公开(公告)号：US20240279569A1

公开(公告)日：2024-08-22

申请号：US18433986

申请日：2024-02-06

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takumi NAMIKI ,  Shinji KUMADA ,  Eita SUGA ,  Kenta KIMURA ,  Jun KONDO

IPC: C11D3/28 ,  C11D1/66 ,  C11D3/00 ,  C11D3/04 ,  C11D3/20

CPC classification number: C11D3/28 ,  C11D1/66 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/042 ,  C11D3/2027 ,  C11D2111/22

Abstract: An aqueous cleaning liquid containing hydrofluoric acid, at least one kind of triazole compound selected from the group consisting of triazole and a triazole derivative, and a nonionic surfactant.

公开(公告)号：US20200292939A1

公开(公告)日：2020-09-17

申请号：US16813062

申请日：2020-03-09

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Kazuaki EBISAWA ,  Aya MOMOZAWA ,  Shota KATAYAMA ,  Kenta KIMURA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/033 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26 ,  C08F220/18

Abstract: A photosensitive resin composition; a photosensitive dry film which includes a photosensitive resin layer formed from the composition; a method of manufacturing the photosensitive dry film; a method of manufacturing a patterned resist film using the composition; a method of manufacturing a substrate with a template using the composition; and a method of manufacturing a plated article using the substrate with the template. In a photosensitive resin composition containing a resin which includes a (meth)acrylic polymer including a carboxy group, a specific amount of compound including a phenolic hydroxyl group and/or a mercapto group is contained together with a polyfunctional vinyl ether monomer.