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公开(公告)号:US07368741B2
公开(公告)日:2008-05-06
申请号:US11107535
申请日:2005-04-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert R. Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号:US06972421B2
公开(公告)日:2005-12-06
申请号:US10409254
申请日:2003-04-08
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettig , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24 , H01J35/20
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译: 本发明提供了一种可靠,高重复率的生产线兼容高能光子源。 在真空室中产生含有活性物质的非常热的等离子体。 活性物质是具有期望的极紫外(EUV)范围内的发射线的原子元素。 包括充电电容器和包括脉冲变压器的磁压缩电路的脉冲电源提供电脉冲,其具有足够的能量和电势,足以以超过5瓦的速率在中间焦点处产生EUV光。 在由申请人带内设计的优选实施例中,中间焦点处的EUV光能量可以45瓦可扩展到105.8瓦特。
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公开(公告)号:US20100176313A1
公开(公告)日:2010-07-15
申请号:US12653585
申请日:2009-12-14
申请人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
发明人: Stephan T. Melnychuk , William N. Partlo , Igor V. Fomenkov , I. Roger Oliver , Richard M. Ness , Norbert Bowering , Oleh Khodykin , Curtis L. Rettiq , Gerry M. Blumenstock , Timothy S. Dyer , Rodney D. Simmons , Jerzy R. Hoffman , R. Mark Johnson
IPC分类号: G21K5/02
CPC分类号: H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.
摘要翻译: 公开了一种用于产生EUV辐射的装置,其可以包括目标材料,产生用于与靶材料相互作用的激光束的系统和一对电极。 可以提供脉冲功率电路用于在所述电极之间产生放电以从所述目标材料产生EUV辐射。
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公开(公告)号:US07522650B2
公开(公告)日:2009-04-21
申请号:US10815387
申请日:2004-03-31
申请人: William N. Partlo , Yoshiho Amada , James A. Carmichael , Timothy S. Dyer , Walter D. Gillespie , Bryan G. Moosman , Richard G. Morton , Curtis L. Rettig , Brian D. Strate , Thomas D. Steiger , Fedor Trintchouk , Richard C. Ujazdowski
发明人: William N. Partlo , Yoshiho Amada , James A. Carmichael , Timothy S. Dyer , Walter D. Gillespie , Bryan G. Moosman , Richard G. Morton , Curtis L. Rettig , Brian D. Strate , Thomas D. Steiger , Fedor Trintchouk , Richard C. Ujazdowski
IPC分类号: H01S3/22
CPC分类号: H01S3/036 , H01S3/0384 , H01S3/041 , H01S3/0971 , H01S3/225
摘要: A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circulation fan creating a gas flow path adjacent the interior vertical wall and the adjacent bottom wall; an in-chamber dust trap positioned a region of low gas flow, which may be along an interior wall and may comprise at least one meshed screen, e.g., a plurality of meshed screens, which may comprise at least two different gauge meshed screens. The dust trap may extend along the bottom interior wall of the chamber and/or a vertical portion of the interior wall. The dust trap may comprise a first meshed screen having a first gauge; a second meshed screen having a second gauge smaller than the first gauge; and the second meshed screen intermediate the first meshed screen and the interior wall. The chamber may comprise a plurality of dust collecting recesses in at least one of the vertical interior wall and the bottom wall of the chamber which may be selected from a group comprising a one-part recess and a multi-part recess, which may comprise two sections angled with respect to each other. The dust trap may comprise a pressure trap positioned between a portion of a main insulator and an interior wall of the chamber. The chamber may comprise a gas circulating fan comprising a cross-flow fan with a fan cutoff that may comprise a vortex control pocket. The chamber may comprise a preionization mechanism comprising a preionization tub containing a ground rod within an elongated opening in the preionization tube that may comprise a compliant member, an automatic preionization shut-off mechanism, a preionization onset control mechanism and/or a focusing element. The chamber may comprise an elongated baffle plate that may comprise a plurality of pyramidal structures including varying numbers of generally pyramidal elements and oriented in groups of varying numbers of generally pyramidal elements and oriented along and transverse to the longitudinal axis. Acoustic resonances within the chamber may also be reduced by introducing an artificial jitter into the timing of the laser discharges varying the inter-pulse period randomly or in a repeating pattern from pulse to pulse within a burst.
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公开(公告)号:US07476887B2
公开(公告)日:2009-01-13
申请号:US11725940
申请日:2007-03-19
摘要: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
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公开(公告)号:US07193228B2
公开(公告)日:2007-03-20
申请号:US11021261
申请日:2004-12-22
CPC分类号: G21K1/062 , B82Y10/00 , G03F7/70175 , G03F7/70916
摘要: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
摘要翻译: 公开了用于形成等离子体产生的EUV光源光学元件的装置和方法,例如,包括使用各种二元层材料的MLM堆叠的反射器和包括用于等离子体产生的EUV光源室中的单个和二进制封盖层的封盖层,特别是在 等离子体源材料与一种或多种MLM材料反应。
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公开(公告)号:US06661826B2
公开(公告)日:2003-12-09
申请号:US10164885
申请日:2002-06-07
申请人: Richard C. Ujazdowski , Timothy S. Dyer , William N. Partlo , Michael Altheim , Brian Strate , Thomas Hofmann
发明人: Richard C. Ujazdowski , Timothy S. Dyer , William N. Partlo , Michael Altheim , Brian Strate , Thomas Hofmann
IPC分类号: H01S3223
CPC分类号: G03F7/70025 , G03F7/70041 , G03F7/70483 , H01S3/036 , H01S3/038 , H01S3/225
摘要: A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece elongated electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
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公开(公告)号:US07366219B2
公开(公告)日:2008-04-29
申请号:US11000684
申请日:2004-11-30
申请人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
发明人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
IPC分类号: H01S3/22
CPC分类号: H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.
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公开(公告)号:US20080151944A1
公开(公告)日:2008-06-26
申请号:US12074079
申请日:2008-02-28
申请人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
发明人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
IPC分类号: H01S3/10
CPC分类号: H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic.
摘要翻译: 一种用于窄带DUV大功率高重复率气体放电激光器的线窄化方法和模块,其产生具有标称光路的脉冲串中的输出激光束脉冲束脉冲,其可以包括:分散中心波长选择光学器件 可移动地安装在线路窄化模块的光路内,为至少部分地由分散波长选择光学器件上包含相应脉冲的激光束的入射角确定的每个脉冲选择至少一个中心波长; 第一调谐机构部分地通过选择包含脉冲朝向分散中心的激光束的透射角度来选择包含分散中心波长选择光学器件上的各个脉冲的激光束的入射角 波长选择光学元件。
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公开(公告)号:US20100097704A1
公开(公告)日:2010-04-22
申请号:US12653584
申请日:2009-12-14
申请人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
发明人: J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
IPC分类号: G02B27/44
CPC分类号: H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要: An apparatus is disclosed which may comprise a grating receiving light, a first prism moveable to coarsely select an angle of incidence of the light on the grating, and a second prism moveable to finely select an angle of incidence of the light on the grating. In one application, the apparatus may be used as a line narrowing module for a laser light source.
摘要翻译: 公开了一种装置,其可以包括接收光的光栅,可移动以粗略地选择光栅入射角的第一棱镜,以及可精细选择光栅入射角的第二棱镜。 在一个应用中,该装置可以用作激光源的线窄化模块。
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