摘要:
A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要:
A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要:
A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要:
A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要:
A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.
摘要:
An electrosurgical device includes a plurality of electrodes arranged to form a tissue treatment surface and a power supply. The power supply is configured to deliver a first drive signal with a first phase to at least a first one of the plurality of electrodes and a second drive signal with a second phase to at least a second one of the plurality of electrodes such that an electric field extends from the tissue treatment surface, where the first phase and the second phase are different. The power supply is further configured to receive an input from an operator of the electrosurgical device, and adjust the first phase or the second phase such that an aspect of the electric field extending from the tissue treatment surface changes in response to the input from the operator.
摘要:
A power holdup circuit including a monitoring circuit and a power holdup circuit. The monitoring circuit includes an average voltage comparator and an absolute voltage comparator which cooperate to detect a voltage drop in the voltage supplied by the power supply. The monitoring circuit also includes a timer to determine the time period of the voltage dropout. If a predetermined voltage dropout event occurs, the monitoring circuit generates a control signal to a switching component which activates a holdup power source. The holdup power source includes an energy storage device that stores energy to maintain the supply voltage during dropout periods.
摘要:
A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.
摘要:
An electrosurgical device includes a plurality of electrodes arranged to form a tissue treatment surface and a power supply. The power supply is configured to deliver a first drive signal with a first phase to at least a first one of the plurality of electrodes and a second drive signal with a second phase to at least a second one of the plurality of electrodes such that an electric field extends from the tissue treatment surface, where the first phase and the second phase are different. The power supply is further configured to receive an input from an operator of the electrosurgical device, and adjust the first phase or the second phase such that an aspect of the electric field extending from the tissue treatment surface changes in response to the input from the operator.
摘要:
An electrosurgical device includes a plurality of electrodes arranged to form a tissue treatment surface and a power supply. The power supply is configured to deliver a first drive signal with a first phase to at least a first one of the plurality of electrodes and a second drive signal with a second phase to at least a second one of the plurality of electrodes such that an electric field extends from the tissue treatment surface, where the first phase and the second phase are different. The power supply is further configured to receive an input from an operator of the electrosurgical device, and adjust the first phase or the second phase such that an aspect of the electric field extending from the tissue treatment surface changes in response to the input from the operator.