公开(公告)号：US07845931B2

公开(公告)日：2010-12-07

申请号：US11858687

申请日：2007-09-20

申请人： Frank Y. Xu ,  Edward Brian Fletcher ,  Pankaj B. Lad ,  Michael P. C. Watts

发明人： Frank Y. Xu ,  Edward Brian Fletcher ,  Pankaj B. Lad ,  Michael P. C. Watts

IPC分类号： B29C59/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.

摘要翻译： 本发明包括固化可聚合液体以在基材上形成薄膜的方法，其特征在于使包围在可聚合液体周围的气氛中的氧的聚合过程的抑制最小化。 为此，可聚合液体尤其包括消耗与可聚合液体相互作用的氧的引发剂，并产生额外的自由基以促进可聚合过程。

公开(公告)号：US20080308971A1

公开(公告)日：2008-12-18

申请号：US12139911

申请日：2008-06-16

申请人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

发明人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

IPC分类号： B29C59/02 ,  C08L67/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.

摘要翻译： 通过将多个离散部分的流体组合物施加到压印光刻基板的表面上并使组合物的离散部分自发地扩散在基板的表面上以形成基本上连续的层而形成固体层。 该组合物包括溶剂和固体或溶剂以及可聚合材料。 组合物可以是溶液或分散体。 至少一些溶剂从组合物中蒸发，并在基材上形成固体层（例如聚合或干燥）。 固体层基本上不含间隙。

公开(公告)号：US20120070572A1

公开(公告)日：2012-03-22

申请号：US13228298

申请日：2011-09-08

申请人： Zhengmao Ye ,  Rick Ramos ,  Edward Brian Fletcher ,  Christopher Ellis Jones ,  Dwayne L. LaBrake

发明人： Zhengmao Ye ,  Rick Ramos ,  Edward Brian Fletcher ,  Christopher Ellis Jones ,  Dwayne L. LaBrake

IPC分类号： B05D5/10 ,  C23C16/448

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.

摘要翻译： 描述了在压印光刻工艺期间使用蒸气递送系统以实现粘合促进剂材料的传递的系统和方法。

公开(公告)号：US20100084376A1

公开(公告)日：2010-04-08

申请号：US12572838

申请日：2009-10-02

申请人： Niyaz Khusnatdinov ,  Weijun Liu ,  Frank Y. Xu ,  Fen Wan ,  Edward Brian Fletcher ,  Marlon Menezes

发明人： Niyaz Khusnatdinov ,  Weijun Liu ,  Frank Y. Xu ,  Fen Wan ,  Edward Brian Fletcher ,  Marlon Menezes

IPC分类号： B44C1/22 ,  H05B6/00 ,  B29C59/00

CPC分类号： G03F7/0002 ,  B32B37/14 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T156/10

摘要： Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.

摘要翻译： 多孔纳米压印光刻模板可以包括孔，通道或多孔层，布置成允许排出捕获在纳米压印光刻模板和衬底之间的气体。 孔或通道可以通过蚀刻或其它工艺形成。 垫片可以形成在纳米压印光刻模板上以限制纳米压印光刻工艺期间可聚合材料的流动。

公开(公告)号：US20090140458A1

公开(公告)日：2009-06-04

申请号：US12275998

申请日：2008-11-21

申请人： Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Byung Jin Choi ,  Niyaz Khusnatdinov ,  Anshuman Cherala ,  Kosta S. Selinidis

发明人： Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Byung Jin Choi ,  Niyaz Khusnatdinov ,  Anshuman Cherala ,  Kosta S. Selinidis

IPC分类号： B28B11/08 ,  B32B3/26 ,  B05D3/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/249978

摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.

摘要翻译： 压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料的孔隙率至少约为10％。 多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料 并且模板在压印堆栈和模板之间快速形成基本上连续的层。

公开(公告)号：US08968620B2

公开(公告)日：2015-03-03

申请号：US13095514

申请日：2011-04-27

申请人： Se-Hyuk Im ,  Mahadevan GanapathiSubramanian ,  Edward Brian Fletcher ,  Niyaz Khusnatdinov ,  Gerard M. Schmid ,  Mario Johannes Meissl ,  Anshuman Cherala ,  Frank Y. Xu ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

发明人： Se-Hyuk Im ,  Mahadevan GanapathiSubramanian ,  Edward Brian Fletcher ,  Niyaz Khusnatdinov ,  Gerard M. Schmid ,  Mario Johannes Meissl ,  Anshuman Cherala ,  Frank Y. Xu ,  Byung-Jin Choi ,  Sidlgata V. Sreenivasan

IPC分类号： B29C45/76 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： B29C59/02 ,  B29C45/76 ,  B29L2007/001 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/877

摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.

摘要翻译： 通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db） ）和/或材料刚度的选择。

公开(公告)号：US08142702B2

公开(公告)日：2012-03-27

申请号：US12139911

申请日：2008-06-16

申请人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

发明人： Weijun Liu ,  Frank Y. Xu ,  Edward Brian Fletcher

IPC分类号： B29C59/00 ,  H01L21/027

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.

摘要翻译： 通过将多个离散部分的流体组合物施加到压印光刻基板的表面上并使组合物的离散部分自发地扩散在基板的表面上以形成基本上连续的层而形成固体层。 该组合物包括溶剂和固体或溶剂以及可聚合材料。 组合物可以是溶液或分散体。 至少一些溶剂从组合物中蒸发，并在基材上形成固体层（例如聚合或干燥）。 固体层基本上不含间隙。

公开(公告)号：US20100072671A1

公开(公告)日：2010-03-25

申请号：US12567275

申请日：2009-09-25

申请人： Gerard M. Schmid ,  Weijun Liu ,  Edward Brian Fletcher ,  Frank Y. Xu ,  Fen Wan

发明人： Gerard M. Schmid ,  Weijun Liu ,  Edward Brian Fletcher ,  Frank Y. Xu ,  Fen Wan

IPC分类号： B29C43/02 ,  B29C35/00

CPC分类号： G03F7/0002 ,  B29C33/06 ,  B29C33/10 ,  B29C43/003 ,  B29C43/021 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

摘要： A nano-imprint lithography template includes a rigid support layer, a cap layer, and a flexible cushion layer positioned between the support layer and the cap layer. Treating an imprint lithography template includes heating the template to desorb gases from the template. Heating the template includes radiating the template at a selected wavelength with, for example, infrared radiation. The selected wavelength may correspond to a wavelength at which the template material is strongly absorbing.

摘要翻译： 纳米压印光刻模板包括刚性支撑层，盖层和位于支撑层和盖层之间的柔性缓冲层。 处理压印光刻模板包括加热模板以从模板解吸气体。 加热模板包括用例如红外辐射以选定的波长辐射模板。 所选择的波长可以对应于模板材料强烈吸收的波长。

公开(公告)号：US09778562B2

公开(公告)日：2017-10-03

申请号：US12275998

申请日：2008-11-21

申请人： Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Byung Jin Choi ,  Niyaz Khusnatdinov ,  Anshuman Cherala ,  Kosta S. Selinidis

发明人： Frank Y. Xu ,  Weijun Liu ,  Edward Brian Fletcher ,  Sidlgata V. Sreenivasan ,  Byung Jin Choi ,  Niyaz Khusnatdinov ,  Anshuman Cherala ,  Kosta S. Selinidis

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/249978

摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.

公开(公告)号：US08846195B2

公开(公告)日：2014-09-30

申请号：US12326709

申请日：2008-12-02

申请人： Frank Y. Xu ,  Edward Brian Fletcher

发明人： Frank Y. Xu ,  Edward Brian Fletcher

IPC分类号： B32B27/38 ,  B32B27/04 ,  G03F7/038 ,  B82Y40/00 ,  B82Y10/00 ,  B82Y30/00 ,  G03F7/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0388 ,  Y10T428/261 ,  Y10T428/265 ,  Y10T428/269 ,  Y10T428/2848 ,  Y10T428/2852 ,  Y10T428/287

摘要： An imprint lithography imprinting stack includes a substrate and a polymeric adhesion layer adhered to the substrate. The polymeric adhesion layer includes polymeric components with an extended backbone length of at least about 2 nm. The backbones of the polymeric components may be substantially aligned in a planar configuration on the surface of the substrate, such that a thickness of the polymeric adhesion layer is less than about 2 nm.

摘要翻译： 压印平版印刷叠层包括基底和粘合到基底上的聚合粘合层。 聚合物粘合层包括具有至少约2nm的延伸骨架长度的聚合物组分。 聚合物组分的主链可以基本上在衬底的表面上以平面构型对准，使得聚合物粘合层的厚度小于约2nm。