公开(公告)号：US20180301321A1

公开(公告)日：2018-10-18

申请号：US16015832

申请日：2018-06-22

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA

IPC: H01J37/32 ,  C01F17/00

Abstract: A plasma-resistant member that includes a base material and a layer structural component is provided, wherein the layer structural component includes an yttria polycrystalline body, is formed at a surface of the base material, and has plasma resistance; crystallites that are included in the yttria polycrystalline body included in the layer structural component are not bonded to each other via a heterogenous phase; the yttria polycrystalline body included in the layer structural component has a crystal structure including only cubic, or a crystal structure in which cubic and monoclinic coexist; and an average value of a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component is greater than 0% and not more than 60%.

公开(公告)号：US20170152189A1

公开(公告)日：2017-06-01

申请号：US15320612

申请日：2015-06-19

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA

IPC: C04B35/505 ,  C23C4/12 ,  C04B35/622

CPC classification number: C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/5045 ,  C04B41/87 ,  C04B2111/0025 ,  C04B2235/3225 ,  C04B2235/76 ,  C04B2235/762 ,  C04B2235/77 ,  C04B2235/781 ,  C04B2235/80 ,  C23C4/12 ,  C23C24/04 ,  Y02T50/6765 ,  C04B35/10 ,  C04B41/4545

Abstract: There is provided a plasma-resistant member, including: a base material; and a layer structural component formed by aerosol deposition at a surface of the base material, the layer structural component being plasma-resistant and including an yttria polycrystalline body, the yttria polycrystalline body included in the layer structural component having a crystal structure in which cubic and monoclinic coexist, a proportion of monoclinic to cubic inside the yttria polycrystalline body included in the layer structural component being not less than 0% and not more than 60%, a crystallite size of the yttria polycrystalline body included in the layer structural component being not less than 8 nm and not more than 50 nm.

公开(公告)号：US20230227375A1

公开(公告)日：2023-07-20

申请号：US18118294

申请日：2023-03-07

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA ,  Toshihiro AOSHIMA

IPC: C04B41/87 ,  C04B41/50 ,  C04B41/00 ,  C23C24/04 ,  C23C16/44 ,  C04B35/505 ,  C04B35/622 ,  C23C4/12 ,  H01L21/683 ,  H01L21/687

CPC classification number: C04B41/87 ,  C04B41/5045 ,  C04B41/009 ,  C23C24/04 ,  C23C16/4404 ,  C04B35/505 ,  C04B35/62222 ,  C23C4/12 ,  H01L21/6833 ,  H01L21/68757 ,  C04B2235/3225 ,  C04B2235/963 ,  C04B2237/066 ,  C04B2237/343 ,  C04B2237/592 ,  C04B2235/781 ,  C04B2235/785 ,  Y02T50/60 ,  C04B2235/3217

Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

公开(公告)号：US20190144347A1

公开(公告)日：2019-05-16

申请号：US16246852

申请日：2019-01-14

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA ,  Toshihiro AOSHIMA

IPC: C04B41/87 ,  C04B35/505 ,  C04B35/622 ,  H01L21/683 ,  H01L21/687 ,  C23C4/12 ,  C04B41/50 ,  C23C24/04 ,  C23C16/44 ,  C04B41/00

Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

公开(公告)号：US20190276368A1

公开(公告)日：2019-09-12

申请号：US16296934

申请日：2019-03-08

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA ,  Hiroaki ASHIZAWA ,  Takuma WADA ,  Ryoto TAKIZAWA ,  Toshihiro AOSHIMA ,  Yuuki TAKAHASHI ,  Atsushi KINJO

IPC: C04B35/505 ,  H01L21/67 ,  C01F17/00 ,  C01B11/24 ,  C01F7/02 ,  C01G25/02 ,  C04B35/622 ,  H01J37/28

Abstract: Disclosed is provision of a ceramic coat having an excellent low-particle generation as well as a method for assessing the low-particle generation of the ceramic coat. A composite structure including a substrate and a structure which is formed on the substrate and has a surface, wherein the structure includes a polycrystalline ceramic and the composite structure has luminance Sa satisfying a specific value calculated from a TEM image analysis thereof, can be suitably used as an inner member of a semiconductor manufacturing apparatus required to have a low-particle generation.

公开(公告)号：US20160332921A1

公开(公告)日：2016-11-17

申请号：US14651503

申请日：2013-12-27

Applicant: TOTO LTD.

Inventor： Junichi IWASAWA ,  Toshihiro AOSHIMA

IPC: C04B41/87 ,  C04B35/622 ,  C23C4/12 ,  H01L21/683 ,  H01L21/687 ,  C04B35/505 ,  C04B41/50

CPC classification number: C04B41/87 ,  C04B35/505 ,  C04B35/62222 ,  C04B41/009 ,  C04B41/5045 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/781 ,  C04B2235/785 ,  C04B2235/963 ,  C04B2237/066 ,  C04B2237/343 ,  C04B2237/592 ,  C23C4/12 ,  C23C16/4404 ,  C23C24/04 ,  H01L21/6833 ,  H01L21/68757 ,  Y02T50/6765 ,  C04B35/10 ,  C04B41/4543

Abstract: According to an aspect of the invention, there is provided a plasma-resistant member including: a base member; and a layer structural component formed at a surface of the base member, the layer structural component including an yttria polycrystalline body and being plasma resistant, the layer structural component including a first uneven structure, and a second uneven structure formed to be superimposed onto the first uneven structure, the second uneven structure having an unevenness finer than an unevenness of the first uneven structure.

Abstract translation: 根据本发明的一个方面，提供一种等离子体耐受构件，其包括：基座构件; 以及形成在所述基底构件的表面上的层结构部件，所述层结构部件包括氧化钇多晶体并具有等离子体电阻，所述层结构部件包括第一凹凸结构，以及第二凹凸结构，形成为叠置在所述第一 第二不均匀结构具有比第一凹凸结构的凹凸更细的凹凸。