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公开(公告)号：US07663860B2
公开(公告)日：2010-02-16
申请号：US11001298
申请日：2004-12-02
IPC分类号： H01T23/00
CPC分类号： H01L21/67109 , H01L21/6831
摘要： An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.
摘要翻译： 用于通过使用静电力吸引和保持基板的静电卡盘包括与基板接触的多个突出部分。 突出部由陶瓷电介质形成，该陶瓷电介质包括各自具有特定粒径的晶粒，并且突出部与基板的接触表面形成为具有取决于粒径的表面粗糙度。
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公开(公告)号：US20050207088A1
公开(公告)日：2005-09-22
申请号：US11001298
申请日：2004-12-02
IPC分类号： H01L21/68 , B23Q3/15 , H01L21/00 , H01L21/683 , H02H1/00
CPC分类号： H01L21/67109 , H01L21/6831
摘要： An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.
摘要翻译： 用于通过使用静电力吸引和保持基板的静电卡盘包括与基板接触的多个突出部分。 突出部由陶瓷电介质形成，该陶瓷电介质包括各自具有特定粒径的晶粒，并且突出部与基板的接触表面形成为具有取决于粒径的表面粗糙度。
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3.发明申请METHOD AND APPARATUS FOR AN IMPROVED OPTICAL WINDOW DEPOSITION SHIELD IN A PLASMA PROCESSING SYSTEM 有权在等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置公开(公告)号：US20070102287A1
公开(公告)日：2007-05-10
申请号：US11620289
申请日：2007-01-05
IPC分类号： C23C14/00
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32495 , H01J37/32972
摘要： The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
摘要翻译： 本发明提出了一种改进的光学窗口沉积屏蔽，用于通过沉积屏蔽对光学访问等离子体处理系统中的处理空间的改进的光学窗口沉积屏蔽，其中光学窗口沉积屏蔽的设计和制造有利地提供光学干净的访问 涉及在处理空间中处理等离子体，同时维持基本上最小的光学窗口沉积屏蔽的侵蚀。
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4.发明授权Method and apparatus for an improved optical window deposition shield in a plasma processing system 有权用于等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置公开(公告)号：US07163585B2
公开(公告)日：2007-01-16
申请号：US10803994
申请日：2004-03-19
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32495 , H01J37/32972
摘要： The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
摘要翻译： 本发明提出了一种改进的光学窗口沉积屏蔽，用于通过沉积屏蔽件对等离子体处理系统中的处理空间进行光学访问，其中光学窗口沉积屏蔽的设计和制造有利地提供光学干净地访问处理等离子体 同时维持光学窗口沉积屏蔽的基本上最小的侵蚀。
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5.发明授权Method and apparatus for an improved baffle plate in a plasma processing system 有权等离子体处理系统中改进挡板的方法和装置公开(公告)号：US07282112B2
公开(公告)日：2007-10-16
申请号：US11010373
申请日：2004-12-14
IPC分类号： C23C16/455 , C23C16/00 , H01L21/306 , C23F1/00
CPC分类号： H01J37/32633 , H01J37/32623 , H01J37/32834
摘要： The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
摘要翻译： 本发明提出了一种用于等离子体处理系统的改进的挡板，其中挡板的设计和制造有利地在过程空间中提供均匀的处理等离子体，同时对挡板具有基本上最小的侵蚀。
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公开(公告)号：US07147749B2
公开(公告)日：2006-12-12
申请号：US10259858
申请日：2002-09-30
CPC分类号： H01J37/32009 , C23C16/4404 , H01J37/3244 , H01J37/32532 , Y10S156/916
摘要： The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.
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7.发明授权Method and apparatus for an improved optical window deposition shield in a plasma processing system 有权用于等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置公开(公告)号：US07811428B2
公开(公告)日：2010-10-12
申请号：US11620289
申请日：2007-01-05
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32495 , H01J37/32972
摘要： The present invention presents an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
摘要翻译： 本发明提出了一种改进的光学窗口沉积屏蔽，用于通过沉积屏蔽件对等离子体处理系统中的处理空间进行光学访问，其中光学窗口沉积屏蔽的设计和制造有利地提供光学干净地访问处理等离子体 同时维持光学窗口沉积屏蔽的基本上最小的侵蚀。
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8.发明授权Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 有权用于等离子体处理系统中具有沉积屏蔽的改进的上电极板的方法和装置公开(公告)号：US07566379B2
公开(公告)日：2009-07-28
申请号：US11584525
申请日：2006-10-23
CPC分类号： H01J37/32009 , C23C16/4404 , H01J37/3244 , H01J37/32532 , Y10S156/916
摘要： The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.
摘要翻译： 本发明提出了一种用于等离子体处理系统的改进的上电极，其中具有耦合到上电极的沉积屏蔽的电极板的设计和制造有利地提供工艺气体的气体注入，同时提供上电极的基本上最小的侵蚀，同时提供 保护室内。
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9.发明申请Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 有权用于等离子体处理系统中具有沉积屏蔽的改进的上电极板的方法和装置公开(公告)号：US20070034337A1
公开(公告)日：2007-02-15
申请号：US11584525
申请日：2006-10-23
CPC分类号： H01J37/32009 , C23C16/4404 , H01J37/3244 , H01J37/32532 , Y10S156/916
摘要： The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.
摘要翻译： 本发明提出了一种用于等离子体处理系统的改进的上电极，其中具有耦合到上电极的沉积屏蔽的电极板的设计和制造有利地提供工艺气体的气体注入，同时提供上电极的基本上最小的侵蚀，同时提供 保护室内。
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10.发明授权Method and apparatus for an improved optical window deposition shield in a plasma processing system 有权用于等离子体处理系统中改进的光学窗口沉积屏蔽的方法和装置公开(公告)号：US06798519B2
公开(公告)日：2004-09-28
申请号：US10259352
申请日：2002-09-30
IPC分类号： G01N2123
CPC分类号： H01L21/67069 , H01J37/32458 , H01J37/32495 , H01J37/32972
摘要： The present invention presents an improved optical window deposition shield an improved optical window deposition shield for optical access to a process space in a plasma processing system through a deposition shield, wherein the design and fabrication of the optical window deposition shield advantageously provides an optically clean access to the processing plasma in the process space while sustaining substantially minimal erosion of the optical window deposition shield.
摘要翻译： 本发明提出了一种改进的光学窗口沉积屏蔽，用于通过沉积屏蔽对光学访问等离子体处理系统中的处理空间的改进的光学窗口沉积屏蔽，其中光学窗口沉积屏蔽的设计和制造有利地提供光学干净的访问 涉及在处理空间中处理等离子体，同时维持基本上最小的光学窗口沉积屏蔽的侵蚀。
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