Sputter tool
    2.
    发明授权

    公开(公告)号:US10030303B2

    公开(公告)日:2018-07-24

    申请号:US14578332

    申请日:2014-12-19

    摘要: Sputter tools are described. In one embodiment, an apparatus to support a wafer includes a pallet having a depression to receive the wafer. The pallet includes an opening below the depression, and an edge in the depression is to support the wafer over the opening. A cover at least partially covers the opening. In one example, the cover may be a plate with one or more holes, and a pipe may be located below each of the holes in the cover. In one embodiment, a wafer-processing system includes a processing chamber and a pallet with a depression to receive a wafer. The pallet has an opening below the depression, and an edge in the depression supports the wafer over the opening. In one such embodiment, a cover at least partially covers the opening. According to one embodiment, an energy-absorbing material is disposed below the opening in the pallet.

    Solar cell module with high electric susceptibility layer

    公开(公告)号:US09685571B2

    公开(公告)日:2017-06-20

    申请号:US13966743

    申请日:2013-08-14

    IPC分类号: H01L31/048

    摘要: A solar cell module includes solar cells that are encased in a protective package and a high electric susceptibility layer that is placed on the solar cells. The high electric susceptibility layer is polarized such that a sheet charge is developed at the interface of the high electric susceptibility layer and the solar cells. The protective package includes an encapsulant that encapsulates the solar cells. The encapsulant may be a multilayer encapsulant, with the high electric susceptibility layer being a layer of the encapsulant. The high electric susceptibility layer may also be a material that is separate from the encapsulant.