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公开(公告)号：US20160291469A1
公开(公告)日：2016-10-06
申请号：US15074124
申请日：2016-03-18
发明人： Shota KATAYAMA , Aya MOMOZAWA
CPC分类号： G03F7/0397 , C07C2603/18 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/28 , G03F7/004 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/162 , G03F7/168 , H01L21/0274 , H01L21/0337 , H01L21/31116
摘要： A photosensitive resin composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The photosensitive resin composition may be used to form a plated article on a metal surface of a substrate The composition includes an acid generator that, when irradiated with an active ray or radiation, generates an acid, a resin that, under an action of an acid, undergoes an increase in solubility thereof in alkali, and a fluorene compound represented by the formula (1).
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公开(公告)号：US20200033729A1
公开(公告)日：2020-01-30
申请号：US16516956
申请日：2019-07-19
发明人： Shota KATAYAMA , Kazuaki EBISAWA
摘要： A chemically amplified positive-type photosensitive resin composition containing a predetermined amount of organic solvent (S1) having a boiling point of 120 to 180° C., and satisfying the following requirements:a solvent residual rate measured by the following steps (1) and (2) is 3.5% by mass or less: (1) forming a coated film of 40 μm by applying the photosensitive resin composition to a substrate; and (2) baking the coated film at a temperature that is higher by 10° C. than the boiling point of the organic solvent (S1) for 30 seconds, and calculating the rate of the organic solvent (S1) in a total mass of the coated film after baking by gas chromatography.
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公开(公告)号：US20190101825A1
公开(公告)日：2019-04-04
申请号：US16136786
申请日：2018-09-20
发明人： Akiya KAWAUE , Yasushi KUROIWA , Shota KATAYAMA , Kazuaki EBISAWA
摘要： A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound with a specific structure is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid.
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公开(公告)号：US20200209748A1
公开(公告)日：2020-07-02
申请号：US16720729
申请日：2019-12-19
发明人： Shota KATAYAMA , Kazuaki Ebisawa , Kenta Kimura
摘要： A chemically amplified positive-type photosensitive resin composition having excellent plating solution resistance, a photosensitive dry film having a photosensitive resin layer including the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition, and a method of manufacturing a plated article using the substrate with a template. The composition includes an acid generator which generates acid upon exposure, and a resin whose solubility in alkali increases under action of an acid, the acid generator including an acid generator having a specific naphthalimide skeleton, and the resin including an acrylic resin.
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公开(公告)号：US20230229084A1
公开(公告)日：2023-07-20
申请号：US18001216
申请日：2021-06-07
发明人： Yusuke KISHIMOTO , Shota KATAYAMA
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A chemically amplified photosensitive composition capable of forming a template for plating which can form a plated article with uniform dimensions by photolithography method; a photosensitive dry film including a photosensitive layer consisting of this chemically amplified photosensitive composition; a production method of a substrate having a template for plating using the aforementioned chemically amplified photosensitive composition; and a production method of a plated article using the substrate having the template formed by the aforementioned method. A coumarin compound is blended into a chemically amplified photosensitive composition containing an acid generator which generates an acid by irradiation of active rays or radioactive rays.
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公开(公告)号：US20220026801A1
公开(公告)日：2022-01-27
申请号：US17309729
申请日：2019-12-25
发明人： Shota KATAYAMA , Kazuaki EBISAWA
摘要： A chemically amplified positive-type photosensitive resin composition that can be used for exposure to h line and that has excellent plating solution resistance and crack resistance; a photosensitive dry film provided with a photosensitive resin layer comprising the chemically amplified positive type photosensitive resin composition; a photosensitive dry film manufacturing method; a patterned resist film manufacturing method using the chemically amplified positive-type photosensitive resin composition; a method for manufacturing a substrate with a template by using the chemically amplified positive-type photosensitive resin composition; and a plated article manufacturing method using the substrate with a template. The chemically amplified positive-type photosensitive resin composition includes an acid generator and a resin whose solubility in alkali increases under action of an acid, the acid generator including an acid generator having a specific naphthalimide skeleton, and the proportion of an acrylic resin with respect to the sum of the resin and resins other than the resin is not less than 70 mass %.
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公开(公告)号：US20210055655A1
公开(公告)日：2021-02-25
申请号：US16982437
申请日：2019-01-28
摘要： A method for manufacturing a plated molded article, the method capable of forming a plated molded article having good adhesion with respect to a metal surface on a substrate using a mold, while forming a pattern used as the mold for forming the plated molded article by using a photosensitive composition while suppressing footing in the pattern. A resist pattern is formed by using the photosensitive composition that includes a sulfur-containing compound having a predetermined structure and/or a nitrogen-containing compound, and before forming the plated molded article, ashing is performed on the surface including a metal that is exposed from a nonresist section of the resist pattern used as the mold.
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公开(公告)号：US20200292939A1
公开(公告)日：2020-09-17
申请号：US16813062
申请日：2020-03-09
发明人： Kazuaki EBISAWA , Aya MOMOZAWA , Shota KATAYAMA , Kenta KIMURA
摘要： A photosensitive resin composition; a photosensitive dry film which includes a photosensitive resin layer formed from the composition; a method of manufacturing the photosensitive dry film; a method of manufacturing a patterned resist film using the composition; a method of manufacturing a substrate with a template using the composition; and a method of manufacturing a plated article using the substrate with the template. In a photosensitive resin composition containing a resin which includes a (meth)acrylic polymer including a carboxy group, a specific amount of compound including a phenolic hydroxyl group and/or a mercapto group is contained together with a polyfunctional vinyl ether monomer.
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