公开(公告)号：US20230203408A1

公开(公告)日：2023-06-29

申请号：US18061606

申请日：2022-12-05

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Yukihisa WADA ,  Jun KONDO ,  Choitsu GO ,  Kohei SERIZAWA ,  Kazumasa WAKIYA

IPC: C11D7/32 ,  C11D7/08 ,  C11D7/36 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02

CPC classification number: C11D7/3218 ,  C11D7/08 ,  C11D7/36 ,  C11D7/3209 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047 ,  H01L21/02071 ,  H01L21/02074

Abstract: A cleaning liquid for cleaning a substrate in which at least one of molybdenum and tungsten is exposed on a surface, in which the cleaning liquid includes at least one of a compound represented by General Formula (a1), a hydrate of the compound, and a salt of the compound, a water-soluble basic compound with a pH of 9.5 or more in a 0.1 M aqueous solution, which is measured at 23° C. with a pH meter, and water. In General Formula (a1), R1 and R2 each independently represents an organic group including no carbonyl group or a hydrogen atom

公开(公告)号：US20240279569A1

公开(公告)日：2024-08-22

申请号：US18433986

申请日：2024-02-06

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takumi NAMIKI ,  Shinji KUMADA ,  Eita SUGA ,  Kenta KIMURA ,  Jun KONDO

IPC: C11D3/28 ,  C11D1/66 ,  C11D3/00 ,  C11D3/04 ,  C11D3/20

CPC classification number: C11D3/28 ,  C11D1/66 ,  C11D3/0026 ,  C11D3/0073 ,  C11D3/042 ,  C11D3/2027 ,  C11D2111/22

Abstract: An aqueous cleaning liquid containing hydrofluoric acid, at least one kind of triazole compound selected from the group consisting of triazole and a triazole derivative, and a nonionic surfactant.