公开(公告)号：US20150086729A1

公开(公告)日：2015-03-26

申请号：US14390620

申请日：2013-04-02

Applicant: SoLayTec B.V.

Inventor： Roger Mathias Wilhelm Görtzen ,  Sebastiaan Antonius Fransiskus Dielissen ,  Joseph Adrianus Maria De Swart ,  Adrianus Johannes Petrus Maria Vermeer

IPC: C23C16/455 ,  C23C16/40 ,  C23C16/34

CPC classification number: C23C16/45529 ,  C23C16/345 ,  C23C16/403 ,  C23C16/45536 ,  C23C16/45546 ,  C23C16/45551 ,  C23C16/45595 ,  C23C16/4583 ,  C23C16/545 ,  H01L21/67784

Abstract: A stacked substrate is produced using an apparatus including an injector head device. Production includes the steps of providing an injector head device comprising a gas bearing pressure arrangement and injecting bearing gas against opposite substrate surfaces, to balance the substrate without support in a conveying plane in the injector head device. The following steps are performed iteratively: contacting opposite substrate surfaces with a first precursor gas; and with a second precursor gas, first and second precursor gases supplied in first and second deposition spaces are arranged opposite and facing respective sides of the substrate; establishing relative motion between the deposition space and the substrate in the conveying plane; and providing at least one of a reactant gas, plasma, laser-generated radiation, and/or ultraviolet radiation, in any or both reactant spaces for reacting any of the first and second precursor gas after deposition on at least part of the substrate surface.

Abstract translation: 使用包括注射器头装置的装置制造堆叠的基板。 生产包括提供包括气体承载压力装置并且将轴承气体注入相对的基板表面的注射器头装置的步骤，以在喷射头装置中的输送平面中平衡基板而不需要支撑。 迭代地执行以下步骤：将相对的基板表面与第一前体气体接触; 并且在第二前体气体中，在第一和第二沉积空间中供应的第一和第二前体气体被布置成与衬底的相对侧相对; 在输送平面中建立沉积空间和基底之间的相对运动; 以及在任何或两个反应物空间中提供反应物气体，等离子体，激光产生的辐射和/或紫外线辐射中的至少一种，用于使沉积之后的任何第一和第二前体气体在至少部分基底表面上反应。

公开(公告)号：US20160122874A1

公开(公告)日：2016-05-05

申请号：US14894732

申请日：2014-05-30

Applicant: SOLAYTEC B.V.

Inventor： Adrianus Johannes Petrus Maria Vermeer ,  Ronald Henrica Maria van Dijk

IPC: C23C16/455

CPC classification number: C23C16/45574 ,  C23C16/45551

Abstract: An injector head for atomic layer deposition on a substrate, comprising a plurality of bars coupled to a connection unit. The bars have side walls with a spacer profile, respectively stacked against side walls of a neighbouring bar to form a plurality of stacked bars. The bars comprise slots extending over a length of the bar in communication with a respective slot in the connection unit. A flow path is defined through the bar with a relatively low friction factor to form a respective precursor drain; reactant drain or barrier gas drain. The spacer profiles define slits extending between adjacent bars in communication with a respective slot in the connection unit. A further flow path is formed along the bar with a relatively high friction factor, to form a respective precursor gas supply; reactant gas supply or flow barrier.

Abstract translation: 一种用于原子层沉积在衬底上的注射器头，包括耦合到连接单元的多个条。 这些杆具有侧壁，其具有间隔件型材，分别堆叠在相邻杆的侧壁上以形成多个堆叠的杆。 这些杆包括在杆的长度上延伸的槽，其与连接单元中的相应槽连通。 流动路径通过具有相对较低摩擦因数的杆来限定，以形成相应的前驱体排出口; 反应物排放或阻隔气体排放。 间隔件轮廓限定了在连接单元中与相应狭槽连通的相邻杆之间延伸的狭缝。 沿着杆形成具有相对较高的摩擦系数的另外的流路，以形成相应的前体气体供应; 反应气体供应或流动屏障。