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公开(公告)号：US06900881B2
公开(公告)日：2005-05-31
申请号：US10194414
申请日：2002-07-11
申请人： Sidlgata V. Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Mario J. Meissl , Norman E. Schumaker , Ronald D. Voisin
发明人： Sidlgata V. Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Mario J. Meissl , Norman E. Schumaker , Ronald D. Voisin
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。
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公开(公告)号：US07070405B2
公开(公告)日：2006-07-04
申请号：US10210894
申请日：2002-08-01
申请人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
发明人： Sidlgata V Sreenivasan , Michael P. C. Watts , Byung Jin Choi , Ronald D. Voisin , Norman E. Schumaker
IPC分类号： B32B37/02
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/02 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid. Multiple optical imaging devices are used to align the template with the substrate.
摘要翻译： 描述的是通过压印光刻来图案化衬底的系统。 压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。 压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。 该系统包括施加激活光以固化活化光可固化液体的光源。 使用多个光学成像装置将模板与衬底对准。
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公开(公告)号：US07338275B2
公开(公告)日：2008-03-04
申请号：US11126946
申请日：2005-05-11
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , H01L21/0271
摘要： The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.
摘要翻译： 本发明涉及具有主体的模板，该主体包括具有第一和第二区域的表面。 第一区域对于给定材料具有第一润湿特性，并且第二区域对于给定材料具有第二润湿特性。 第一润湿特性与第二润湿特性不同。 具体地说，第一区域由具有第一表面能的表面处理层形成以提供第一润湿特性。 第二区域是具有与其相关联的第二表面能的身体的暴露部分，通常为熔融石英的石英。 第二表面能大于第一表面能量，以向第二区域提供第二润湿特性。
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公开(公告)号：US06932934B2
公开(公告)日：2005-08-23
申请号：US10194411
申请日：2002-07-11
IPC分类号： B29C35/08 , B29C59/02 , H01L21/027 , B29C33/42 , B29C33/60 , B29C35/12 , B29C41/02 , B29C41/20 , B29C59/16
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , H01L21/0271
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template cause the curable liquid to gather in an area defined by a lower surface of the template. Alternately, the curable liquid may fill one or more relatively shallow recesses in the template and the area under the template lower surface. Activating light is applied to the curable liquid to form a patterned layer on the substrate.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻方法包括将可固化液体放置在基底上。 模板可以与可固化液体接触。 在可固化液体和模板的界面处的表面力使得可固化液体聚集在由模板的下表面限定的区域中。 或者，可固化液体可以填充模板中的一个或多个较浅的凹部和模板下表面下的区域。 将活化光施加到可固化液体上以在基底上形成图案化层。
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公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译： 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10％。 多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。
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公开(公告)号：US09778562B2
公开(公告)日：2017-10-03
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
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7.发明授权公开(公告)号：US07098572B2
公开(公告)日：2006-08-29
申请号：US10806956
申请日：2004-03-23
IPC分类号： H02N2/00
CPC分类号： G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.
摘要翻译： 用于控制与表面间隔开的物体的位移的装置包括具有限定第一旋转轴线的第一弯曲构件和限定第二旋转轴线的第二挠曲构件的挠曲系统。 身体联接到挠曲系统以围绕多个轴线移动。 致动系统联接到挠曲系统以选择性地限制身体沿着多个轴的子集的运动。
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公开(公告)号：US06955868B2
公开(公告)日：2005-10-18
申请号：US10785248
申请日：2004-02-24
IPC分类号： G03F7/20 , G03F7/00 , G03F9/00 , H01L21/027 , H02N2/00
CPC分类号： G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method includes sensing the surface and the body and moving that body to obtain a desired spatial relationship with the surface.
摘要翻译： 控制表面和身体之间的相对位置以在表面中形成图案的方法，其特征在于移动身体以获得表面和身体之间的期望的关系。 为此，该方法包括感测表面和身体并移动该身体以获得与表面的期望的空间关系。
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公开(公告)号：US06922906B2
公开(公告)日：2005-08-02
申请号：US10775707
申请日：2004-02-10
CPC分类号： G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An apparatus to orientate a body with respect to a surface spaced-apart from the body. The apparatus comprises a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system, and an actuation system is coupled to the flexure system. The body is coupled to the flexure system to rotate about the first and the second axes in response to movement caused by the actuation system. The movement of the body about the first axis being decoupled from movement of the body about the second axis.
摘要翻译： 使身体相对于与身体间隔开的表面定向的装置。 该装置包括具有限定第一旋转轴线的第一弯曲构件和限定第二旋转轴线的第二挠曲构件的挠曲系统。 身体联接到挠曲系统，并且致动系统联接到挠曲系统。 身体耦合到挠曲系统以响应于由致动系统引起的移动而围绕第一和第二轴线旋转。 身体围绕第一轴线的运动与身体围绕第二轴线的移动分离。
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公开(公告)号：US08187515B2
公开(公告)日：2012-05-29
申请号：US12415563
申请日：2009-03-31
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
摘要翻译： 可聚合材料的液滴可以在膜片上图案化。 可聚合材料的液滴可以分配在薄膜片上。 可以将预定的力施加到压印光刻模板，使得薄膜片上可聚合材料的液滴的局部捕获最小化，并且液滴聚结以形成连续层。 可聚合材料可以固化以形成具有残留层和至少一个特征的图案化层。
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