申请日：2023-06-12
IPC分类号： B24B7/22
CPC分类号： B24B7/228
摘要： Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm.
The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.-
公开(公告)号：US20180057399A1
公开(公告)日：2018-03-01
申请号：US15685520
申请日：2017-08-24
发明人： Daijitsu HARADA , Masaki TAKEUCHI
摘要： A rectangular glass substrate has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 μm below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface along the edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one side surface to a position of 50 μm below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.
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公开(公告)号：US20210351326A1
公开(公告)日：2021-11-11
申请号：US17277531
申请日：2019-09-02
IPC分类号： H01L33/48
摘要： A lid for an optical element package, comprising: a window material provided in front of the light emitting direction of an optical element of a housing member, inside of which the optical element is housed; and a metal-based adhesive layer formed on a part at which the window material contacts the housing member, wherein with the lid for an optical element package, the metal-based adhesive layer is formed by an adhesive composition including metal nanoparticles, a solder powder, and a dispersion medium coated by a coating agent. It is possible to address deterioration and cracking due to light of short wavelengths, distortion or decay of the adhesive agent due to heat generation of the light emitting element, and the problem of long-term reliability accompanying these. Specifically, it is possible to provide the lid for an optical element package and the optical element package with excellent heat resistance, ultraviolet resistance, etc.
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公开(公告)号：US20210316405A1
公开(公告)日：2021-10-14
申请号：US17274963
申请日：2019-08-30
发明人： Yu OYAMA , Hidefumi KINDA , Daisuke KURITA , Harunobu MATSUI , Daijitsu HARADA , Masaki TAKEUCHI
摘要： A sealing composition which can be handled in a semi-cured state and can obtain a sintered body having excellent joining strength and sealing performance is provided. A sealing composition including a solder powder, coated silver particles including silver core particles and a coating agent arranged on a surface of the silver core particles, and a solvent is provided. Further, a sintering temperature (T2) of the coated silver particles and a boiling point (T3) of the solvent satisfy T2≤T3.
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5.发明申请公开(公告)号：US20180319705A1
公开(公告)日：2018-11-08
申请号：US15972416
申请日：2018-05-07
摘要： A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.
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6.发明公开公开(公告)号：US20240250223A1
公开(公告)日：2024-07-25
申请号：US18407974
申请日：2024-01-09
CPC分类号： H01L33/58 , G02B1/115 , H01L33/44 , H01L33/483
摘要： A window material for an optical element, including: a synthetic quartz glass substrate having a flat plate shape and having main surfaces through which light is transmitted, at least one of the main surfaces being a rough surface; and an antireflection film formed on the at least one main surface of the synthetic quartz glass substrate, the main surface being the rough surface. The window material for an optical element of the present invention is easy in shape processing, undergoes little temporal change in a wide wavelength region and is stable over a long period of time, and has high total light transmittance of distributed light.
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公开(公告)号：US20240053675A1
公开(公告)日：2024-02-15
申请号：US18495139
申请日：2023-10-26
发明人： Naoki YARITA , Daijitsu HARADA , Masaki TAKEUCHI
IPC分类号： G03F1/60
CPC分类号： G03F1/60
摘要： A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 μm−1 or more and 20 μm−1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.
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公开(公告)号：US20210382386A1
公开(公告)日：2021-12-09
申请号：US17333379
申请日：2021-05-28
发明人： Naoki YARITA , Daijitsu HARADA , Masaki TAKEUCHI
IPC分类号： G03F1/60
摘要： A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 μm−1 or more and 20 μm−1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 μm×10 μm with an atomic force microscope.
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公开(公告)号：US20210293994A1
公开(公告)日：2021-09-23
申请号：US17197444
申请日：2021-03-10
摘要： A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing Al2O3, a second layer containing HfO2, and a third layer containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate.
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公开(公告)号：US20140120198A1
公开(公告)日：2014-05-01
申请号：US14068983
申请日：2013-10-31
IPC分类号： B29C59/02
CPC分类号： B29C59/022 , B29C59/002 , B29C59/026 , B29C59/16 , C03C15/02 , G03F1/14 , G03F1/60 , G03F7/0002
摘要： A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.
摘要翻译： 矩形基板在设置有拓扑图案之后用作模具。 基板具有A侧和B侧相对的表面，A侧表面设置有拓扑图案。 A侧表面包括具有高达350nm的平坦度的1至50mm乘1至50mm的中心矩形区域。 使用成型基板防止在成型基板上形成图案的步骤与转印步骤之间发生图案错位或图案错误。 转移精细尺寸和复杂图案是可能的。
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