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    METHOD FOR PRODUCING ACID GENERATOR
    1.
    发明申请
    METHOD FOR PRODUCING ACID GENERATOR 有权

    公开(公告)号：US20240425440A1

    公开(公告)日：2024-12-26

    申请号：US18697720

    申请日：2022-10-20

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Rin Odashima ,  Hiroki Kato

    IPC: C07C51/41 ,  G03F7/004

    Abstract: A method for producing an acid generator including reacting a carboxylic acid represented by Formula (d0-1) having a pKa of 0.50 or more with at least one of a nitrogen-containing base compound and an onium compound to obtain an intermediate represented by Formula (d0-p), and subjecting the intermediate (d0-p) to an ion exchange reaction with a compound represented by Formula (c0) to obtain a compound represented by Formula (d0). In the formulae, X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, 1≤nb1+nb2≤5 is satisfied, Yd represents a divalent linking group or a single bond, Mpm′+ represents an organic ammonium cation having a logPOW of 4.8 or less or an onium cation having a logPOW of 4.8 or less, X− represents a counter anion, and Mm+ represents an onium cation.

    RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
    2.
    发明公开
    RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 审中-公开

    公开(公告)号：US20240302741A1

    公开(公告)日：2024-09-12

    申请号：US18568071

    申请日：2022-06-10

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Shuichi Ishii ,  Hiroki Kato ,  KhanhTin Nguyen ,  Takuya Ikeda ,  Koshi Onishi ,  Rin Odashima ,  Tetsuo Fujinami ,  Seiji Todoroki ,  Ryo Kawatani

    IPC: G03F7/004

    CPC classification number: G03F7/0045

    Abstract: A resist composition that contains a resin component having a constitutional unit containing an acid-dissociable group represented by General Formula (a01-r) below and contains an acid generator component containing a compound represented by General Formula (b0) below. In General Formula (a01-r), Ra01 and Ra02 represent a saturated aliphatic hydrocarbon group, Ra01 and Ra02 may be bonded to each other to form an alicyclic group. Ra03 to Ra05 represent an aliphatic hydrocarbon group and two or more of Ra03 to Ra05 may be bonded to each other to form an alicyclic group. In General Formula (b-0), X0 represents an iodine atom, Rm represents a hydroxy group, nb1 represents an integer in a range of 1 to 5, nb2 represents an integer in a range of 0 to 4, 1≤nb1+nb2≤5, Yb0 represents a divalent linking group, Vb0 represents an alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms, and Mm+ represents an m-valent organic cation

    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMPOUND, AND COMPOUND
    3.
    发明申请
    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER COMPOUND, AND COMPOUND 有权

    公开(公告)号：US20240411226A1

    公开(公告)日：2024-12-12

    申请号：US18694868

    申请日：2022-10-06

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Hiroki Kato ,  Shuichi Ishii ,  Tetsuo Fujinami

    IPC: G03F7/039 ,  G03F7/038 ,  G03F7/20

    Abstract: A resist composition which generates an acid upon exposure to light and whose solubility in a developing solution is changed under action of an acid, the resist composition containing a resin component whose solubility in a developing solution is changed under action of an acid, in which the resin component has a constitutional unit derived from a compound represented by General Formula (a0) in which W represents a polymerizable group, Ar represents an aromatic hydrocarbon group, —OH represents a hydroxy group, La0 represents a divalent linking group, Ya0 represents a single bond or a divalent linking group, Ra01 and Ra02 each independently represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group, n0 represents an integer in a range of 1 to 4, m represents an integer of 1 or more, and Mm+ represents an m-valent organic cation.

    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT
    4.
    发明申请
    RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 有权

    公开(公告)号：US20240402604A1

    公开(公告)日：2024-12-05

    申请号：US18699225

    申请日：2022-10-18

    Applicant: TOKYO OHKA KOGYO CO., LTD.

    Inventor： Rin Odashima ,  Hiroki Kato

    IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038

    Abstract: A resist composition containing a resin component (A1) and a photodecomposable base (D0) represented by General Formula (d0) that generates a carboxylic acid having a pKa of 0.50 or more as a generated acid. In the formula, Rm represents a hydrogen atom or a hydroxy group, X0 represents a bromine atom or an iodine atom, Yd0 represents a divalent linking group or a single bond, Rb1 represents a fluorine atom or a fluorinated alkyl group, p01 represents an integer in a range of 1 to 5, and Rb2 and Rb3 are hydrocarbon groups, provided that at least one Rb1 is bonded to an ortho-position or a meta-position of a benzene ring, and the number of all fluorine atoms contained in —F and/or —CFRx1Rx2 bonded to an aromatic ring bonded to the sulfur atom in the formula is 3 or more, and Rx1 and Rx2 represent a fluorine atom or a hydrogen atom

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