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公开(公告)号:US10764523B2
公开(公告)日:2020-09-01
申请号:US16086312
申请日:2017-03-17
Applicant: SONY CORPORATION
Inventor: Taiichiro Watanabe , Fumihiko Koga
IPC: H04N5/369 , H04N5/374 , H01L27/146 , H04N5/359
Abstract: The present disclosure relates to a solid-state imaging device and an electronic apparatus that can reduce the influence on an OPB pixel in a case where blooming has occurred in an aperture pixel. A solid-state imaging device that is one aspect of the present disclosure has a first photoelectric conversion portion, an upper electrode, and a lower electrode formed outside a substrate, the first photoelectric conversion portion performing photoelectric conversion in accordance with incident light, the upper electrode and the lower electrode being formed to sandwich the first photoelectric conversion portion. The solid-state imaging device includes: an aperture pixel that is disposed on a pixel array, and generates a normal pixel signal; an OPB pixel that is disposed at an end portion on the pixel array, and generates a pixel signal indicating a dark current component; and a charge releasing portion that is disposed between the aperture pixel and the OPB pixel, and releases electric charge flowing out from the aperture pixel. The present disclosure can be applied to back-illuminated vertical spectroscopic CMOS image sensors.
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公开(公告)号:US10553629B2
公开(公告)日:2020-02-04
申请号:US15448247
申请日:2017-03-02
Applicant: SONY CORPORATION
Inventor: Ryosuke Nakamura , Fumihiko Koga , Taiichiro Watanabe
IPC: H01L27/146 , G01J1/44
Abstract: There is provided a solid-state image pickup device including: a semiconductor substrate; a photodiode formed in the semiconductor substrate; a transistor having a gate electrode part or all of which is embedded in the semiconductor substrate, the transistor being configured to read a signal electric charge from the photodiode via the gate electrode; and an electric charge transfer layer provided between the gate electrode and the photodiode.
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公开(公告)号:US20190123093A1
公开(公告)日:2019-04-25
申请号:US16228244
申请日:2018-12-20
Applicant: Sony Corporation
Inventor: Taiichiro Watanabe , Akihiro Yamada , Hideo Kido , Hiromasa Saito , Keiji Mabuchi , Yuko Ohgishi
IPC: H01L27/148 , H01L27/146
CPC classification number: H01L27/14887 , H01L27/14603 , H01L27/14625 , H01L27/1464 , H01L27/14641 , H01L27/14647 , H01L27/14656
Abstract: A solid-state imaging device includes: plural photodiodes formed in different depths in a unit pixel area of a substrate; and plural vertical transistors formed in the depth direction from one face side of the substrate so that gate portions for reading signal charges obtained by photoelectric conversion in the plural photodiodes are formed in depths corresponding to the respective photodiodes.
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公开(公告)号:US10109669B2
公开(公告)日:2018-10-23
申请号:US15533904
申请日:2015-12-11
Applicant: SONY CORPORATION
Inventor: Taiichiro Watanabe , Ryosuke Nakamura , Yusuke Sato , Fumihiko Koga
IPC: H01L27/146 , H04N5/378
Abstract: The present technology relates to a solid-state imaging device and an electronic apparatus that perform a stable overflow from a photodiode and prevent Qs from decreasing and color mixing from occurring. A solid-state imaging device according to an aspect of the present technology includes, at a light receiving surface side of a semiconductor substrate, a charge retention part that generates and retains a charge in response to incident light, an OFD into which the charge saturated at the charge retention part is discharged, and a potential barrier that becomes a barrier of the charge that flows from the charge retention part to the OFD, the OFD including a low concentration OFD and a high concentration OFD having different impurity concentrations of the same type, and the high concentration OFD and the potential barrier being formed at a distance. For example, the present technology is applicable to a CMOS image sensor.
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公开(公告)号:US11348965B2
公开(公告)日:2022-05-31
申请号:US16896903
申请日:2020-06-09
Applicant: SONY CORPORATION
Inventor: Hideaki Togashi , Fumihiko Koga , Tetsuji Yamaguchi , Shintarou Hirata , Taiichiro Watanabe , Yoshihiro Ando , Toyotaka Kataoka , Satoshi Keino , Yukio Kaneda
IPC: H01L27/148 , H01L27/30 , H01L27/146 , H01L51/42 , H01L51/44
Abstract: An imaging device is provided. The imaging device may include a substrate having a first photoelectric conversion unit and a second photoelectric conversion unit at a light-incident side of the substrate. The second photoelectric conversion unit may include a photoelectric conversion layer, a first electrode, a second electrode above the photoelectric conversion layer, a third electrode, and an insulating material between the third electrode and the photoelectric conversion layer, wherein a portion of the insulating material is between the first electrode and the third electrode.
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公开(公告)号:US11218656B2
公开(公告)日:2022-01-04
申请号:US16944732
申请日:2020-07-31
Applicant: SONY CORPORATION
Inventor: Taiichiro Watanabe , Fumihiko Koga
IPC: H04N5/369 , H04N5/374 , H01L27/146 , H04N5/359
Abstract: A solid-state imaging device that is one aspect of the present disclosure has a first photoelectric conversion portion, an upper electrode, and a lower electrode formed outside a substrate, the first photoelectric conversion portion performing photoelectric conversion in accordance with incident light, the upper electrode and the lower electrode being formed to sandwich the first photoelectric conversion portion. The solid-state imaging device includes an aperture pixel that is disposed on a pixel array, and generates a normal pixel signal; an OPB pixel that is disposed at an end portion on the pixel array, and generates a pixel signal indicating a dark current component; and a charge releasing portion that is disposed between the aperture pixel and the OPB pixel, and releases electric charge flowing out from the aperture pixel.
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公开(公告)号:US10714532B2
公开(公告)日:2020-07-14
申请号:US15553653
申请日:2017-02-28
Applicant: SONY CORPORATION
Inventor: Hideaki Togashi , Fumihiko Koga , Tetsuji Yamaguchi , Shintarou Hirata , Taiichiro Watanabe , Yoshihiro Ando , Toyotaka Kataoka , Satoshi Keino , Yukio Kaneda
IPC: H01L27/148 , H01L27/30 , H01L27/146 , H01L51/42 , H01L51/44
Abstract: An imaging device is provided. The imaging device may include a substrate having a first photoelectric conversion unit and a second photoelectric conversion unit at a light-incident side of the substrate. The second photoelectric conversion unit may include a photoelectric conversion layer, a first electrode, a second electrode above the photoelectric conversion layer, a third electrode, and an insulating material between the third electrode and the photoelectric conversion layer, wherein a portion of the insulating material is between the first electrode and the third electrode.
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公开(公告)号:US09634047B2
公开(公告)日:2017-04-25
申请号:US15087733
申请日:2016-03-31
Applicant: SONY CORPORATION
Inventor: Ryosuke Nakamura , Fumihiko Koga , Taiichiro Watanabe
IPC: H01L27/14 , H01L27/146 , G01J1/44
CPC classification number: H01L27/14614 , G01J1/44 , G01J2001/448 , H01L27/14605 , H01L27/1461 , H01L27/14612 , H01L27/14621 , H01L27/14627 , H01L27/14636 , H01L27/14638 , H01L27/1464 , H01L27/14641 , H01L27/14643 , H01L27/14645 , H01L27/14647 , H01L27/14689
Abstract: There is provided a solid-state image pickup device including: a semiconductor substrate (21); a photodiode (11A, 11B) formed in the semiconductor substrate; a transistor (10) having a gate electrode (14) part or all of which is embedded in the semiconductor substrate, the transistor being configured to read a signal electric charge from the photodiode via the gate electrode; and an electric charge transfer layer (13) provided between the gate electrode and the photodiode.
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公开(公告)号:US20200350358A1
公开(公告)日:2020-11-05
申请号:US16932544
申请日:2020-07-17
Applicant: Sony Corporation
Inventor: Taiichiro Watanabe , Akihiro Yamada , Hideo Kido , Hiromasa Saito , Keiji Mabuchi , Yuko Ohgishi
IPC: H01L27/148 , H01L27/146
Abstract: A solid-state imaging device includes: plural photodiodes formed in different depths in a unit pixel area of a substrate; and plural vertical transistors formed in the depth direction from one face side of the substrate so that gate portions for reading signal charges obtained by photoelectric conversion in the plural photodiodes are formed in depths corresponding to the respective photodiodes.
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公开(公告)号:US10468451B2
公开(公告)日:2019-11-05
申请号:US15796545
申请日:2017-10-27
Applicant: SONY CORPORATION
Inventor: Hideaki Togashi , Fumihiko Koga , Tetsuji Yamaguchi , Shintarou Hirata , Taiichiro Watanabe , Yoshihiro Ando , Toyotaka Kataoka , Satoshi Keino , Yukio Kaneda
IPC: H04L27/148 , H04N5/378 , H01L27/148 , H01L51/42 , H01L51/44 , H01L27/146 , H01L27/30
Abstract: An imaging device is provided. The imaging device may include a substrate having a first photoelectric conversion unit and a second photoelectric conversion unit at a light-incident side of the substrate. The second photoelectric conversion unit may include a photoelectric conversion layer, a first electrode, a second electrode above the photoelectric conversion layer, a third electrode, and an insulating material between the third electrode and the photoelectric conversion layer, wherein a portion of the insulating material is between the first electrode and the third electrode.
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