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公开(公告)号:US12172374B2
公开(公告)日:2024-12-24
申请号:US18527663
申请日:2023-12-04
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook
IPC: B29C64/165 , B22F10/00 , B22F10/14 , B22F12/37 , B22F12/53 , B22F12/55 , B22F12/57 , B28B1/00 , B33Y10/00 , B33Y30/00 , B33Y70/00 , B33Y80/00 , H01L21/02 , H01L21/288 , H01L21/67 , B22F12/00 , B22F12/41 , B22F12/49 , B29C64/241 , B29L31/34 , C04B35/14
Abstract: A layer of additive material is formed in a circular printing area on a substrate using additive sources distributed across a printing zone. The additive sources form predetermined discrete amounts of the additive material. The substrate and the additive sources are rotated with respect to each other around a center of rotation, so that a pattern of the additive material is formed in a circular printing area on the substrate. Each additive source receives actuation waveforms at an actuation frequency that is proportional to a distance of the additive source from the center of rotation. The actuation waveforms include formation signals, with a maximum of one formation signal in each cycle of the actuation frequency. The formation signals result in the additive sources forming the predetermined discrete amounts of the additive material on the substrate.
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公开(公告)号:US11865773B2
公开(公告)日:2024-01-09
申请号:US16680153
申请日:2019-11-11
Applicant: Texas Instruments Incorporated
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook
IPC: B29C64/165 , B33Y80/00 , B33Y10/00 , B33Y70/00 , B33Y30/00 , B28B1/00 , H01L21/02 , H01L21/288 , H01L21/67 , B22F10/00 , B22F10/14 , B22F12/37 , B22F12/53 , B22F12/55 , B22F12/57 , B22F12/41 , B29L31/34 , B22F12/00 , B22F12/49
CPC classification number: B29C64/165 , B22F10/00 , B22F10/14 , B22F12/37 , B22F12/53 , B22F12/55 , B22F12/57 , B28B1/001 , B33Y10/00 , B33Y30/00 , B33Y70/00 , B33Y80/00 , H01L21/0217 , H01L21/02164 , H01L21/02288 , H01L21/02532 , H01L21/02595 , H01L21/02623 , H01L21/288 , H01L21/6715 , B22F12/226 , B22F12/41 , B22F12/49 , B29L2031/34 , B22F2999/00 , B22F10/30 , B22F12/55 , B22F12/57
Abstract: A layer of additive material is formed in a circular printing area on a substrate using additive sources distributed across a printing zone. The additive sources form predetermined discrete amounts of the additive material. The substrate and the additive sources are rotated with respect to each other around a center of rotation, so that a pattern of the additive material is formed in a circular printing area on the substrate. Each additive source receives actuation waveforms at an actuation frequency that is proportional to a distance of the additive source from the center of rotation. The actuation waveforms include formation signals, with a maximum of one formation signal in each cycle of the actuation frequency. The formation signals result in the additive sources forming the predetermined discrete amounts of the additive material on the substrate.
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公开(公告)号:US20240109247A1
公开(公告)日:2024-04-04
申请号:US18527663
申请日:2023-12-04
Applicant: TEXAS INSTRUMENTS INCORPORATED
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook
IPC: B29C64/165 , B22F10/00 , B22F10/14 , B22F12/37 , B22F12/53 , B22F12/55 , B22F12/57 , B28B1/00 , B33Y10/00 , B33Y30/00 , B33Y70/00 , B33Y80/00 , H01L21/02 , H01L21/288 , H01L21/67
CPC classification number: B29C64/165 , B22F10/00 , B22F10/14 , B22F12/37 , B22F12/53 , B22F12/55 , B22F12/57 , B28B1/001 , B33Y10/00 , B33Y30/00 , B33Y70/00 , B33Y80/00 , H01L21/02164 , H01L21/0217 , H01L21/02288 , H01L21/02532 , H01L21/02595 , H01L21/02623 , H01L21/288 , H01L21/6715 , B29L2031/34
Abstract: A layer of additive material is formed in a circular printing area on a substrate using additive sources distributed across a printing zone. The additive sources form predetermined discrete amounts of the additive material. The substrate and the additive sources are rotated with respect to each other around a center of rotation, so that a pattern of the additive material is formed in a circular printing area on the substrate. Each additive source receives actuation waveforms at an actuation frequency that is proportional to a distance of the additive source from the center of rotation. The actuation waveforms include formation signals, with a maximum of one formation signal in each cycle of the actuation frequency. The formation signals result in the additive sources forming the predetermined discrete amounts of the additive material on the substrate.
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公开(公告)号:US11487206B2
公开(公告)日:2022-11-01
申请号:US16729919
申请日:2019-12-30
Applicant: Texas Instruments Incorporated
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook , Scott Robert Summerfelt
IPC: G03F7/16 , G03F7/30 , H01L23/00 , H01L21/266 , H01L21/308 , H01L21/027 , G03F7/095
Abstract: A microelectronic device is formed by dispensing discrete amounts of a mixture of photoresist resin and solvents from droplet-on-demand sites onto a wafer to form a first photoresist sublayer, while the wafer is at a first temperature which allows the photoresist resin to attain less than 10 percent thickness non-uniformity. The wafer moves under the droplet-on-demand sites in a first direction to form the first photoresist sublayer. A portion of the solvents in the first photoresist sublayer is removed. A second photoresist sublayer is formed on the first photoresist sublayer using the droplet-on-demand sites while the wafer is at a second temperature to attain less than 10 percent thickness non-uniformity in the combined first and second photoresist sublayers. The wafer moves under the droplet-on-demand sites in a second direction for the second photoresist sublayer, opposite from the first direction.
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公开(公告)号:US20210200094A1
公开(公告)日:2021-07-01
申请号:US16729919
申请日:2019-12-30
Applicant: Texas Instruments Incorporated
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook , Scott Robert Summerfelt
IPC: G03F7/16 , G03F7/30 , H01L23/00 , H01L21/266 , H01L21/308 , H01L21/027
Abstract: A microelectronic device is formed by dispensing discrete amounts of a mixture of photoresist resin and solvents from droplet-on-demand sites onto a wafer to form a first photoresist sublayer, while the wafer is at a first temperature which allows the photoresist resin to attain less than 10 percent thickness non-uniformity. The wafer moves under the droplet-on-demand sites in a first direction to form the first photoresist sublayer. A portion of the solvents in the first photoresist sublayer is removed. A second photoresist sublayer is formed on the first photoresist sublayer using the droplet-on-demand sites while the wafer is at a second temperature to attain less than 10 percent thickness non-uniformity in the combined first and second photoresist sublayers. The wafer moves under the droplet-on-demand sites in a second direction for the second photoresist sublayer, opposite from the first direction.
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公开(公告)号:US20210138727A1
公开(公告)日:2021-05-13
申请号:US16680153
申请日:2019-11-11
Applicant: Texas Instruments Incorporated
Inventor: Daniel Lee Revier , Sean Ping Chang , Benjamin Stassen Cook
IPC: B29C64/165 , B33Y10/00 , B33Y80/00 , B33Y70/00 , B33Y30/00 , B28B1/00 , B22F3/00 , H01L21/02 , H01L21/288 , H01L21/67
Abstract: A layer of additive material is formed in a circular printing area on a substrate using additive sources distributed across a printing zone. The additive sources form predetermined discrete amounts of the additive material. The substrate and the additive sources are rotated with respect to each other around a center of rotation, so that a pattern of the additive material is formed in a circular printing area on the substrate. Each additive source receives actuation waveforms at an actuation frequency that is proportional to a distance of the additive source from the center of rotation. The actuation waveforms include formation signals, with a maximum of one formation signal in each cycle of the actuation frequency. The formation signals result in the additive sources forming the predetermined discrete amounts of the additive material on the substrate.
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