公开(公告)号：US6143083A

公开(公告)日：2000-11-07

申请号：US453031

申请日：1999-12-02

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

摘要翻译： 衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持架; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

公开(公告)号：US6066210A

公开(公告)日：2000-05-23

申请号：US692461

申请日：1996-08-05

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

摘要翻译： 衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持件; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

公开(公告)号：US5788447A

公开(公告)日：1998-08-04

申请号：US691946

申请日：1996-08-05

申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the substrate processing chambers and the substrate transfer chamber; a substrate accommodating chamber disposed on a second side wall of the substrate transfer chamber; a substrate transfer device, disposed within the substrate transfer chamber, for transferring the substrate under reduced pressure between the substrate processing chambers and the substrate accommodating chamber; an elevator disposed outside the substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to the stationary portion; a rigid connecting member capable of moving through a through-hole formed in a predetermined face of the substrate transfer chamber, the rigid connecting member mechanically connecting the elevating portion and the substrate transfer device through the through-hole; and a sealing member for establishing a hermetic vacuum seal between the predetermined surface and the connecting member which penetrates through the through-hole.

摘要翻译： 衬底处理设备包括衬底传送室; 多个基板处理室，设置在所述基板输送室的第一侧壁上，并且在垂直方向上堆叠; 多个第一闸阀，各自设置在每个基板处理室和基板传送室之间; 设置在所述基板传送室的第二侧壁上的基板容纳室; 衬底传送装置，设置在衬底传送室内，用于在衬底处理室和衬底容纳室之间在减压下传送衬底; 设置在所述基板传送室的外侧的电梯，其包括固定部和相对于所述固定部垂直移动的升降部; 刚性连接构件，其能够移动通过形成在所述基板传送室的预定面中的通孔，所述刚性连接构件通过所述通孔机械地连接所述升降部分和所述基板传送装置; 以及密封构件，用于在预定表面和穿过通孔的连接构件之间建立密封的真空密封。

公开(公告)号：US06190104B1

公开(公告)日：2001-02-20

申请号：US09326673

申请日：1999-06-07

申请人： Kazuhito Ikeda ,  Shinichiro Watahiki ,  Hisashi Yoshida ,  Yukinori Aburatani

发明人： Kazuhito Ikeda ,  Shinichiro Watahiki ,  Hisashi Yoshida ,  Yukinori Aburatani

IPC分类号： B65G4907

CPC分类号： H01L21/67742 ,  H01L21/67757 ,  Y10S414/139

摘要： A method and apparatus for conveying a treatment object whereby a drive unit for driving a treatment object conveyor robot is deployed inside a vacuum chamber. The robot comprises a conveyor arm and a drive unit. The conveyor arm is accommodated outside an airtight vessel and the drive unit is accommodated inside the airtight vessel to avoid damage to the drive unit. In order to raise and lower the robot inside the chamber, an elevator mechanism, deployed outside the chamber, advances and retracts a shaft that is inserted in an airtight manner into the chamber. The airtight structure is secured by O rings provided where a bellows surrounds the shaft and connects to the chamber and the elevator mechanism. The shaft, inserted inside the chamber, is linked to the airtight vessel that accommodates the drive unit of the robot. The airtight vessel communicates to the outside via a hollow portion in the shaft and the interior thereof is always kept at atmospheric pressure.

摘要翻译： 一种用于输送处理物体的方法和装置，由此用于驱动处理物体输送机器人的驱动单元部署在真空室内。 机器人包括传送臂和驱动单元。 输送臂被容纳在密封容器的外部，并且驱动单元容纳在密封容器的内部，以避免损坏驱动单元。 为了升高和降低腔室内的机器人，布置在腔室外部的电梯机构使以气密方式插入腔室的轴前进和后退。 气密结构由设置在波纹管围绕轴并连接到腔室和升降机构的O形环固定。 插入室内的轴连接到容纳机器人的驱动单元的气密容器。 气密容器通过轴中的中空部分与外部连通，其内部总是保持在大气压力。