公开(公告)号：US20240264527A1

公开(公告)日：2024-08-08

申请号：US18563359

申请日：2022-06-14

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara ,  Tetsuya Matsushita ,  Junichi Miyakawa ,  KhanhTin Nguyen ,  Hiroki Kato ,  Yuuki Fujimoto

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/1811 ,  G03F7/0045 ,  G03F7/038

Abstract: A resist composition including a resin component which has a constitutional unit (a01a) containing a polycyclic lactone-containing cyclic group and a constitutional unit (a02) represented by General Formula (a0-2), and a compound (B0) represented by General Formula (b0), Ra05 to Ra08 each independently represents a hydrogen atom, X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, 1≤nb1+nb2≤5 is satisfied, Yb0 represents a divalent linking group or a single bond, Vb0 represents a single bond, R0 represents a hydrogen atom, Mm+ represents an m-valent organic cation, m represents an integer of 1 or greater