公开(公告)号：US09447495B2

公开(公告)日：2016-09-20

申请号：US14890485

申请日：2013-12-27

Applicant: TANAKA KIKINZOKU KOGYO K.K.

Inventor： Kazuharu Suzuki ,  Masayuki Saito ,  Ryosuke Harada ,  Shunichi Nabeya ,  Satoshi Miyazaki

IPC: C23C16/18 ,  C07F15/00 ,  C07F15/04

CPC classification number: C23C16/18 ,  C07F15/04

Abstract: The present invention provides a chemical vapor deposition raw material, which has a low melting point, has heat stability such that no thermal decomposition occurs during vaporization, readily decomposes at low temperature during film-formation, and can stably form a nickel thin-film having fewer impurities. The present invention relates to a chemical vapor deposition raw material containing an organic nickel compound, in which a cyclopentadienyl group or a derivative thereof is coordinated to nickel, and a cycloalkenyl group having one allyl group or a derivative thereof is coordinated to the carbon skeleton of cycloalkyl. This raw material has a low melting point, proper heat stability and film-formation ability at low temperature. Further, due to a high vapor pressure, the raw material is suitable for a three-dimensional electrode material having a three-dimensional structure.

Abstract translation: 本发明提供一种化学气相沉积原料，其熔点低，具有热稳定性，使得在蒸发时不会发生热分解，在成膜期间在低温下容易分解，并且可以稳定地形成具有 杂质少。 本发明涉及一种含有有机镍化合物的化学气相沉积原料，其中环戊二烯基或其衍生物与镍配位，并且具有一个烯丙基或其衍生物的环烯基与碳骨架配位 环烷基。 该原料在低温下具有低熔点，适当的热稳定性和成膜能力。 此外，由于高蒸气压，原料适用于具有三维结构的三维电极材料。

公开(公告)号：US10892065B2

公开(公告)日：2021-01-12

申请号：US15506586

申请日：2015-08-19

Applicant: TANAKA KIKINZOKU KOGYO K.K. ,  NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Satoshi Miyazaki ,  Yuichi Makita ,  Hitoshi Kubo ,  Tatsuo Hasegawa ,  Toshikazu Yamada

IPC: H05K3/10 ,  H01B5/14 ,  B05D7/24 ,  H01B1/22 ,  H05K1/09 ,  H01B1/00 ,  H01B13/00 ,  B05D5/12 ,  B32B15/082 ,  B05D1/32 ,  B05D1/42 ,  B05D3/00 ,  B05D3/06 ,  B05D7/04

Abstract: The present invention provides a method for forming a metal pattern on a pattern formation section set in a part or the whole of a region on a base material, the base material including a fluorine-containing resin layer on a surface including at least the pattern formation section, the method including the step of: forming a functional group on a pattern formation section of the fluorine-containing resin layer by a treatment such as ultraviolet-ray irradiation, then applying to the surface of the base material a metal fine particle dispersion liquid in which metal fine particles protected by an amine compound as a first protective agent and a fatty acid as a second protective agent are dispersed in a solvent, and fixing the metal fine particles on the pattern formation section.

公开(公告)号：US09284249B2

公开(公告)日：2016-03-15

申请号：US14438963

申请日：2013-10-17

Applicant: TANAKA KIKINZOKU KOGYO K.K.

Inventor： Ryosuke Harada ,  Toshiyuki Shigetomi ,  Satoshi Miyazaki ,  Masayuki Saito

IPC: C07C45/80

CPC classification number: C07C45/80 ,  C07C49/12 ,  C07C49/14

Abstract: The present invention provides a method of extracting an asymmetric β-diketone compound from a β-diketone compound containing at least one symmetric β-diketone compound mixed in the asymmetric β-diketone compound, and the method includes the step (A) of adjusting a pH of a mixed solution of the β-diketone compound and water at 11.5 or more and dissolving the β-diketone compound into water to form a β-diketone compound solution and the step (B) of subsequently adjusting the pH of the β-diketone compound solution at 9.5 or less and recovering the asymmetric β-diketone compound of Chemical Formula 1 separated from the β-diketone compound solution. The present invention further includes at least either (a) a step of setting the upper limit of the pH of the mixed solution to 12.5 to form a β-diketone compound solution in the step (A) and bringing the β-diketone compound solution into contact with a hydrophobic solvent or (b) a step of setting the lower limit of the pH of the β-diketone compound solution to 8.0 in the step (B).

Abstract translation: 本发明提供了从含有至少一种混合在不对称 - 二 - 二酮化合物中的对称二酮化合物的β-二酮化合物中提取不对称二酮化合物的方法，该方法包括步骤（A ）将所述二 - 二酮化合物和水的混合溶液的pH调节至11.5以上，并将所述二酮化合物溶解在水中以形成二酮化合物溶液，并且随后调整步骤（B） 将二 - 二酮化合物溶液的pH调节至9.5或更低，并回收分离自二 - 二酮化合物溶液的化学式1的不对称 - 二酮化合物。 本发明还包括（a）将步骤（A）中将混合溶液的pH值的上限设定为12.5以形成步骤（A）中的β-二酮化合物溶液并使该二酮化合物 溶液与疏水性溶剂接触，或（b）在步骤（B）中将β-二酮化合物溶液的pH下限设定为8.0的步骤。

公开(公告)号：US20150291497A1

公开(公告)日：2015-10-15

申请号：US14438963

申请日：2013-10-17

Applicant: TANAKA KIKINZOKU KOGYO K.K.

Inventor： Ryosuke Harada ,  Toshiyuki Shigetome ,  Satoshi Miyazaki ,  Masayuki Saito

IPC: C07C45/80

CPC classification number: C07C45/80 ,  C07C49/12 ,  C07C49/14

Abstract: The present invention provides a method of extracting an asymmetric β-diketone compound from a β-diketone compound containing at least one symmetric β-diketone compound mixed in the asymmetric β-diketone compound, and the method includes the step (A) of adjusting a pH of a mixed solution of the β-diketone compound and water at 11.5 or more and dissolving the β-diketone compound into water to form a β-diketone compound solution and the step (B) of subsequently adjusting the pH of the β-diketone compound solution at 9.5 or less and recovering the asymmetric β-diketone compound of Chemical Formula 1 separated from the β-diketone compound solution. The present invention further includes at least either (a) a step of setting the upper limit of the pH of the mixed solution to 12.5 to form a β-diketone compound solution in the step (A) and bringing the β-diketone compound solution into contact with a hydrophobic solvent or (b) a step of setting the lower limit of the pH of the β-diketone compound solution to 8.0 in the step (B).

Abstract translation: 本发明提供了从含有至少一种混合在不对称 - 二 - 二酮化合物中的对称二酮化合物的β-二酮化合物中提取不对称二酮化合物的方法，该方法包括步骤（A ）将所述二 - 二酮化合物和水的混合溶液的pH调节至11.5以上，并将所述二酮化合物溶解在水中以形成二酮化合物溶液，并且随后调整步骤（B） 将二 - 二酮化合物溶液的pH调节至9.5或更低，并回收分离自二 - 二酮化合物溶液的化学式1的不对称 - 二酮化合物。 本发明还包括（a）将步骤（A）中将混合溶液的pH值的上限设定为12.5以形成步骤（A）中的β-二酮化合物溶液并使该二酮化合物 溶液与疏水性溶剂接触，或（b）在步骤（B）中将β-二酮化合物溶液的pH下限设定为8.0的步骤。