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    Ultraviolet ray-transparent optical glass material and method of producing same
    1.
    发明授权
    Ultraviolet ray-transparent optical glass material and method of producing same 有权
    紫外线透明光学玻璃材料及其制造方法

    公开(公告)号：US06376401B1

    公开(公告)日：2002-04-23

    申请号：US09387773

    申请日：1999-09-01

    申请人： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

    发明人： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

    IPC分类号： C03B2000

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

    摘要： A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

    摘要翻译： 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。

    Data usage method, system, and program thereof employing blockchain network (BCN)
    2.
    发明授权
    Data usage method, system, and program thereof employing blockchain network (BCN) 有权

    公开(公告)号：US11636477B2

    公开(公告)日：2023-04-25

    申请号：US16473671

    申请日：2017-12-28

    申请人： Takayuki Nakamura

    发明人： Takayuki Nakamura

    IPC分类号： G06Q20/40 ,  G06Q20/38 ,  H04L9/06 ,  H04L9/32 ,  H04L9/00

    摘要： The purpose of the present invention is to provide a new data utilization system in which, while an individual independently uses and utilizes one's own personal data, security and anonymity of the data can be effected. An information processing device used by an individual comprises: a function of transmitting, over a network, data relating to an address on a blockchain network used by the individual to a provider-side information processing device comprising a storage device that is a provision source of data associated with information about the individual; a function of referring to access data (ACT) that includes the data relating to the blockchain network address and data for identifying the provision source of the data and that is issued by the provision-side information processing device for the blockchain network address; and a function of, on the basis of the access data (ACT), acquiring the data associated with the information about the individual from the provider-side storage device and storing said data at least in a storage device or a memory of said individual.

    Pattern inspection apparatus and pattern inspection method
    5.
    发明授权
    Pattern inspection apparatus and pattern inspection method 有权
    图案检验装置和图案检验方法

    公开(公告)号：US08698081B2

    公开(公告)日：2014-04-15

    申请号：US13317860

    申请日：2011-10-31

    申请人： Takayuki Nakamura ,  Tsutomu Murakawa

    发明人： Takayuki Nakamura ,  Tsutomu Murakawa

    IPC分类号： H01J37/28

    CPC分类号： H01J37/28 ,  G01N23/225

    摘要： The pattern inspection apparatus includes: an irradiator irradiating a sample with an electron beam; an electron detector detecting an amount of electrons generated on the sample having a pattern formed thereon, by the irradiation of the electron beam; an image processor generating a SEM image of the pattern on the basis of the electron amount; and a controller acquiring defect position information on the pattern formed on the sample from an optical defect inspection device. The controller specifies a defect candidate pattern from the SEM image on the basis of the defect position information and judges whether a defect in the defect candidate pattern is to be transferred onto a wafer. The controller determines a view field of the SEM image on the basis of the defect position information and specifies the defect candidate pattern from image information on patterns displayed in the view field.

    摘要翻译： 图案检查装置包括：用电子束照射样品的照射器; 电子检测器，通过电子束的照射检测在其上形成有图案的样品上产生的电子的量; 基于电子量产生图案的SEM图像的图像处理器; 以及控制器从光学缺陷检查装置获取关于在样品上形成的图案的缺陷位置信息。 控制器基于缺陷位置信息从SEM图像指定缺陷候选图案，并判断缺陷候选图案中的缺陷是否被转印到晶片上。 控制器基于缺陷位置信息确定SEM图像的视野，并根据视场中显示的图案的图像信息指定缺陷候选模式。

    GUIDE ASSEMBLY FOR ENDOSCOPE
    7.
    发明申请
    GUIDE ASSEMBLY FOR ENDOSCOPE 审中-公开
    内镜指南大会

    公开(公告)号：US20120302830A1

    公开(公告)日：2012-11-29

    申请号：US13479598

    申请日：2012-05-24

    申请人： Tsuyoshi Ashida ,  Takayuki Nakamura ,  Shinichi Yamakawa ,  Yasunori Ohta

    发明人： Tsuyoshi Ashida ,  Takayuki Nakamura ,  Shinichi Yamakawa ,  Yasunori Ohta

    IPC分类号： A61B1/00

    CPC分类号： A61B1/0016 ,  A61B1/00135 ,  A61B1/00154

    摘要： An endoscope includes a head assembly having a first central axis for entry in a body cavity. In combination with the endoscope, a guide assembly includes a shaft sleeve having a lumen, for mounting on the head assembly therewith. An endless track device is supported around the shaft sleeve, for endlessly moving along the first central axis, for propulsion of the head assembly inside the body cavity. A support sleeve is disposed between the shaft sleeve and the endless track device, having a second central axis different from the first central axis, for supporting the endless track device movably. Preferably, the endoscope includes an imaging window area formed in a distal surface of the head assembly and offset from the first central axis. A position shift between the first and second central axes is predetermined according to a position shift between the imaging window area and the first central axis.

    摘要翻译： 内窥镜包括具有用于进入体腔的第一中心轴线的头部组件。 与内窥镜组合，引导组件包括具有内腔的轴套，用于安装在头部组件上。 环形轨道装置被支撑在轴套周围，用于沿着第一中心轴线不停地移动，用于将头部组件推进到体腔内。 支撑套筒设置在轴套和环形轨道装置之间，具有不同于第一中心轴线的第二中心轴线，用于可移动地支撑环形轨道装置。 优选地，内窥镜包括形成在头部组件的远侧表面中并与第一中心轴线偏移的成像窗口区域。 第一和第二中心轴之间的位置偏移根据成像窗口区域和第一中心轴线之间的位置偏移而预先确定。

    Mask inspection apparatus and image creation method
    9.
    发明授权
    Mask inspection apparatus and image creation method 失效
    面膜检查装置及图像制作方法

    公开(公告)号：US08071943B2

    公开(公告)日：2011-12-06

    申请号：US12653792

    申请日：2009-12-21

    申请人： Tsutomu Murakawa ,  Toshimichi Iwai ,  Jun Matsumoto ,  Takayuki Nakamura ,  Yoshiaki Ogiso

    发明人： Tsutomu Murakawa ,  Toshimichi Iwai ,  Jun Matsumoto ,  Takayuki Nakamura ,  Yoshiaki Ogiso

    IPC分类号： G01N23/00 ,  H01J37/28

    CPC分类号： G03F1/86

    摘要： Provided is a mask inspection apparatus including: emitting unit for emitting electron beams onto a sample; electron detecting unit for detecting the quantity of electrons produced, by the emission of the electron beams, from the sample with patterns formed thereon; image processing unit for generating image data for the patterns on the basis of the electron quantity; and controlling unit for controlling the emitting unit, the electron detecting unit, and the image processing unit. The controlling unit calculates, from the size of a designated observation area of the sample, a division number of divisional images that are synthesized to form a joint image that covers the entire designated observation area. The controlling unit determines divisional areas so that adjacent divisional areas partially overlap each other. The controlling unit acquires SEM images for the respective divisional areas. The controlling unit synthesizes the SEM images of the divisional areas on the basis of coordinate data for the divisional areas and on the basis of edge information for patterns included in the overlapping regions, and thereby creates an SEM image of a wide field of view that covers the observation area.

    摘要翻译： 提供了一种掩模检查装置，包括：用于向样品发射电子束的发射单元; 电子检测单元，用于通过发射电子束从形成在其上的图案的样品检测产生的电子量; 图像处理单元，用于基于电子量产生用于图案的图像数据; 以及用于控制发光单元，电子检测单元和图像处理单元的控制单元。 控制单元根据样本的指定观察区域的大小，计算合成为形成覆盖整个指定观察区域的关节图像的分割图像的分割数。 控制单元确定分区，使得相邻的分区彼此部分重叠。 控制单元获取各分区的SEM图像。 控制单元基于分割区域的坐标数据并基于重叠区域中包含的图案的边缘信息来合成分割区域的SEM图像，从而创建覆盖了宽视场的SEM图像 观察区。

    PIN CARD AND TEST APPARATUS USING THE SAME
    10.
    发明申请
    PIN CARD AND TEST APPARATUS USING THE SAME 有权
    使用相同的PIN卡和测试装置

    公开(公告)号：US20110291682A1

    公开(公告)日：2011-12-01

    申请号：US13144792

    申请日：2010-04-22

    申请人： Takao Kawahara ,  Takayuki Nakamura

    发明人： Takao Kawahara ,  Takayuki Nakamura

    IPC分类号： G01R1/067

    CPC分类号： G01R31/2851 ,  G01R31/2841

    摘要： A first switch is arranged such that a first terminal thereof is connected to an AC test unit and a second terminal thereof is connected to an I/O terminal and a DC test unit. A first switch is configured so as to be capable of switching states between a connection state in which the first terminal and the second terminal are connected to each other, and a disconnection state in which they are disconnected from each other. A bypass capacitor is arranged between the first terminal and the second terminal, and is configured to bypass the frequency component which is cut off by the first switch.

    摘要翻译： 第一开关被布置成使得其第一端子连接到AC测试单元，并且其第二端子连接到I / O端子和DC测试单元。 第一开关被配置为能够在第一端子和第二端子彼此连接的连接状态之间切换状态，并且断开状态彼此断开。 旁路电容器设置在第一端子和第二端子之间，并且被配置为绕过由第一开关切断的频率分量。