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公开(公告)号：US20230398655A1
公开(公告)日：2023-12-14
申请号：US18333125
申请日：2023-06-12
IPC分类号： B24B7/22
CPC分类号： B24B7/228
摘要： Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm.
The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.-
2.发明公开公开(公告)号：US20240250223A1
公开(公告)日：2024-07-25
申请号：US18407974
申请日：2024-01-09
CPC分类号： H01L33/58 , G02B1/115 , H01L33/44 , H01L33/483
摘要： A window material for an optical element, including: a synthetic quartz glass substrate having a flat plate shape and having main surfaces through which light is transmitted, at least one of the main surfaces being a rough surface; and an antireflection film formed on the at least one main surface of the synthetic quartz glass substrate, the main surface being the rough surface. The window material for an optical element of the present invention is easy in shape processing, undergoes little temporal change in a wide wavelength region and is stable over a long period of time, and has high total light transmittance of distributed light.
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公开(公告)号：US20210293994A1
公开(公告)日：2021-09-23
申请号：US17197444
申请日：2021-03-10
摘要： A synthetic quartz glass substrate with an antireflection film, including: a synthetic quartz glass substrate; and an antireflection film formed on a main surface of the synthetic quartz glass substrate, wherein a contact angle measured by a sessile drop method of JIS R 3257:1999 of the main surface of the synthetic quartz glass substrate is within 5 degrees, and the antireflection film includes a first layer containing Al2O3, a second layer containing HfO2, and a third layer containing MgF2 or SiO2 sequentially laminated on the main surface of the synthetic quartz glass substrate.
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公开(公告)号：US20210351326A1
公开(公告)日：2021-11-11
申请号：US17277531
申请日：2019-09-02
IPC分类号： H01L33/48
摘要： A lid for an optical element package, comprising: a window material provided in front of the light emitting direction of an optical element of a housing member, inside of which the optical element is housed; and a metal-based adhesive layer formed on a part at which the window material contacts the housing member, wherein with the lid for an optical element package, the metal-based adhesive layer is formed by an adhesive composition including metal nanoparticles, a solder powder, and a dispersion medium coated by a coating agent. It is possible to address deterioration and cracking due to light of short wavelengths, distortion or decay of the adhesive agent due to heat generation of the light emitting element, and the problem of long-term reliability accompanying these. Specifically, it is possible to provide the lid for an optical element package and the optical element package with excellent heat resistance, ultraviolet resistance, etc.
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公开(公告)号：US20210316405A1
公开(公告)日：2021-10-14
申请号：US17274963
申请日：2019-08-30
发明人： Yu OYAMA , Hidefumi KINDA , Daisuke KURITA , Harunobu MATSUI , Daijitsu HARADA , Masaki TAKEUCHI
摘要： A sealing composition which can be handled in a semi-cured state and can obtain a sintered body having excellent joining strength and sealing performance is provided. A sealing composition including a solder powder, coated silver particles including silver core particles and a coating agent arranged on a surface of the silver core particles, and a solvent is provided. Further, a sintering temperature (T2) of the coated silver particles and a boiling point (T3) of the solvent satisfy T2≤T3.
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公开(公告)号：US20230037856A1
公开(公告)日：2023-02-09
申请号：US17856191
申请日：2022-07-01
IPC分类号： G03F1/60
摘要： A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.
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公开(公告)号：US20220372331A1
公开(公告)日：2022-11-24
申请号：US17732242
申请日：2022-04-28
摘要： A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiO2 as a main component, particularly, as a substrate for mask blanks used in EUVL.
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公开(公告)号：US20220149247A1
公开(公告)日：2022-05-12
申请号：US17515753
申请日：2021-11-01
IPC分类号： H01L33/48 , C09J1/00 , C09J11/04 , B23K35/02 , C03C27/08 , B23K35/26 , B23K35/362 , B23K35/36 , H01L33/60
摘要： A bonding and sealing material includes, as the essential ingredients, a solder powder, silver nanoparticles coated with a coating material and a solvent, and additionally includes at least one ingredient selected from the group consisting of selenium metal, oxide film inhibitors and oxide film removers. This bonding and sealing material can easily form under mild conditions a metallic adhesive layer having good hermetic sealability and UV resistance of the sort desired when sealing a short-wavelength light-emitting device such as a UV-LED, and can be stably used over a long period of time.
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9.发明申请SYNETHETIC QUARTZ GLASS SUBTRATE POLISHING SLURRY AND MANUFACTURE OF SYNETHETIC QUARTZ GLASS SUBSTRATE USING THE SAME 审中-公开SYNETHETIC QUARTZ玻璃剥离抛光浆料和使用它的SYNETHETIC QUARTZ玻璃基材的制造公开(公告)号：US20140242884A1
公开(公告)日：2014-08-28
申请号：US14269694
申请日：2014-05-05
IPC分类号： B24B1/00
CPC分类号： B24B1/00 , B24B37/044 , C03C19/00 , C09G1/02
摘要： A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.
摘要翻译： 包含胶原衍生物和胶体溶液的抛光浆液对于合成石英玻璃基材的研磨是有效的。 它可以防止形成具有可被高灵敏度探伤仪检测出的尺寸的缺陷。
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公开(公告)号：US20230418149A1
公开(公告)日：2023-12-28
申请号：US18327136
申请日：2023-06-01
摘要： A substrate for mask blanks having first and second main surfaces of 152 mm×152 mm square and a thickness of 6.35 mm, wherein: when a range of 132 mm×132 mm square centered on an intersection of diagonal lines is defined as a calculation region in each of the first and second main surfaces, on a substrate surface of the calculation region of at least one of the first and second main surfaces, flatness of the substrate surface of the calculation region based on a least square plane is 100 nm or less, and a difference (PV) between a highest value and a lowest value of a height of a calculation surface represented by a difference between shapes of the substrate surfaces before and after smoothing processing with a Gaussian filter (10 mm×10 mm) based on the least square plane is 20 nm or less.
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