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    LPP EUV drive laser input system
    5.
    发明授权
    LPP EUV drive laser input system 失效
    LPP EUV驱动激光输入系统

    公开(公告)号：US07402825B2

    公开(公告)日：2008-07-22

    申请号：US11168785

    申请日：2005-06-28

    申请人： Rodney D. Simmons ,  John W. Viatella ,  Jerzy R. Hoffman ,  R. Kyle Webb ,  Alexander N. Bykanov ,  Oleh Khodykin

    发明人： Rodney D. Simmons ,  John W. Viatella ,  Jerzy R. Hoffman ,  R. Kyle Webb ,  Alexander N. Bykanov ,  Oleh Khodykin

    IPC分类号： G21G4/00

    CPC分类号： H05G2/001

    摘要： A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages. The laser passage aperture may define an opening large enough to let the drive laser beam pass without attenuation and small enough to substantially reduce debris passing through the laser passage aperture in the direction of the entrance window.

    摘要翻译： 公开了一种激光产生的等离子体（“LPP”）极紫外（“EUV”）光源及其操作方法，其可以包括具有室壁的EUV等离子体生产室; 在室壁中的驱动激光入口窗口; 在入口窗口中间的驱动激光入口外壳和腔室内的等离子体起始位置，并且包括入口外壳远端开口; 在远端开口和入口窗之间的至少一个孔板包括至少一个驱动激光通道孔。 至少一个孔板可以包括至少两个孔板，其包括限定孔板中间空间的第一孔板和第二孔板。 至少一个驱动激光孔通道可以包括至少两个驱动激光孔通道。 激光通道孔可以限定足够大的开口，使得驱动激光束通过而不衰减，并且足够小以基本上减少通过入口窗口方向的穿过激光通道孔的碎屑。

    Blind motorized coupling arrangements for coupling UV light source subsystem and scanner subsystem in a UV lithography system and methods therefor
    8.
    发明授权
    Blind motorized coupling arrangements for coupling UV light source subsystem and scanner subsystem in a UV lithography system and methods therefor 失效
    用于在UV光刻系统中耦合UV光源子系统和扫描器子系统的盲电动联接装置及其方法

    公开(公告)号：US08061923B2

    公开(公告)日：2011-11-22

    申请号：US12210086

    申请日：2008-09-12

    申请人： Rodney D. Simmons

    发明人： Rodney D. Simmons

    IPC分类号： F16B21/02

    CPC分类号： F16D1/108 ,  Y10T403/12 ,  Y10T403/18 ,  Y10T403/7005 ,  Y10T403/7009 ,  Y10T403/7013

    摘要： A coupling arrangement for coupling a light source subsystem with a scanner subsystem in a UV lithography system is disclosed. The arrangement includes a source flange having a plurality of ramped eared flanges coupled to one of the light source subsystem and the scanner subsystem. The arrangement also includes a collar coupled with the other of the light source subsystem and the scanner subsystem. The collar has a plurality of tangs disposed such that inter-tang spacings accommodate insertion of the plurality of eared flanges, wherein at least one of the source flange and the collar is rotatable to permit the plurality of ramped eared flanges to cam against the plurality of tangs, thereby coupling the light source subsystems to the scanner subsystem.

    摘要翻译： 公开了一种用于将光源子系统与UV光刻系统中的扫描器子系统耦合的耦合装置。 该装置包括源凸缘，其具有联接到光源子系统和扫描器子系统中的一个的多个斜坡的凸耳。 该布置还包括与光源子系统和扫描器子系统中的另一个耦合的套环。 套环具有多个柄脚，其设置成使得脚间间隔适应多个耳环的插入，其中源凸缘和套环中的至少一个可旋转，以允许多个斜面的凸耳凸轮抵靠多个 从而将光源子系统耦合到扫描器子系统。

    EUV light source
    9.
    发明授权
    EUV light source 失效
    EUV光源

    公开(公告)号：US07453077B2

    公开(公告)日：2008-11-18

    申请号：US11323397

    申请日：2005-12-29

    申请人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Rodney D. Simmons

    发明人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Rodney D. Simmons

    IPC分类号： G21K5/04

    CPC分类号： H05G2/003 ,  H05G2/006

    摘要： An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.

    摘要翻译： 公开了一种EUV光源及其操作方法，其可以包括：EUV等离子体生成室，其包括室壁，该室壁包括用于使产生的EUV光聚焦到聚焦点的通过的出口; 第一EUV出口套筒，其包括终端，所述终端包括面向所述出口的开口; 第一出口套筒室，其容纳所述第一出口套筒并具有EUV光出口; 气体供给机构，其在高于等离子体生成室内的压力的压力下向第一出口套筒室供给气体。 第一出口套筒可以朝向终端开口渐缩，并且可以例如是在终端处包括窄端的圆锥形形状。