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公开(公告)号:US06972421B2
公开(公告)日:2005-12-06
申请号:US10409254
申请日:2003-04-08
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号:US07368741B2
公开(公告)日:2008-05-06
申请号:US11107535
申请日:2005-04-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号:US20100176313A1
公开(公告)日:2010-07-15
申请号:US12653585
申请日:2009-12-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/02
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译: 公开了一种用于产生EUV辐射的装置,其可以包括目标材料,产生用于与靶材料相互作用的激光束的系统和一对电极。 可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。
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