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公开(公告)号：US20240271062A1
公开(公告)日：2024-08-15
申请号：US18433995
申请日：2024-02-06
发明人： Jun IIOKA , Takumi NAMIKI
CPC分类号： C11D3/245 , C11D3/361 , C11D17/0008
摘要： There is provided an aqueous cleaning liquid containing hydrofluoric acid and a water-soluble aromatic compound, where the aqueous cleaning liquid has a pH of more than 5.
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公开(公告)号：US20240271061A1
公开(公告)日：2024-08-15
申请号：US18433953
申请日：2024-02-06
发明人： Takumi NAMIKI , Jun IIOKA
CPC分类号： C11D3/245 , C11D3/3409 , C11D17/0008 , C11D2111/16
摘要： An aqueous cleaning liquid containing hydrofluoric acid and an aliphatic sulfonic acid, where the aqueous cleaning liquid is used in a case of cleaning a substrate having cobalt in a surface layer.
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公开(公告)号：US20240271060A1
公开(公告)日：2024-08-15
申请号：US18433969
申请日：2024-02-06
发明人： Takumi NAMIKI , Jun IIOKA
CPC分类号： C11D3/2072 , C11D3/0073 , C11D3/042 , C11D3/2082 , C11D3/30 , C11D2111/22
摘要： There is provided an aqueous cleaning liquid containing hydrofluoric acid and at least one kind of chelating compound selected from the group consisting of a β-diketone compound and a compound containing a total of two or more carboxy groups or hydroxyl groups in a molecule, where the aqueous cleaning liquid is used in a case of cleaning a substrate that contains aluminum oxide in a surface layer.
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公开(公告)号：US20200079962A1
公开(公告)日：2020-03-12
申请号：US16552345
申请日：2019-08-27
发明人： Takumi NAMIKI , Emi UCHIDA , Mai SUGAWARA
摘要： A surface treatment agent containing a silylating agent (A) and a compound (C) having an amide skeleton in a molecule, and a surface treatment method for subjecting an object to be treated to surface treatment using the surface treatment agent.
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公开(公告)号：US20200062968A1
公开(公告)日：2020-02-27
申请号：US16546877
申请日：2019-08-21
发明人： Emi UCHIDA , Takumi NAMIKI , Akira KUMAZAWA
摘要： A surface treatment agent including: a silylating agent and a solvent, the solvent containing an aliphatic hydrocarbon.
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6.发明申请公开(公告)号：US20190194512A1
公开(公告)日：2019-06-27
申请号：US16216261
申请日：2018-12-11
发明人： Shinji KUMADA , Kenji SEKI , Takumi NAMIKI
IPC分类号： C09K3/18 , H01L21/306
CPC分类号： C09K3/18 , C07D233/58 , H01L21/306
摘要： A surface treatment liquid capable of hydrophobizing a surface of a treatment target without including a silylation agent, a surface treatment method using the liquid, and a method for suppressing pattern collapse, including surface treatment by the surface treatment method. The liquid contains a nitrogen-containing heterocyclic compound as a water-repelling agent. A compound including one or more hydrocarbon groups which may be substituted with a halogen atom in which a total number of carbon atoms of the one or more hydrocarbon group is three or more, is used as the nitrogen-containing heterocyclic compound. The liquid may include only a nitrogen-containing heterocyclic compound having the above-described predetermined structure, as a water-repelling agent.
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公开(公告)号：US20190048293A1
公开(公告)日：2019-02-14
申请号：US16079390
申请日：2017-03-01
摘要： A cleaning solution and a cleaning method for a semiconductor substrate or device, which has particularly excellent cleaning performance for removing a residue or film including an inorganic substance that contains silicon atoms, and that has a high flash point. The cleaning solution contains a water miscible organic solvent, a quaternary ammonium hydroxide, and water. The water miscible organic solvent is a glycol ether based solvent or an aprotic polar solvent having a flash point of 60° C. or greater. The cleaning method includes using the cleaning solution to clean from the semiconductor substrate or the device a residue or film formed on the semiconductor substrate or adhered to the device, the residue or film including at least one of a resist and an inorganic substance that contains silicon atoms.
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公开(公告)号：US20240279569A1
公开(公告)日：2024-08-22
申请号：US18433986
申请日：2024-02-06
发明人： Takumi NAMIKI , Shinji KUMADA , Eita SUGA , Kenta KIMURA , Jun KONDO
CPC分类号： C11D3/28 , C11D1/66 , C11D3/0026 , C11D3/0073 , C11D3/042 , C11D3/2027 , C11D2111/22
摘要： An aqueous cleaning liquid containing hydrofluoric acid, at least one kind of triazole compound selected from the group consisting of triazole and a triazole derivative, and a nonionic surfactant.
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公开(公告)号：US20190203090A1
公开(公告)日：2019-07-04
申请号：US16229883
申请日：2018-12-21
发明人： Kenji SEKI , Takumi NAMIKI
CPC分类号： C09K3/18 , G03F7/075 , G03F7/2041 , H01L21/02057
摘要： A method for imparting water repellency to a substrate; a surface treatment agent used in the method; and a method for suppressing collapse of an organic or inorganic pattern in cleaning the substrate surface with a cleaning liquid. The method includes exposing a surface of a substrate to a surface treatment agent, the surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom. A surface treatment agent including a water-repelling agent and a nitrogen-containing heterocyclic compound, the water-repelling agent (A) including an alkoxymonosilane compound having a hydrophobic group bonded to a silicon atom.
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公开(公告)号：US20180187128A1
公开(公告)日：2018-07-05
申请号：US15855173
申请日：2017-12-27
发明人： Takumi NAMIKI , Takayuki HARAGUCHI , Yu-Geng WU
CPC分类号： C11D3/0073 , B08B3/08 , C11D3/30 , C11D7/3209 , C11D7/3218 , C11D7/50 , C11D11/0047 , C23F11/04 , C23F11/06 , C23F11/142 , H01L21/02068 , H01L21/31133 , H01L21/321
摘要： A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the general formula (1), Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, Ra1 and Ra2 are not simultaneously a hydrogen atom, and Rb1 and Rb2 are not simultaneously a hydrogen atom.
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