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公开(公告)号:US20180030594A1
公开(公告)日:2018-02-01
申请号:US15647305
申请日:2017-07-12
Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
Inventor: Kazutaka TACHIBANA , Takayasu SATO , Yoji SATO , Hiromichi NAKATA , Daiki TSUBOI
IPC: C23C16/27 , H05H1/46 , H01L21/205 , C23C16/511 , C23C16/458
CPC classification number: C23C16/274 , C23C14/14 , C23C14/325 , C23C16/26 , C23C16/4581 , C23C16/511 , C23C28/32 , H01J37/32192 , H01J37/3222 , H01L21/205 , H05H1/46 , H05H2001/4607 , H05H2001/463
Abstract: A high-frequency wave supplying structure includes a center conductor that extends in a specified direction, an outer conductor that is coaxial with the center conductor and grounded, and a cylindrical insulating member that is provided between the center conductor and the outer conductor. The distal end of the center conductor is a support portion that supports a workpiece W. A shield member is provided outward of the outer conductor to be coaxial with the outer conductor and the center conductor. The distal end of the shield member is located closer to the support portion in the specified direction than the distal end of the outer conductor. The insulating member includes a protruding portion that protrudes toward the support portion from an opening of the outer conductor. The protruding portion is opposed to the distal end of the outer conductor in the specified direction.
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公开(公告)号:US20180044777A1
公开(公告)日:2018-02-15
申请号:US15653698
申请日:2017-07-19
Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
Inventor: Shota MATSUDA , Hiromichi NAKATA , Takayasu SATO , Yoji SATO , Kazutaka TACHIBANA , Daiki TSUBOI
IPC: C23C14/32 , C23C16/455 , C30B25/10 , C23C16/515
CPC classification number: C23C14/325 , C23C16/45523 , C23C16/515 , C30B23/066 , C30B25/105 , H01J37/32055 , H01J37/32403 , H01J37/32568 , H01J37/32614
Abstract: A film forming apparatus includes a cylindrical evaporation source, an electrode, and a gas passage. The evaporation source is composed of metal and includes an internal space for accommodating a workplace. The electrode is arranged in the internal space of the evaporation source, The gas passage supplies gas to the internal space of the evaporation source from a space outside the evaporation source. The gas passage includes an end portion located in the internal space. The end portion of the gas passage includes a first section composed of a first material and a second section composed of a second material. The first material and the second material have different thermal expansion coefficients.
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