Optoelectronic device including a barrier layer and interface barrier layer and a method of manufacture thereof
    3.
    发明授权
    Optoelectronic device including a barrier layer and interface barrier layer and a method of manufacture thereof 有权
    包括阻挡层和界面阻挡层的光电器件及其制造方法

    公开(公告)号:US06542686B1

    公开(公告)日:2003-04-01

    申请号:US09648159

    申请日:2000-08-25

    IPC分类号: G02B610

    CPC分类号: G02B6/132 G02B6/131

    摘要: The present invention provides an optoelectronic device and a method of manufacture therefor, that prevents dopant diffusion and controls the dopant concentration therein. The optoelectronic device includes an active region formed over a substrate, and an interface barrier layer and barrier layer located over the active region. The optoelectronic device further includes an upper cladding layer located over the interface barrier layer and the barrier layer. In an exemplary embodiment of the invention, the interface barrier layer is an indium phosphide interface barrier layer and the barrier layer is an indium gallium arsenide phosphide barrier layer.

    摘要翻译: 本发明提供一种光电器件及其制造方法,其防止掺杂剂扩散并控制其中的掺杂剂浓度。 光电子器件包括在衬底上形成的有源区,以及位于有源区上方的界面阻挡层和阻挡层。 光电子器件还包括位于界面阻挡层和阻挡层之上的上覆层。 在本发明的示例性实施例中,界面阻挡层是磷化铟界面阻挡层,阻挡层是砷化镓磷化物阻挡层。