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公开(公告)号：US07855151B2
公开(公告)日：2010-12-21
申请号：US11894316
申请日：2007-08-21
申请人： Swaroop K. Kommera , Siddhartha Bhowmik , Richard J. Oram , Sriram Ramamoorthi , David M. Braun
发明人： Swaroop K. Kommera , Siddhartha Bhowmik , Richard J. Oram , Sriram Ramamoorthi , David M. Braun
IPC分类号： H01L21/461
CPC分类号： B81C1/00087 , B41J2/16 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B81B2201/052 , H01L21/76898
摘要： A slot is formed that reaches through a first side of a silicon substrate to a second side of the silicon substrate. A trench is laser patterned. The trench has a mouth at the first side of the silicon substrate. The trench does not reach the second side of the silicon substrate. The trench is dry etched until a depth of at least a portion of the trench is extended approximately to the second side of the silicon substrate (12). A wet etch is performed to complete formation of the slot. The wet etch etches silicon from all surfaces of the trench.
摘要翻译： 形成通过硅衬底的第一侧到达硅衬底的第二侧的槽。 沟槽是激光图案。 沟槽在硅衬底的第一侧具有口。 沟槽没有到达硅衬底的第二面。 沟槽被干蚀刻直到沟槽的至少一部分的深度大致延伸到硅衬底（12）的第二侧。 执行湿蚀刻以完成槽的形成。 湿蚀刻从沟槽的所有表面蚀刻硅。
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公开(公告)号：US20090053898A1
公开(公告)日：2009-02-26
申请号：US11894316
申请日：2007-08-21
申请人： Swaroop K. Kommera , Siddhartha Bhowmik , Richard J. Oram , Sriram Ramamoorthi , David M. Braun
发明人： Swaroop K. Kommera , Siddhartha Bhowmik , Richard J. Oram , Sriram Ramamoorthi , David M. Braun
IPC分类号： H01L21/311
CPC分类号： B81C1/00087 , B41J2/16 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B81B2201/052 , H01L21/76898
摘要： A slot is formed that reaches through a first side of a silicon substrate to a second side of the silicon substrate. A trench is laser patterned. The trench has a mouth at the first side of the silicon substrate. The trench does not reach the second side of the silicon substrate. The trench is dry etched until a depth of at least a portion of the trench is extended approximately to the second side of the silicon substrate (12). A wet etch is performed to complete formation of the slot. The wet etch etches silicon from all surfaces of the trench.
摘要翻译： 形成通过硅衬底的第一侧到达硅衬底的第二侧的槽。 沟槽是激光图案。 沟槽在硅衬底的第一侧具有口。 沟槽没有到达硅衬底的第二面。 沟槽被干蚀刻直到沟槽的至少一部分的深度大致延伸到硅衬底（12）的第二侧。 执行湿蚀刻以完成槽的形成。 湿蚀刻从沟槽的所有表面蚀刻硅。
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公开(公告)号：US20090096845A1
公开(公告)日：2009-04-16
申请号：US11872701
申请日：2007-10-15
申请人： David M. Braun , Siddhartha Bhowmik , Swaroop K. Kommera , Richard J. Oram , Phillip G. Rourke , Joshua W. Smith , Christopher C. Aschoff
发明人： David M. Braun , Siddhartha Bhowmik , Swaroop K. Kommera , Richard J. Oram , Phillip G. Rourke , Joshua W. Smith , Christopher C. Aschoff
IPC分类号： B41J2/175
CPC分类号： B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , Y10T29/49401
摘要： Methods and an apparatus are disclosed, wherein a print head die includes a slot and ribs across the slot. The ribs are recessed from one or both sides of the die.
摘要翻译： 公开了一种方法和装置，其中打印头模具包括穿过狭槽的槽和肋。 肋从模具的一侧或两侧凹入。
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公开(公告)号：US08262204B2
公开(公告)日：2012-09-11
申请号：US11872701
申请日：2007-10-15
申请人： David M. Braun , Siddhartha Bhowmik , Swaroop K. Kommera , Richard J. Oram , Phillip G. Rourke , Joshua W. Smith , Christopher C. Aschoff
发明人： David M. Braun , Siddhartha Bhowmik , Swaroop K. Kommera , Richard J. Oram , Phillip G. Rourke , Joshua W. Smith , Christopher C. Aschoff
CPC分类号： B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , Y10T29/49401
摘要： Methods and an apparatus are disclosed, wherein a print head die includes a slot and ribs across the slot. The ribs are recessed from one or both sides of the die.
摘要翻译： 公开了一种方法和装置，其中打印头模具包括穿过狭槽的槽和肋。 肋从模具的一侧或两侧凹入。
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公开(公告)号：US20090020511A1
公开(公告)日：2009-01-22
申请号：US11879416
申请日：2007-07-17
IPC分类号： B08B7/00
CPC分类号： B41J2/1603 , B23K26/0622 , B23K26/0661 , B23K26/142 , B23K26/144 , B23K26/146 , B23K26/364 , B23K26/40 , B23K2101/34 , B23K2101/40 , B23K2103/50 , B41J2/1634
摘要： Embodiments of a method of ablation are disclosed.
摘要翻译： 公开了一种消融方法的实施例。
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公开(公告)号：US08888252B2
公开(公告)日：2014-11-18
申请号：US12993848
申请日：2008-07-09
申请人： Siddhartha Bhowmik , Swaroop K. Kommera , Manish Giri , Robert N. K. Browning , Charles Gustav Schmidt
发明人： Siddhartha Bhowmik , Swaroop K. Kommera , Manish Giri , Robert N. K. Browning , Charles Gustav Schmidt
CPC分类号： B41J2/1601 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1634
摘要： A print head die (30) includes slot ribs (41) having edges (62, 64) with triangular notches. In one embodiment, the print head die is formed by dry etching from a first side (50) of a wafer (30) a series of spaced openings (220) completely through the wafer (30) and separated by ribs (41) followed by wet etching the wafer (30) from a second opposite side (44) to recess the ribs (41) from the second side (44).
摘要翻译： 打印头模具（30）包括具有三角形凹口的边缘（62,64）的槽肋（41）。 在一个实施例中，打印头模具通过从晶片（30）的第一侧（50）干燥蚀刻而形成，所述第一侧（30）具有完全穿过晶片（30）的一系列间隔开的开口（220），并且被肋（41）隔开， 从第二相对侧（44）湿式蚀刻晶片（30）以将肋（41）从第二侧（44）凹入。
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公开(公告)号：US20110069120A1
公开(公告)日：2011-03-24
申请号：US12993848
申请日：2008-07-09
申请人： Siddhartha Bhowmik , Swaroop K. Kommera , Manish Giri , Robert N.K. Browning , Charles Gustav Schmidt
发明人： Siddhartha Bhowmik , Swaroop K. Kommera , Manish Giri , Robert N.K. Browning , Charles Gustav Schmidt
CPC分类号： B41J2/1601 , B41J2/14145 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1634
摘要： A print head die (30) includes slot ribs (41) having edges (62, 64) with triangular notches. In one embodiment, the print head die is formed by dry etching from a first side (50) of a wafer (30) a series of spaced openings (220) completely through the wafer (30) and separated by ribs (41) followed by wet etching the wafer (30) from a second opposite side (44) to recess the ribs (41) from the second side (44).
摘要翻译： 打印头模具（30）包括具有三角形凹口的边缘（62,64）的槽肋（41）。 在一个实施例中，打印头模具通过从晶片（30）的第一侧（50）干燥蚀刻而形成，所述第一侧（30）具有完全穿过晶片（30）的一系列间隔开的开口（220），并且被肋（41）隔开， 从第二相对侧（44）湿式蚀刻晶片（30）以将肋（41）从第二侧（44）凹入。
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公开(公告)号：US07470581B2
公开(公告)日：2008-12-30
申请号：US11494429
申请日：2006-07-27
申请人： Swaroop K. Kommera , Tim R. Koch
发明人： Swaroop K. Kommera , Tim R. Koch
IPC分类号： H01L21/20
摘要： A method of manufacturing an electromagnetic (EM) waveguide capable of guiding a wave along a pre-defined propagation path is described. The method includes providing a core region that extends along the propagation path and printing a colloidal crystal comprised of first particles on the waveguide core region.
摘要翻译： 描述了一种制造能够沿着预定义的传播路径引导波的电磁（EM）波导的方法。 该方法包括提供沿着传播路径延伸的芯区域，并将由波导芯区域上的第一颗粒组成的胶体晶体印刷。
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公开(公告)号：US20080026495A1
公开(公告)日：2008-01-31
申请号：US11494429
申请日：2006-07-27
申请人： Swaroop K. Kommera , Tim R. Koch
发明人： Swaroop K. Kommera , Tim R. Koch
IPC分类号： H01L21/00
摘要： A method of manufacturing an electromagnetic (EM) waveguide capable of guiding a wave along a pre-defined propagation path is described. The method includes providing a core region that extends along the propagation path and printing a colloidal crystal comprised of first particles on the waveguide core region.
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