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    Substrate transferring mechanism
    2.
    发明授权
    Substrate transferring mechanism 有权
    基板转移机制

    公开(公告)号：US6143083A

    公开(公告)日：2000-11-07

    申请号：US453031

    申请日：1999-12-02

    申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

    发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

    IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

    CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

    摘要： A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate holding chamber disposed on a second side wall of the substrate transfer chamber; a first substrate holder disposed within the intermediate substrate holding chamber; a second substrate holder disposed within the substrate processing chamber; a first substrate transfer robot, disposed within the substrate transfer chamber, for transferring the substrate between the substrate processing chamber and the intermediate substrate holding chamber; a first gate valve disposed between the substrate processing chamber and the substrate transfer chamber; a second gate valve disposed between the substrate transfer chamber and the intermediate substrate holding chamber; an atmospheric pressure section located opposite to the substrate transfer chamber with respect to the intermediate substrate holding chamber; a third valve disposed between the intermediate substrate holding chamber and the atmospheric pressure section; a cassette holder disposed within the atmospheric pressure section; and a second substrate transfer robot disposed within the atmospheric pressure section, for transferring the substrate between a cassette held in the cassette holder and the intermediate substrate holding chamber.

    摘要翻译： 衬底处理设备包括衬底传送室; 衬底处理室，设置在所述衬底传送室的第一侧壁上; 设置在所述基板传送室的第二侧壁上的中间基板保持室; 设置在所述中间基板保持室内的第一基板保持架; 设置在所述衬底处理室内的第二衬底保持器; 第一基板传送机器人，设置在所述基板传送室内，用于在所述基板处理室和所述中间基板保持室之间传送所述基板; 设置在所述基板处理室和所述基板输送室之间的第一闸阀; 设置在所述基板传送室和所述中间基板保持室之间的第二闸阀; 相对于中间基板保持室与基板传送室相对的大气压部分; 设置在所述中间基板保持室和所述大气压力部之间的第三阀; 设置在大气压力区段内的盒座; 以及设置在所述大气压力部分内的第二衬底传送机器人，用于将所述衬底转移到保持在所述盒保持器中的盒和所述中间衬底保持室之间。

    Substrate processing apparatus
    4.
    发明授权
    Substrate processing apparatus 失效
    基板加工装置

    公开(公告)号：US5788447A

    公开(公告)日：1998-08-04

    申请号：US691946

    申请日：1996-08-05

    申请人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

    发明人： Shuji Yonemitsu ,  Toshikazu Karino ,  Hisashi Yoshida ,  Shinichiro Watahiki ,  Yuji Yoshida ,  Hideo Shimura ,  Takeshi Sugimoto ,  Yukinori Aburatani ,  Kazuhito Ikeda

    IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/677

    CPC分类号： H01L21/67781 ,  H01L21/67103 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67754 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

    摘要： A substrate processing apparatus comprises a substrate transfer chamber; a plurality of substrate processing chambers disposed on a first side wall of the substrate transfer chamber and stacked in the vertical direction; a plurality of first gate valves, each being disposed between each of the substrate processing chambers and the substrate transfer chamber; a substrate accommodating chamber disposed on a second side wall of the substrate transfer chamber; a substrate transfer device, disposed within the substrate transfer chamber, for transferring the substrate under reduced pressure between the substrate processing chambers and the substrate accommodating chamber; an elevator disposed outside the substrate transfer chamber and comprising a stationary portion and an elevating portion which is vertically movable with respect to the stationary portion; a rigid connecting member capable of moving through a through-hole formed in a predetermined face of the substrate transfer chamber, the rigid connecting member mechanically connecting the elevating portion and the substrate transfer device through the through-hole; and a sealing member for establishing a hermetic vacuum seal between the predetermined surface and the connecting member which penetrates through the through-hole.

    摘要翻译： 衬底处理设备包括衬底传送室; 多个基板处理室，设置在所述基板输送室的第一侧壁上，并且在垂直方向上堆叠; 多个第一闸阀，各自设置在每个基板处理室和基板传送室之间; 设置在所述基板传送室的第二侧壁上的基板容纳室; 衬底传送装置，设置在衬底传送室内，用于在衬底处理室和衬底容纳室之间在减压下传送衬底; 设置在所述基板传送室的外侧的电梯，其包括固定部和相对于所述固定部垂直移动的升降部; 刚性连接构件，其能够移动通过形成在所述基板传送室的预定面中的通孔，所述刚性连接构件通过所述通孔机械地连接所述升降部分和所述基板传送装置; 以及密封构件，用于在预定表面和穿过通孔的连接构件之间建立密封的真空密封。