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    Gas delivery system for ion implanter
    1.
    发明授权
    Gas delivery system for ion implanter 有权

    公开(公告)号：US11569062B2

    公开(公告)日：2023-01-31

    申请号：US16882053

    申请日：2020-05-22

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Hom-Chung Lin ,  Jih-Churng Twu ,  Yi-Ting Chang ,  Chao-Po Lu ,  Tsung-Min Lin

    IPC: H01J37/31 ,  H01J37/317 ,  H01J37/08 ,  H01J37/32

    Abstract: An ion implantation system includes an ion implanter containing an ion source unit and a dopant source gas supply system. The system includes a dopant source gas storage tank inside a gas box container located remotely to the ion implanter and a dopant source gas supply pipe configured to supply a dopant source gas from the dopant source gas storage tank to the ion source unit. The dopant source gas supply pipe includes an inner pipe, an outer pipe enclosing the inner pipe, a first pipe adaptor coupled to first end of respective inner and outer pipes, and a second pipe adaptor coupled to seconds end of respective inner and outer pipes opposite the first end. The first pipe adaptor connects the inner pipe to the dopant source gas storage tank and the second pipe adaptor connects the inner pipe to the ion source unit.

    METHOD AND APPARATUS FOR REDUCING VACUUM LOSS IN AN ION IMPLANTATION SYSTEM
    2.
    发明申请
    METHOD AND APPARATUS FOR REDUCING VACUUM LOSS IN AN ION IMPLANTATION SYSTEM 有权

    公开(公告)号：US20220216040A1

    公开(公告)日：2022-07-07

    申请号：US17701538

    申请日：2022-03-22

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Tsung-Min LIN ,  Fang-Chi Chien ,  Cheng-Yi Huang ,  Chao-Po Lu

    IPC: H01J37/32 ,  H01J37/18

    Abstract: A method and apparatus for dosage measurement and monitoring in an ion implantation system is disclosed. In one embodiment, a transferring system, includes: a vacuum chamber, wherein the vacuum chamber is coupled to a processing chamber; a shaft coupled to a ball screw, wherein the ball screw and the shaft are configured in the vacuum chamber; and a vacuum rotary feedthrough, wherein the vacuum rotary feedthrough comprises a magnetic fluid seal so as to provide a high vacuum sealing, and wherein the vacuum rotary feedthrough is configured through a first end of the vacuum chamber and coupled to the ball screw so as to provide a rotary motion on the ball screw.

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