公开(公告)号：US20190049840A1

公开(公告)日：2019-02-14

申请号：US16078432

申请日：2017-03-09

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yohei KONOSHIMA ,  Mitsuhito SUWA ,  Chika HIBINO ,  Yuka YAMASHIKI

IPC: G03F7/033 ,  G03F7/038 ,  G03F7/031

CPC classification number: G03F7/033 ,  G03F7/031 ,  G03F7/038 ,  G03F7/0388 ,  G06F3/044 ,  G06F2203/04103

Abstract: An object of the present invention is to provide a transparent photosensitive material that is usable as an interlayer insulating film for metal wires, is excellent in migration resistance and substrate adhesiveness under high temperature and high humidity conditions, and is satisfactory in patternability. The photosensitive resin composition of the present invention contains an acrylic polymer (A1) having, in a side chain thereof, a polymerizable group, a cardo based resin (A2) having a polymerizable group and an alkali-soluble group, and a photopolymerization initiator (B), and contents of the acrylic polymer (A1) and the cardo based resin (A2) satisfy a weight ratio of 1:10 to 10:1.

公开(公告)号：US20190101828A1

公开(公告)日：2019-04-04

申请号：US16095053

申请日：2017-04-17

Applicant: TORAY INDUSTRIES, INC.

Inventor： Toshiyasu HIBINO ,  Yoshinori MATOBA ,  Mitsuhito SUWA

IPC: G03F7/075 ,  C08G77/00 ,  C09D4/06 ,  C09D183/06 ,  C09D5/00 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40

Abstract: A resin composition including a polysiloxane (A) and a solvent (B), wherein the polysiloxane (A) contains at least one partial structure represented by any of the general formulae (1) to (3), and the relationship between the film thickness X and the film thickness Y, which respectively represent the thickness of a film produced by application of the resin composition and subsequent drying at 100° C. for 3 minutes and the thickness of the film after subsequent heating at 230° C. for 5 minutes, satisfies the following inequation: (X−Y)/x≤0.05. The resin composition exhibits excellent coating properties on rugged surface and has excellent planarization properties even if the resin composition is in a form of thin film. (R1 represents a single bond or a C1-4 alkyl group; R2 represents a C1-4 alkyl group; and R3 represents an organic group.)

公开(公告)号：US20210116812A1

公开(公告)日：2021-04-22

申请号：US17041639

申请日：2019-03-27

Applicant: TORAY INDUSTRIES, INC.

Inventor： Yoshinori MATOBA ,  Toshiyasu HIBINO ,  Mitsuhito SUWA

IPC: G03F7/075 ,  G03F7/20 ,  G03F7/40 ,  G03F7/039 ,  G03F7/008

Abstract: The present invention provides a positive photosensitive resin composition having high light transmittance, high heat resistance, and excellent pattern processability. The present invention provides a positive photosensitive resin composition containing polysiloxane (A), a naphthoquinonediazide compound (B), and a solvent (C); in which the polysiloxane (A) has at least one structure selected from the following general formulae (1) to (3), and has at least one structure selected from the following general formulae (4) to (6); in which, in the general formulae (1) to (3), R4 represents a C2-C6 hydrocarbon group having an unsaturated double bond; R1 represents a single bond or a C1-C4 alkylene group; R2 in the general formula (2) represents a hydrogen atom or a C1-C4 alkyl group; and R3 in the general formula (3) represents an organic group; in which R2 in general formula (5) represents a hydrogen atom or a C1-C4 alkyl group; and R3 in the general formula (6) represents an organic group.

公开(公告)号：US20150378258A1

公开(公告)日：2015-12-31

申请号：US14758101

申请日：2014-02-07

Applicant: TORAY INDUSTRIES, INC.

Inventor： Hitoshi ARAKI ,  Mitsuhito SUWA ,  Toru OKAZAWA ,  Yoshihiko INOUE ,  Akihiro ISHIKAWA ,  Akinori SAEKI

IPC: G03F7/075 ,  G06F3/041 ,  G03F7/32 ,  G03F7/40 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/0757 ,  G03F7/027 ,  G03F7/029 ,  G03F7/038 ,  G03F7/0755 ,  G03F7/105 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G06F3/041 ,  G06F2203/04103 ,  G06F2203/04107

Abstract: The purpose of the present invention is to provide a negative-type photosensitive coloring composition ideal for forming a white, light-blocking pattern and which not only has excellent chemical resistance, but also has extremely excellent heat resistance and does not yellow or crack even when undergoing high-temperature processing. This negative-type photosensitive coloring composition contains (A) a white pigment, (B) a polysiloxane obtained by co-hydrolyzate condensation of an alkoxysilane compound containing a compound of a specific structure, (C) polyfunctional acrylic monomers, (D) a photoradical polymerization initiator and (E) an organic solvent.

Abstract translation: 本发明的目的是提供一种理想的用于形成白色，阻光图案的负型感光着色组合物，其不仅具有优异的耐化学性，而且具有非常优异的耐热性，并且即使当 经历高温处理。 该负型感光性着色组合物含有（A）白色颜料，（B）通过含有特定结构的化合物的烷氧基硅烷化合物的共水解缩合得到的聚硅氧烷，（C）多官能丙烯酸类单体，（D）光自由基 聚合引发剂和（E）有机溶剂。