公开(公告)号：US20240377734A1

公开(公告)日：2024-11-14

申请号：US18691411

申请日：2022-09-21

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: A resist composition containing a base material component (A) and a compound represented by General Formula (d0), in which Rd0 represents a condensed cyclic group in which an aromatic ring and an alicyclic ring are condensed, the alicyclic ring in the condensed cyclic group has a substituent, at least one of the substituents includes a hydrocarbon group having a bromine atom or a hydrocarbon group having an iodine atom, Yd0 represents a divalent linking group or a single bond, Yd0 is bonded to the alicyclic ring in the condensed cyclic group, Mm+ represents an m-valent organic cation, m represents an integer of 1 or more

公开(公告)号：US20240264527A1

公开(公告)日：2024-08-08

申请号：US18563359

申请日：2022-06-14

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara ,  Tetsuya Matsushita ,  Junichi Miyakawa ,  KhanhTin Nguyen ,  Hiroki Kato ,  Yuuki Fujimoto

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/1811 ,  G03F7/0045 ,  G03F7/038

Abstract: A resist composition including a resin component which has a constitutional unit (a01a) containing a polycyclic lactone-containing cyclic group and a constitutional unit (a02) represented by General Formula (a0-2), and a compound (B0) represented by General Formula (b0), Ra05 to Ra08 each independently represents a hydrogen atom, X0 represents a bromine atom or an iodine atom, Rm represents a hydroxy group, 1≤nb1+nb2≤5 is satisfied, Yb0 represents a divalent linking group or a single bond, Vb0 represents a single bond, R0 represents a hydrogen atom, Mm+ represents an m-valent organic cation, m represents an integer of 1 or greater

公开(公告)号：US20240158547A1

公开(公告)日：2024-05-16

申请号：US18493501

申请日：2023-10-24

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara ,  Takehiro Seshimo

IPC: C08F20/14 ,  C08F12/08 ,  C08F20/18 ,  C08F20/56 ,  C08J5/18

CPC classification number: C08F20/14 ,  C08F12/08 ,  C08F20/18 ,  C08F20/56 ,  C08J5/18 ,  C08F2810/40 ,  C08J2325/06 ,  C08J2333/12 ,  C08J2333/26

Abstract: A composition for selectively modifying a base material having a surface having two or more regions made of materials that are different from each other and contains a polymer and a solvent, in which the polymer has at least one structure represented by Formula (1-1) at a terminal of a main chain thereof. In the formula, X represents NR1, O, S, or Te; R1 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms; A1 represents a monovalent substituent having substrate adsorbability at a terminal; and * represents a bonding site that is bonded to the main chain of the polymer


*—X-A1  (1-1).

公开(公告)号：US20250013148A1

公开(公告)日：2025-01-09

申请号：US18691733

申请日：2022-09-20

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara ,  KhanhTin Nguyen ,  Takuya Ikeda

IPC: G03F7/004 ,  C07C309/12 ,  G03F7/00 ,  G03F7/039 ,  G03F7/30

Abstract: A resist composition including a base material component and a compound represented by General Formula (b0), in which Rb0 represents a fused cyclic group in which an aromatic ring and an alicyclic ring are fused, the alicyclic ring in the fused cyclic group has substituents, at least one of the substituents contains a hydrocarbon group having a bromine atom or an iodine atom, Yb0 represents a divalent linking group or a single bond, Yb0 is bonded to the alicyclic ring in the fused cyclic group, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, R0 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Mm+ represents an m-valent organic cation, and m represents an integer of 1 or greater

公开(公告)号：US20240166778A1

公开(公告)日：2024-05-23

申请号：US18491256

申请日：2023-10-20

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takuya Uehara

IPC: C08F20/06 ,  C08F8/34

CPC classification number: C08F20/06 ,  C08F8/34 ,  C08F2438/03

Abstract: A method for producing a polymer, including reacting a polymer (P1) having a structure represented by General Formula (t1-1) at a terminal of a main chain with a nucleophilic agent in which a pKa of a conjugate acid is 11 or less to obtain a polymer (P2) having a structure represented by Formula (t2-1) at a terminal of a main chain. In formula (t1-1), Z represents a monovalent organic group, and in both formulas, * represents a bonding site bonded to a carbon atom which constitutes a main chain of an adjacent constitutional unit

公开(公告)号：US20250011622A1

公开(公告)日：2025-01-09

申请号：US18438090

申请日：2024-02-09

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Takuya Uehara ,  Takahiro Dazai ,  Teruaki Hayakawa ,  Shinsuke Maekawa ,  Riku Mizusaki

IPC: C09D183/10 ,  C08G81/02 ,  C09D5/20

Abstract: A block copolymer represented by General Formula (n1) in which A represents a first polymer block, B represents a second polymer block, R1c and R1d each independently represents a substrate adsorptive group-containing group, R2c and R2d each independently represents a substituent other than the substrate adsorptive group-containing group, m1 and n1 each independently represents an integer of 0 to 5, m2 and n2 each independently represents an integer of 0 to 5, m1+n1≥1, m1+m2≤5, and n1+n2≤5

公开(公告)号：US20250011616A1

公开(公告)日：2025-01-09

申请号：US18437759

申请日：2024-02-09

Applicant: TOKYO OHKA KOGYO CO., LTD. ,  TOKYO INSTITUTE OF TECHNOLOGY

Inventor： Takuya Uehara ,  Takahiro Dazai ,  Teruaki Hayakawa ,  Shinsuke Maekawa ,  Riku Mizusaki

IPC: C09D153/00 ,  C08J7/04 ,  C08L53/00

Abstract: A method for producing a structure body including a phase-separated, the method including (i) applying a composition containing a block copolymer represented by Formula (n1) onto a substrate to form an undercoat agent layer, (ii) applying the composition containing the block copolymer onto the undercoat agent layer to form a self-organization layer, and (iii) subjecting the self-organization layer to phase separation. In General Formula (n1), A represents a first polymer block, B represents a second polymer block, R1c and R1d represent a substrate adsorptive group-containing group, R2c and R2d represent a substituent other than the substrate adsorptive group-containing group, m1 and n1 represent an integer of 0 to 5, m2 and n2 represent an integer of 0 to 5, m1+n1 >1, m1+m2